Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

Abstract: Provided is an adhesion-promoting composition between a curable composition for imprints and a substrate, which excellent in adhesiveness and can control pattern failure. An adhesion-promoting composition used between a curable composition for imprints and a substrate, which comprises a compound having a molecular weight of 500 or larger and having a reactive group, and has a content of a compound, with a molecular weight of 200 or smaller, of more than 1% by mass and not more than 10% by mass of a total solid content.

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

Abstract: Provided is an underlying film composition for imprints showing a good adhesiveness with a base and capable of reducing failure or defect of resist pattern. The underlying film composition for imprints comprising a curable main component and a urea-based crosslinking agent.

Abstract: To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger; Crosslink density={?(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

Abstract: An ink composition having excellent storage stability and curing properties after an image formation and an image forming method using the ink composition are provided. An ink composition including (A) a polymerizable compound represented by the following general formula (1) and (B) a polymerization initiator and an image forming method using the ink composition. In the general formula (1), R1 represents a hydrogen atom or a methyl group. R2 represents a liner or branched alkylene group having 2 to 4 carbon atoms. However, in R2, it is not possible to have a structure in which an oxygen atom and a nitrogen atom which are bonded to both ends of R2 are bonded to the same carbon atom of R2. R3 represents a divalent linking group. k represents 2 or 3. x, y and z each independently represent an integer of 0 to 6 and x+y+z satisfies 0 to 18.

Abstract: A compound represented by formula (I): wherein, in formula (I), R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atom(s); Ra represents a hydrogen atom, an alkyl group, an aryl group, or a heterocyclic group; X represents a halogen atom, or an alkyl- or aryl-sulfonyloxy group; L represents a divalent linking group; Z represents a (n+1)-valent organic group; and n represents an integer of 1 to 6, a plurality of Rs and Ras and Xs may be the same or different from each other, respectively, and when n represents 2 to 6, a plurality of Ls may be the same or different from each other.

Abstract: Disclosed is a polyether compound which is useful as a curing agent or the like, a curing agent using the compound and a producing method of the compound. The polyether compound of the present invention is represented by the following general formula (1). (In the formula, R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or —C(?O)—C(R3)?CH2. R3 represents a hydrogen atom or a methyl group. R1, R2 and R3 may be the same as or different from each other.

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract: An ink composition having excellent storage stability and curing properties after an image formation and an image forming method using the ink composition are provided. An ink composition including (A) a polymerizable compound represented by the following general formula (1) and (B) a polymerization initiator and an image forming method using the ink composition. In the general formula (1), R1 represents a hydrogen atom or a methyl group. R2 represents a liner or branched alkylene group having 2 to 4 carbon atoms. However, in R2, it is not possible to have a structure in which an oxygen atom and a nitrogen atom which are bonded to both ends of R2 are bonded to the same carbon atom of R2. R3 represents a divalent linking group. k represents 2 or 3. x, y and z each independently represent an integer of 0 to 6 and x+y+z satisfies 0 to 18.

Abstract: Disclosed is a polyether compound which is useful as a curing agent or the like, a curing agent using the compound and a producing method of the compound. The polyether compound of the present invention is represented by the following general formula (1). (In the formula, R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or —C(?O)—C(R3)?CH2. R3 represents a hydrogen atom or a methyl group. R1, R2 and R3 may be the same as or different from each other.

Abstract: An ink composition including: (Component A) a polymerizable compound represented by following Formula (1); (Component B) a monofunctional polymerizable compound having a (meth)acrylamide structure; (Component C) a photopolymerization initiator; (Component D) a colorant; and (Component E) water, wherein in Formula (1), Z represents a polyol residue formed by removing n hydrogen atoms from hydroxyl groups of a trihydric to hexahydric polyol, R1 represents a hydrogen atom or a methyl group, and n represents an integer of from 3 to 6.

Abstract: An aqueous ink composition including: a water-soluble polymerizable compound containing two or more polymerizable functional groups each selected from the group consisting of a (meth)acrylamide group, a maleimide group, a vinyl sulfone group, and an N-vinyl amide group, wherein a ratio of a molecular weight of the compound relative to a number of the polymerizable functional groups contained in a single molecule of the compound is 175 or less; a polymerization initiator; and water.

Abstract: Provided is a curable composition for imprints capable of ensuring good patternability after repetitive transfer of pattern, and less causative of defects. The curable composition for imprints comprising a polymerizable compound (A), a photo-polymerization initiator (B) and a non-polymerizable compound (C); the non-polymerizable compound (C) dissolving into the curable composition for imprints in an exothermic manner.

Abstract: An ink composition comprising: (Component A) a polymerizable compound represented by following Formula (1); (Component B) a monofunctional polymerizable compound having a (meth)acrylamide structure; (Component C) a photopolymerization initiator; (Component D) a colorant; and (Component E) water, wherein in Formula (1), Z represents a polyol residue formed by removing n hydrogen atoms from hydroxyl groups of a trihydric to hexahydric polyol, R1 represents a hydrogen atom or a methyl group, and n represents an integer of from 3 to 6.

Abstract: An aqueous ink composition including: a water-soluble polymerizable compound containing two or more polymerizable functional groups each selected from the group consisting of a (meth)acrylamide group, a maleimide group, a vinyl sulfone group, and an N-vinyl amide group, wherein a ratio of a molecular weight of the compound relative to a number of the polymerizable functional groups contained in a single molecule of the compound is 175 or less; a polymerization initiator; and water.

Abstract: A crosslinked carbon nanotube, in which multiple carbon nanotubes therein are crosslinked with each other at multiple cross-linking sites via a connecting group containing a ?-electron conjugation system, and the bond between the connecting group and the carbon nanotube is not an ester or amido bond.

Abstract: Disclosed is a surface-modified carbon material obtained by subjecting a carbon material to react with a benzyne. The surface-modified carbon material has high heat stability.

Abstract: A crosslinked carbon nanotube, in which multiple carbon nanotubes therein are crosslinked with each other at multiple cross-linking sites via a connecting group containing a ?-electron conjugation system, and the bond between the connecting group and the carbon nanotube is not an ester or amido bond.