Patents by Inventor Hiroyuki Nawa

Hiroyuki Nawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060167026
    Abstract: The purpose of this invention is to provide an agent useful for prevention and/or treatment of psychosis, schizophrenia and cognitive impairments. To solve this problem, this invention provides epidermal growth factor receptor inhibitors as therapeutic agents for psychosis, schizophrenia and cognitive impairments.
    Type: Application
    Filed: January 5, 2004
    Publication date: July 27, 2006
    Applicant: Hiroyuki Nawa
    Inventors: Hiroyuki Nawa, Makoto Mizuno
  • Publication number: 20060099593
    Abstract: An object of the present invention is. to provide an objective method for diagnosis of schizophrenia using gene expression in mononuclear cells of peripheral blood as an index, and this invention provide a method for diagnosing whether a test subject suffers from schizophrenia or not.
    Type: Application
    Filed: September 26, 2003
    Publication date: May 11, 2006
    Applicants: Japan Science and Technology Agency, National University Corporation Niigata University
    Inventors: Hiroyuki Nawa, Toshiyuki Someya, Tatsuyuki Muratake, Meiko Kawamura
  • Publication number: 20040241685
    Abstract: An object of the present invention is to contribute to objective diagnosis of schizophrenia with use of gene expression as an index. A method to analyze in a test subject whether expression of nucleic acid(s) defining gene(s) exhibiting altered expression by schizophrenia is statistically included within the range of normal subject or not is provided by the present invention. The present method comprises the step of quantifying the amount of expression of nucleic acid(s) defining gene(s) exhibiting altered expression by schizophrenia and/or protein(s) encoded by said nucleic acid(s) defining gene(s) exhibiting altered expression by schizophrenia.
    Type: Application
    Filed: July 1, 2004
    Publication date: December 2, 2004
    Inventors: Hiroyuki Nawa, Hitoshi Takahashi, Shuji Iritani
  • Publication number: 20040103447
    Abstract: The present invention relates to a schizophrenia-like cognitive dysfunction animal model; a method of preparing the same; and a method of evaluating schizophrenia-like cognitive dysfunction by using said model. Specifically, the present invention relates to the preparation of a mammal showing continuous cognitive abnormality after sexual maturation, by allowing an excessive presence of interleukin 1 or an analog thereof and/or an intracellular signal transducer induced by interleukin 1 or an analog thereof in the body of young animal during the stages of brain function development; and a method of evaluating cognitive dysfunction by ethologically measuring the cognitive abnormality in the animal.
    Type: Application
    Filed: October 1, 2003
    Publication date: May 27, 2004
    Inventors: Hiroyuki Nawa, Makoto Oka
  • Publication number: 20030157548
    Abstract: Provided is a method for diagnosing whether or not a subject suffers from schizophrenia, comprising the steps of taking a sample containing nucleic acid and/or protein from the subject, quantifying nucleic acid and/or protein corresponding to at least one gene selected from the group consisting of genes listed in Table 1 below, fragments thereof, and complementary nucleic acid thereof, and diagnosing whether or not the subject suffers from schizophrenia by using a quantitative value of at least one protein, a fragment thereof or the nucleic acid.
    Type: Application
    Filed: March 17, 2003
    Publication date: August 21, 2003
    Inventors: Hiroyuki Nawa, Hitoshi Takahashi, Shuji Iritani
  • Publication number: 20030077678
    Abstract: According to the present invention, a diagnostic kit for schizophrenia was provided and the diagnostic kit comprises measurement of serum epidermal growth factor content using anti-epidermal growth factor antibody. The diagnosis kit according to this invention is useful for objective diagnosis of schizophrenia.
