Patents by Inventor Hiroyuki Kawahara
Hiroyuki Kawahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240033241Abstract: [Problem] To provide a composition for external skin use that has anti-inflammatory and antiallergic activity and is very safe. [Solution] A composition for external skin use for inflammatory diseases contains dihomo-gamma-linolenic acid (DGLA) as the active ingredient thereof. It is preferable for the DGLA to be present as a glyceride, a phospholipid, or an alkyl ester. The amount of DGLA contained in the composition for external use is 0.1-50 wt %.Type: ApplicationFiled: October 11, 2023Publication date: February 1, 2024Inventors: Jiro TAKEO, Hiroyuki KAWAHARA
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Patent number: 11823929Abstract: Disclosed is a substrate treating apparatus for performing a cleaning treatment on substrates. The apparatus includes an indexer block with an indexer robot, a treating block including a cleaning unit, and a path block disposed between the indexer block and the treating block. The indexer robot includes a guide rail, a base, an articulated arm, and a hand. The guide rail is positioned so as not to overlap a mount position of a substrate in the path block.Type: GrantFiled: January 31, 2023Date of Patent: November 21, 2023Inventors: Yuzo Uchida, Noriyuki Kikumoto, Hiroyuki Kawahara
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Patent number: 11819486Abstract: [Problem] To provide a composition for external skin use that has anti-inflammatory and antiallergic activity, and is very safe. [Solution] A composition for external skin use for inflammatory diseases contains dihomo-gamma-linolenic acid (DGLA) as the active ingredient thereof. It is preferable for the DGLA to be present as a glyceride, a phospholipid, or an alkyl ester. The amount of DGLA contained in the composition for external use is 0.1-50 wt %.Type: GrantFiled: July 20, 2021Date of Patent: November 21, 2023Assignee: NISSUI CORPORATIONInventors: Jiro Takeo, Hiroyuki Kawahara
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Publication number: 20230187245Abstract: Disclosed is a substrate treating apparatus for performing a cleaning treatment on substrates. The apparatus includes an indexer block with an indexer robot, a treating block including a cleaning unit, and a path block disposed between the indexer block and the treating block. The indexer robot includes a guide rail, a base, an articulated arm, and a hand. The guide rail is positioned so as not to overlap a mount position of a substrate in the path block.Type: ApplicationFiled: January 31, 2023Publication date: June 15, 2023Inventors: Yuzo UCHIDA, Noriyuki KIKUMOTO, Hiroyuki KAWAHARA
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Patent number: 11594436Abstract: Disclosed is a substrate treating apparatus for performing a cleaning treatment on substrates. The apparatus includes an indexer block with an indexer robot, a treating block including a front face cleaning unit and a back face cleaning unit as treating units, and a reversing path block including a plurality of shelves on which substrates are placed, and having a reversing function. The indexer robot includes a guide rail, a base, an articulated arm, and a hand. The guide rail is positioned so as not to overlap a mount position of a substrate in the reversing path block.Type: GrantFiled: September 16, 2020Date of Patent: February 28, 2023Inventors: Yuzo Uchida, Noriyuki Kikumoto, Hiroyuki Kawahara
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Patent number: 11581208Abstract: Disclosed is a substrate treating apparatus that performs a cleaning treatment on substrates. A treating block includes a plurality of treating units in an upper and lower stages, respectively. The treating block includes a front face cleaning unit and a back face cleaning unit, each being at least one in number, in the upper stage. The treating block includes at least one tower unit including the front face cleaning unit and the back face cleaning unit, each being at least one in number, in the lower stage. Moreover, a transportation block is provided that includes a center robot in each of the upper and lower stages.Type: GrantFiled: September 10, 2020Date of Patent: February 14, 2023Inventors: Noriyuki Kikumoto, Yuzo Uchida, Hiroyuki Kawahara
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Publication number: 20220271509Abstract: A semiconductor device according to the present application includes a semiconductor substrate, an n-type first cladding layer provided on the semiconductor substrate, an n-type second cladding layer provided on the first cladding layer, an active layer provided on the second cladding layer, a p-type third cladding layer provided on the active layer, a surface electrode provided above the third cladding layer, a back surface electrode provided below the semiconductor substrate and a p-type diffusion prevention layer provided between the first cladding layer and the second cladding layer.Type: ApplicationFiled: October 15, 2019Publication date: August 25, 2022Applicant: Mitsubishi Electric CorporationInventor: Hiroyuki KAWAHARA
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Patent number: 11410865Abstract: A substrate processing apparatus includes a base portion 1541 that is disposed in a manner of being adjacent to a chamber; a hand 155 that holds a substrate S; an arm 1542 that is attached to the base portion 1541, supports the hand, and moves the hand forward and rearward by horizontally moving the hand with respect to the base portion; and a cover portion 156 that accommodates the hand in an internal space. The cover portion has a cover main body 1561 forming the internal space and an extending member 1562 having a hollow structure which penetrates the cover portion in a horizontal direction and of which one end serves as an opening 1562a and being engaged with the cover main body in a state of being movable in the horizontal direction while the opening communicates with the internal space.Type: GrantFiled: May 13, 2020Date of Patent: August 9, 2022Assignee: SCREEN Holdings Co., Ltd.Inventors: Hiroyuki Kawahara, Koji Hashimoto, Noriyuki Kikumoto, Noritake Sumi
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Publication number: 20220165599Abstract: In a substrate processing apparatus in which a substrate is transported into multiple chambers by using multiple transport mechanisms, while a first transport unit is responsible for the transport of the substrate into the first chamber and the transport of the substrate out from the second chamber, the second transport unit is responsible for the transfer of the substrate from the first chamber to the second chamber. With respect to a transfer zone which is a transport route of the substrate from the first chamber to the second chamber, the first transport unit is arranged above and the second transport unit is arranged below. Since entry into the transfer zone is exclusively allowed, the two transport units can operate individually while avoiding mutual interference.Type: ApplicationFiled: February 26, 2020Publication date: May 26, 2022Inventors: Hiroyuki KAWAHARA, Koji HASHIMOTO, Noriyuki KIKUMOTO, Noritake SUMI
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Patent number: 11329454Abstract: What is provided here are: a step of forming a first semiconductor layer on a base member; a step of forming a mask on the first semiconductor layer; a step of etching the first semiconductor layer by using the mask, to thereby form a semiconductor structure; a step of forming a second semiconductor layer in a region abutting on a side surface of the semiconductor structure, said second semiconductor layer having a convex portion abutting to the mask; a convex-portion removing step of removing the convex portion by supplying an etching gas thereto; and a regrown-layer forming step of supplying a material gas onto the semiconductor structure and the second semiconductor layer, to thereby form a regrown layer; wherein the convex-portion removing step and the regrown-layer forming step are executed in a same manufacturing apparatus.Type: GrantFiled: March 26, 2018Date of Patent: May 10, 2022Assignee: Mitsubishi Electric CorporationInventor: Hiroyuki Kawahara
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Publication number: 20210346330Abstract: [Problem] To provide a composition for external skin use that has anti-inflammatory and antiallergic activity, and is very safe. [Solution] A composition for external skin use for inflammatory diseases contains dihomo-gamma-linolenic acid (DGLA) as the active ingredient thereof. It is preferable for the DGLA to be present as a glyceride, a phospholipid, or an alkyl ester. The amount of DGLA contained in the composition for external use is 0.1-50 wt %.Type: ApplicationFiled: July 20, 2021Publication date: November 11, 2021Inventors: Jiro TAKEO, Hiroyuki KAWAHARA
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Publication number: 20210313772Abstract: An optical semiconductor device is provided with: a mesa in which a first conductivity type cladding layer, an active layer, and a second conductivity type first cladding layer having a second conductivity type are sequentially laminated on a surface of a first conductivity type substrate; a buried layer that buries both sides of the mesa with a top of the mesa being exposed; and a second conductivity type second cladding layer that buries the buried layer and the top of the mesa exposed from the buried layer, wherein the buried layer includes a layer doped with a semi-insulating material, and a boundary between the second conductivity type first cladding layer and the buried layer is inclined so that a width of the second conductivity-type first cladding layer becomes narrower toward the top of the mesa.Type: ApplicationFiled: November 1, 2018Publication date: October 7, 2021Applicant: Mitsubishi Electric CorporationInventors: Hiroyuki KAWAHARA, Eiji NAKAI
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Patent number: 11103476Abstract: [Problem] To provide a composition for external skin use that has anti-inflammatory and antiallergic activity, and is very safe. [Solution] A composition for external skin use for inflammatory diseases contains dihomo-gamma-linolenic acid (DGLA) as the active ingredient thereof. It is preferable for the DGLA to be present as a glyceride, a phospholipid, or an alkyl ester. The amount of DGLA contained in the composition for external use is 0.1-50 wt %.Type: GrantFiled: November 20, 2019Date of Patent: August 31, 2021Assignee: NIPPON SUISAN KAISHA, LTD.Inventors: Jiro Takeo, Hiroyuki Kawahara
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Publication number: 20210126432Abstract: What is provided here are: a step of forming a first semiconductor layer on a base member; a step of forming a mask on the first semiconductor layer; a step of etching the first semiconductor layer by using the mask, to thereby form a semiconductor structure; a step of forming a second semiconductor layer in a region abutting on a side surface of the semiconductor structure, said second semiconductor layer having a convex portion abutting to the mask; a convex-portion removing step of removing the convex portion by supplying an etching gas thereto; and a regrown-layer forming step of supplying a material gas onto the semiconductor structure and the second semiconductor layer, to thereby form a regrown layer; wherein the convex-portion removing step and the regrown-layer forming step are executed in a same manufacturing apparatus.Type: ApplicationFiled: March 26, 2018Publication date: April 29, 2021Applicant: Mitsubishi Electric CorporationInventor: Hiroyuki KAWAHARA
