Abstract: A reflective mask blank for EUV lithography includes, in the following order, a substrate, a multilayer reflective film for reflecting EUV light, a phase shift film for shifting a phase of EUV light, and an etching mask film. The phase shift film is constituted of a ruthenium-based material containing ruthenium as a main component. The phase shift film has a film thickness of 20 nm or larger. The etching mask film is removable with a cleaning liquid comprising an acid or a base.

Abstract: A reflective mask blank for EUV lithography includes a substrate and, formed on or above the substrate in the following order, a reflective layer for reflecting EUV light, a protective layer for the reflective layer, an absorption layer for absorbing EUV light, and a hard mask layer. The protective layer contains ruthenium (Ru), the absorption layer contains tantalum (Ta), the hard mask layer contains chromium (Cr) and at least one of nitrogen (N) and oxygen (O), and the hard mask layer has a film density of from 3.00 g/cm3 to 5.40 g/cm3.

Abstract: A reflective mask blank for EUV lithography includes: a substrate; a multilayer reflective film for reflecting EUV light; and a phase shift film for shifting a phase of EUV light, the multilayer reflective film and the phase shift film formed on or above the substrate in this order. The phase shift film includes a layer 1 including ruthenium (Ru) and at least one selected from the group consisting of oxygen (O) and nitrogen (N). Among diffraction peaks derived from the phase shift film observed at 2?: from 20° to 50° by out-of-plane XRD method, a peak having the highest intensity has a half value width FWHM of 1.0° or more.

Abstract: A reflective mask blank for EUV lithography includes a substrate, a reflective layer for reflecting EUV light, and an absorption layer for absorbing EUV light. The reflective layer and the absorption layer are formed on or above the substrate in this order. The absorption layer contains tantalum (Ta) and niobium (Nb), and the absorption layer has a composition ratio Ta:Nb of Ta (at %) to Nb (at %) of from 4:1 to 1:4. Among diffraction peaks derived from the absorption layer observed at 2?: from 20° to 50° by out-of-plane XRD method, a peak having the highest intensity has a half width FWHM of 1.0° or more.

Abstract: A reflective mask blank includes a backside conductive film on a back surface of a substrate. The backside conductive film has a laminated structure including a stress compensation layer and a conductive layer in this order from the substrate side. The conductive layer includes a metal nitride. The stress compensation layer has a compressive stress and the stress compensation layer includes at least one compound selected from the group consisting of oxides, oxynitrides, and nitrides, each having an absorption coefficient (k) over the wavelength range of 400 nm to 800 nm being 0.1 or less. The conductive layer has a thickness of 5 nm or more and 30 nm or less. The backside conductive film has a total thickness of 50 nm or more.

Abstract: Provided is a glass sheet with an antireflection film: containing a glass sheet, a first transparent high refractive index layer located on the glass sheet, a first transparent low refractive index layer located on the first transparent high refractive index layer, a second transparent high refractive index layer located on the first transparent low refractive index layer, and a second transparent low refractive index layer located on the second transparent high refractive index layer; having a haze after heating at 600° C. to 700° C. for 15 minutes being 0.4% or less; and having a visible light reflectance measured from the side of the second transparent low refractive index layer based on JIS R 3106 being 1.0% or less.

Abstract: A protective film placed on an upper part of a metal film for protecting the metal film placed on a glass substrate. The protective film includes a silica film. The silica film has an extinction coefficient “k” less than or equal to 1×10?4, a refractive index “n” greater than or equal to 1.466 at a wavelength of 632 nm, and a carbon content less than or equal to 3 atomic %.

Abstract: A heat insulating glass unit for vehicle includes a glass plate; a color tone compensation film arranged on at least one surface of the glass plate; a transparent conductive layer arranged on the color tone compensation film, and mainly including an indium tin oxide (ITO); and an upper part layer arranged on the transparent conductive layer, a refraction index for a light with a wavelength of 630 nm being 1.7 or less. The color tone compensation film has at least a first layer and a second layer. The first layer is arranged at a position closer to the glass plate than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer for a light with a wavelength of 630 nm.

Abstract: A heat insulating glass unit for vehicle includes a laminated glass in which a first glass plate and a second glass plate are bonded to each other via an intermediate film; a color tone compensation film arranged on at least one surface of the laminated glass; a transparent conductive layer mainly including an ITO arranged on the color tone compensation film; and an upper part layer arranged on the transparent conductive layer. A refraction index of the upper part layer for a light with a wavelength of 630 nm is 1.7 or less. The color tone compensation film has at least first and second layers. The first layer is arranged at a position closer to the laminated glass than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer.

Abstract: A heat insulating glass unit for vehicle includes a laminated glass in which a first glass plate and a second glass plate are bonded to each other via an intermediate film; a color tone compensation film arranged on at least one surface of the laminated glass; a transparent conductive layer mainly including an ITO arranged on the color tone compensation film; and an upper part layer arranged on the transparent conductive layer. A refraction index of the upper part layer for a light with a wavelength of 630 nm is 1.7 or less. The color tone compensation film has at least first and second layers. The first layer is arranged at a position closer to the laminated glass than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer.

Abstract: A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm?1 to 3800 cm?1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Abstract: A reflective mask blank includes a backside conductive film on a back surface of a substrate. The backside conductive film has a laminated structure including a stress compensation layer and a conductive layer in this order from the substrate side. The conductive layer includes a metal nitride. The stress compensation layer has a compressive stress and the stress compensation layer includes at least one compound selected from the group consisting of oxides, oxynitrides, and nitrides, each having an absorption coefficient (k) over the wavelength range of 400 nm to 800 nm being 0.1 or less. The conductive layer has a thickness of 5 nm or more and 30 nm or less. The backside conductive film has a total thickness of 50 nm or more.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: Provided is a glass sheet with an antireflection film: containing a glass sheet, a first transparent high refractive index layer located on the glass sheet, a first transparent low refractive index layer located on the first transparent high refractive index layer, a second transparent high refractive index layer located on the first transparent low refractive index layer, and a second transparent low refractive index layer located on the second transparent high refractive index layer; having a haze after heating at 600° C. to 700° C. for 15 minutes being 0.4% or less; and having a visible light reflectance measured from the side of the second transparent low refractive index layer based on JIS R 3106 being 1.0% or less.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiO2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiO2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: A heat insulating glass unit for vehicle includes a glass plate; a color tone compensation film arranged on at least one surface of the glass plate; a transparent conductive layer arranged on the color tone compensation film, and mainly including an indium tin oxide (ITO); and an upper part layer arranged on the transparent conductive layer, a refraction index for a light with a wavelength of 630 nm being 1.7 or less. The color tone compensation film has at least a first layer and a second layer. The first layer is arranged at a position closer to the glass plate than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer for a light with a wavelength of 630 nm.

Abstract: A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm?1 to 3800 cm?1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Abstract: A heat insulating glass unit for vehicle includes a laminated glass in which a first glass plate and a second glass plate are bonded to each other via an intermediate film; a color tone compensation film arranged on at least one surface of the laminated glass; a transparent conductive layer mainly including an ITO arranged on the color tone compensation film; and an upper part layer arranged on the transparent conductive layer. A refraction index of the upper part layer for a light with a wavelength of 630 nm is 1.7 or less. The color tone compensation film has at least first and second layers. The first layer is arranged at a position closer to the laminated glass than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer.