Patents by Inventor Hirotoshi Kamata

Hirotoshi Kamata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160096964
    Abstract: There is provided a flaky graphite containing boron, the flaky graphite containing boron having an average thickness of 100 nm or less and an average plate diameter dc of 0.01 to 100 ?m. There is also provided a conductive resin composition comprising a resin component and a carbon component comprising at least the flaky graphite containing boron, wherein the content of the carbon component based on 100 parts by mass of the resin component is 5 to 4000 parts by mass. There are also provided a conductive coating material and a conductive adhesive using the conductive resin composition.
    Type: Application
    Filed: May 15, 2014
    Publication date: April 7, 2016
    Applicant: SHOWA DENKO K.K.
    Inventors: Tomoyuki FUKUYO, Hirotoshi KAMATA
  • Publication number: 20100298506
    Abstract: The present invention relates to a method for producing an amino group-containing phosphate compound, by which the compound can be easily synthesized through a one-step reaction. The method for producing an amino group-containing phosphate compound comprises reacting an aminophenol compound represented by the general formula (1) with a dichlorophosphoric acid compound represented by the general formula (2): (where X1, X2, X3, X4 and X5 each represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms) in the presence of an inorganic basic compound in an aprotic organic solvent, to obtain a amino group-containing phosphate compound represented by the following general formula (3) where X1, X2, X3, X4 and X5 are defined in the same way as in the general formula (2).
    Type: Application
    Filed: June 9, 2006
    Publication date: November 25, 2010
    Applicant: SHOWA HIGHPOLYMER CO., LTD.
    Inventors: Hirotoshi Kamata, Kentarou Takahashi, Hui Li, Boris Ionin
  • Patent number: 7714032
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: May 11, 2010
    Assignee: Showa Denko K.K.
    Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
  • Patent number: 7659413
    Abstract: The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.
    Type: Grant
    Filed: February 9, 2005
    Date of Patent: February 9, 2010
    Assignee: Showa Denko K.K.
    Inventors: Hirotoshi Kamata, Katsutoshi Morinaka, Hiroshi Uchida
  • Patent number: 7622613
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: November 24, 2009
    Assignee: Showa Denko K.K.
    Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
  • Publication number: 20090280331
    Abstract: The present invention is directed to a compound serving as both a flame retardant and a curing agent (a crosslinking agent) for curable resin, a method for producing the compound, a flame-retardant curable resin composition containing the compound, and a cured product and a laminate sheet having flame retardancy produced through curing the cured resin composition. The compound has a benzoxazine structure and a phosphine oxide structure in a molecule thereof.
    Type: Application
    Filed: July 6, 2007
    Publication date: November 12, 2009
    Applicant: Showa Highpolymer Co., Ltd.
    Inventors: Kentarou Takahashi, Hui Li, Hirotoshi Kamata
  • Publication number: 20090274916
    Abstract: The present invention is directed to a compound serving as both a flame retardant and a curing agent (crosslinking agent) for curable resin, a method for producing the compound, a flame-retardant curable resin composition containing the compound, and a cured product and a laminated sheet having flame retardancy produced through curing the cured resin composition. The compound has a benzoxazine structure and a phosphine oxide structure in a molecule thereof.
    Type: Application
    Filed: July 6, 2007
    Publication date: November 5, 2009
    Applicant: SHOWA HIGHPOLYMER CO., LTD
    Inventors: Kentarou Takahashi, Hui Li, Hirotoshi Kamata
  • Patent number: 7569327
    Abstract: This invention relates to a novel polymer compound, and a process for preparing the same and a radical polymerizable, curable composition using the same. The polymer of the invention has in the side chain thereof a structure represented by the formula (1): wherein R1 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, a cycloalkylene group, an aralkylene group and an arylene group, R2 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 20.
    Type: Grant
    Filed: May 25, 2004
    Date of Patent: August 4, 2009
    Assignee: Showda Denko K.K.
    Inventors: Hirotoshi Kamata, Keisuke Ohta, Kazufumi Kai
  • Publication number: 20090105395
    Abstract: The present invention is directed to a novel functional polyorganosiloxane having on average two or more vinyl groups in one molecule thereof. The polyorganosiloxane is represented by the following formula (I): (R23SiO1/2)a(Ph2SiO2/2)b(R1SiO3/2)c(PhSiO3/2)d(R1R2SiO2/2)e??(I) (wherein “a” to “e” represent compositional proportions by mole, satisfying the conditions: 0.15?a?0.4, 0.1?b?0.2, 0.15?c?0.4, 0.2?d?0.4, 0?e?0.2, and “a+b+c+d+e”=1; R1 represents a vinyl group; R2 represents a methyl group or a phenyl group; and Ph denotes a phenyl group) and is produced through polycondensation of an alkoxysilane mixture in the presence of an active solvent. The present invention also relates to a curable resin composition containing the polyorganosiloxane, which composition is suitably employed for encapsulating optical devices such as LEDs, photo-sensors, and lasers as well as optical materials.