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Publication number: 20210098270Abstract: Disclosed is a substrate treating apparatus for performing a cleaning treatment on substrates. The apparatus includes an indexer block with an indexer robot, a treating block including a front face cleaning unit and a back face cleaning unit as treating units, and a reversing path block including a plurality of shelves on which substrates are placed, and having a reversing function. The indexer robot includes a guide rail, a base, an articulated arm, and a hand. The guide rail is positioned so as not to overlap a mount position of a substrate in the reversing path block.Type: ApplicationFiled: September 16, 2020Publication date: April 1, 2021Inventors: Yuzo UCHIDA, Noriyuki KIKUMOTO, Hiroyuki KAWAHARA
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Publication number: 20210082720Abstract: Disclosed is a substrate treating apparatus that performs a cleaning treatment on substrates. A treating block includes a plurality of treating units in an upper and lower stages, respectively. The treating block includes a front face cleaning unit and a back face cleaning unit, each being at least one in number, in the upper stage. The treating block includes at least one tower unit including the front face cleaning unit and the back face cleaning unit, each being at least one in number, in the lower stage. Moreover, a transportation block is provided that includes a center robot in each of the upper and lower stages.Type: ApplicationFiled: September 10, 2020Publication date: March 18, 2021Inventors: Noriyuki KIKUMOTO, Yuzo UCHIDA, Hiroyuki KAWAHARA
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Patent number: 10903620Abstract: There are included: a substrate; a semiconductor laser part formed on the substrate by stacking a plurality of layers including an active layer; and an adjacent part formed on the substrate by stacking a plurality of layers including a core layer, and being an optical modulator or an optical waveguide in contact with the semiconductor laser part through butt joint joining thereto. In a semiconductor device including the semiconductor laser part and the adjacent part which are joined in a butt joint manner, at least a portion, of the semiconductor laser part, that is contact with the adjacent part is disordered.Type: GrantFiled: May 19, 2017Date of Patent: January 26, 2021Assignee: Mitsubishi Electric CorporationInventor: Hiroyuki Kawahara
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Patent number: 10862268Abstract: A semiconductor device includes a substrate, a semiconductor laser part formed on the substrate and having an active layer with an uniform composition and a first ridge structure, and an adjacent part formed on the substrate, having a core layer with an uniform composition and a second ridge structure, and being an optical modulator or an optical waveguide which is in contact with the semiconductor laser part, wherein the first ridge structure is largest in width at a first contact part which is in contact with the second ridge structure, and the second ridge structure is largest in width at a second contact part which is in contact with the first ridge structure.Type: GrantFiled: April 4, 2017Date of Patent: December 8, 2020Assignee: Mitsubishi Electric CorporationInventor: Hiroyuki Kawahara
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Publication number: 20200365437Abstract: A substrate processing apparatus includes a base portion 1541 that is disposed in a manner of being adjacent to a chamber; a hand 155 that holds a substrate S; an arm 1542 that is attached to the base portion 1541, supports the hand, and moves the hand forward and rearward by horizontally moving the hand with respect to the base portion; and a cover portion 156 that accommodates the hand in an internal space. The cover portion has a cover main body 1561 forming the internal space and an extending member 1562 having a hollow structure which penetrates the cover portion in a horizontal direction and of which one end serves as an opening 1562a and being engaged with the cover main body in a state of being movable in the horizontal direction while the opening communicates with the internal space.Type: ApplicationFiled: May 13, 2020Publication date: November 19, 2020Applicant: SCREEN Holdings Co., Ltd.Inventors: Hiroyuki KAWAHARA, Koji HASHIMOTO, Noriyuki KIKUMOTO, Noritake SUMI
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Publication number: 20200108038Abstract: [Problem] To provide a composition for external skin use that has anti-inflammatory and antiallergic activity, and is very safe. [Solution] A composition for external skin use for inflammatory diseases contains dihomo-gamma-linolenic acid (DGLA) as the active ingredient thereof. It is preferable for the DGLA to be present as a glyceride, a phospholipid, or an alkyl ester. The amount of DGLA contained in the composition for external use is 0.1-50 wt %.Type: ApplicationFiled: November 20, 2019Publication date: April 9, 2020Inventors: Jiro TAKEO, Hiroyuki KAWAHARA