    Type: Application
    Filed: September 9, 2002
    Publication date: April 24, 2003
    Inventors: Hiroyuki Nawa, Takashi Futamura, Toshiyuki Someya, Koue Asama
  • Publication number: 20030056232
    Abstract: To provide a an animal with schizophrenic sensorimotor and behavioral abnormalities, a specific protein factor inhibiting development of brain function is administrated to a juvenile animal in the stage of its development and an animal exhibiting sensorimotor and behavioral abnormalities is prepared. As the sensorimotor and behavioral abnormalities observed in the animal of the present invention is very similar to schizophrenia, the animal is useful for development of an anti-schizophrenic medicine and a diagnostic agent for schizophrenia.
    Type: Application
    Filed: September 6, 2002
    Publication date: March 20, 2003
    Inventors: Hiroyuki Nawa, Takashi Futamura
  • Patent number: 6433019
    Abstract: The present invention relates to a neurotrophic factor secretagogue, in particular, to a BDNF (brain-derived neurotrophic factor) secretagogue, which comprises as an active ingredient an NO donor. The medicament of the present invention promotes the secretion of neurotrophic factors from mammalian central neural cells. Thus, the medicament of the present invention, i.e., NO donor, is possibly applicable to the treatment of diseases caused by neutrotrophic factors, for example, neurodegenerative diseases, and is expected to exhibit the efficacious effects thereon. Also, the present invention provides a novel medication for neurodegenerative diseases.
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: August 13, 2002
    Assignee: Sumitomo Pharmaceuticals Company, Limited
    Inventor: Hiroyuki Nawa
  • Patent number: 5830857
    Abstract: A method is described for the therapeutic use of brain-derived neurotrophic factor (BDNF) to treat epilepsy.
    Type: Grant
    Filed: July 14, 1995
    Date of Patent: November 3, 1998
    Assignee: Amgen Inc.
    Inventors: Josette Fran.cedilla.oise Carnahan, Antoine Depaulis, Paul Feltz, Yves Larmet, Christian Marescaux, Hiroyuki Nawa
  • Patent number: 5244501
    Abstract: An apparatus for a chemical vapor deposition in which at least one substrate which has partially an insulating film on the surface thereof is disposed in a pressure reduced reaction chamber, the reaction chamber is provided with a nozzle for feeding a reactive gas into the reaction chamber, and a light source is provided for emitting a light beam to heat the substrate. The combination of substrate heating source using infrared rays and a laminarized jet of reactive gas is utilized for maintaining the selectivity, facilitating the thin film forming reaction, and improving the high reproducibility and controllability.
    Type: Grant
    Filed: July 22, 1991
    Date of Patent: September 14, 1993
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta
  • Patent number: 5125360
    Abstract: A vacuum processing apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber can be mechanically and easily controlled by adjusting the position of a susceptor in respect to an electrode body, and the susceptor and other components in the vacuum chamber can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: June 30, 1992
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko
  • Patent number: 4924807
    Abstract: An apparatus for a chemical vapor deposition in which at least one substrate which has partially an insulating film on the surface thereof is disposed in a pressure reduced reaction chamber, the reaction chamber is provided with a nozzle for feeding a reactive gas into the reaction chamber, and a light source is provided for emitting a light beam to heat the substrate. The apparatus has provision for feeding a second gas opposite the substrate to put the reactive gas in the vicinity of the substrate surface into laminar flow. The combination of substrate heating source using infrared rays and the laminarized jet of reactive gas is utilized for maintaining the selectivity, facilitating the thin film forming reaction, and obtaining improved high reproducibility and controllability.
    Type: Grant
    Filed: July 24, 1987
    Date of Patent: May 15, 1990
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko, Yoshiro Kusumoto, Kazuo Takakuwa, Tetsuya Ikuta
  • Patent number: 4902531
    Abstract: A vacuum processing method and apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber can be mechanically and easily controlled by adjusting the position of a susceptor in respect to an electrode body, and the susceptor and other components in the vacuum chamber can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber.
    Type: Grant
    Filed: October 27, 1987
    Date of Patent: February 20, 1990
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Izumi Nakayama, Akitoshi Suzuki, Hiroyuki Nawa, Motohiro Kaneko