    Type: Application
    Filed: April 17, 2007
    Publication date: April 23, 2009
    Applicants: Enikolopov Inst of Synth Poly, Showa Highploymer co., Ltd
    Inventors: Hirotoshi Kamata, Shoji Nishiguchi, Daisuke Yaginuma, Atsushi Sakamoto, Aziz Mansurovich Muzafarov, Nadezhda Andreevna Tebeneva, Viktor Davidovich Myakushev, Natalia Georgievna Vasilenko, Ekaterina Parshina, Ivan Borisovich Meshkov
  • Publication number: 20080286690
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Application
    Filed: July 25, 2008
    Publication date: November 20, 2008
    Inventors: Hirotoshi KAMATA, Mina Onishi, Katsumi Murofushi
  • Publication number: 20080227946
    Abstract: The invention relates to a thermosetting composition comprising (A) a compound having at least one oxetanyl group in the molecule, (B) a compound having at least two carboxyl groups in the molecule, and (C) an imidazolium salt, curing method thereof and products cured thereby. Cured products prepared from the composition of the invention is excellent in electrical isolation, flexibility, adhesiveness and mechanical strength.
    Type: Application
    Filed: April 5, 2005
    Publication date: September 18, 2008
    Inventors: Hirotoshi Kamata, Kazuya Kimura, Hiroshi Uchida
  • Publication number: 20080139688
    Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
    Type: Application
    Filed: October 25, 2005
    Publication date: June 12, 2008
    Applicant: SHOWA DENKO K.K.
    Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
  • Patent number: 7341828
    Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: March 11, 2008
    Assignee: Showa Denko K.K.
    Inventors: Tsuyoshi Katoh, Hirotoshi Kamata, Mina Onishi
  • Publication number: 20070141507
    Abstract: There are provided a novel curable polyester, a cured product thereof, and a process for preparing the same, as well as a resist composition and a jet Printing ink composition comprising the curable polyester, curing methods and uses thereof. The curable polyester of the present invention has a polyester skeleton as a main chain and also has an oxetanyl group at the molecular end. The curable polyester of the present invention is excellent in curability and has excellent flexibility, adhesion and mechanical strength, and also exhibits high safety to the human.
    Type: Application
    Filed: November 4, 2004
    Publication date: June 21, 2007
    Inventors: Yuko Sakata, Hiroshi Uchida, Hirotoshi Kamata
  • Publication number: 20070060760
    Abstract: The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.
    Type: Application
    Filed: February 9, 2005
    Publication date: March 15, 2007
    Inventors: Hirotoshi Kamata, Katsutoshi Morinaka, Hiroshi Uchida
  • Publication number: 20070021571
    Abstract: This invention relates to a novel polymer compound, and a process for preparing the same and a radical polymerizable, curable composition using the same. The polymer of the invention has in the side chain thereof a structure represented by the formula (1): wherein R1 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, a cycloalkylene group, an aralkylene group and an arylene group, R2 each independently represents at least one or more organic residue selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 20.
    Type: Application
    Filed: May 25, 2004
    Publication date: January 25, 2007
    Inventors: Hirotoshi Kamata, Keisuke Ohta, Kazufumi Kai
  • Publication number: 20060079593
    Abstract: The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R1 represents a halogen, and each R2 represents an optionally substituted C1-4 alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like.
    Type: Application
    Filed: October 1, 2003
    Publication date: April 13, 2006
    Inventors: Hirotoshi Kamata, Tatsuhiro Mizo, Mina Onishi
  • Publication number: 20060041053
    Abstract: The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution.
    Type: Application
    Filed: December 17, 2003
    Publication date: February 23, 2006
    Inventors: Hirotoshi Kamata, Masanao Kamijo, Mina Onishi
  • Publication number: 20060036023
    Abstract: The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and/or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).
    Type: Application
    Filed: December 15, 2003
    Publication date: February 16, 2006
    Inventors: Hirotoshi Kamata, Masanao Kamijo, Mina Onishi
  • Publication number: 20050153231
    Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the ?- and/or ?-position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.
    Type: Application
    Filed: February 27, 2003
    Publication date: July 14, 2005
    Applicant: SHOWA DENKO K.K.
    Inventors: Tsuyoshi Katoh, Hirotoshi Kamata, Mina Onishi