Patents by Inventor Hiroyuki Nishimura
Hiroyuki Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10600016Abstract: For each business process of N business processes of the business (N at least 1), a two-dimensional symmetric dissimilarity matrix in which the rows and columns denote the business components of the business is generated. Each off-diagonal element of the symmetric dissimilarity matrix is specific to a pair of two different business components and (I) includes an only dissimilarity measure assigned to the pair of two different business components, (ii) includes a mean of dissimilarity measures assigned to the pair of two different business components, or (iii) is blank which denotes that no dissimilarity measure has been assigned to the pair of two different business components. A rotatable spatial distribution of the business components, derived from the symmetric dissimilarity matrix, is displayed to a user who subsequently selects one or more business components for usage in a manner that reflects the spatial distances between the displayed business components.Type: GrantFiled: June 14, 2017Date of Patent: March 24, 2020Assignee: International Business Machines CorporationInventor: Hiroyuki Nishimura
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Patent number: 10597766Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.Type: GrantFiled: March 24, 2014Date of Patent: March 24, 2020Assignee: Dai Nippon Printing Co., Ltd.Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
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Patent number: 10597768Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.Type: GrantFiled: November 14, 2018Date of Patent: March 24, 2020Assignee: Dai Nippon Printing Co., Ltd.Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
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Publication number: 20200034760Abstract: A method and system for utilizing dissimilarity among business components of a business. For each business process of N business processes of a business, N two-dimensional symmetric dissimilarity matrices are stored, wherein N is at least 1. A single dissimilarity matrix is generated, wherein if N=1, the single dissimilarity matrix is a copy of a two-dimensional symmetric dissimilarity matrix of the N two-dimensional symmetric dissimilarity matrices, and wherein if N is at least 2, the elements of the single dissimilarity matrix are a mean of corresponding elements of the N dissimilarity matrices. A rotatable spatial distribution of the business components, derived from the single dissimilarity matrix, is displayed to a user who subsequently selects one or more business components for usage in a manner that reflects the spatial distances between the displayed business components.Type: ApplicationFiled: October 1, 2019Publication date: January 30, 2020Inventor: Hiroyuki Nishimura
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Patent number: 10526987Abstract: A NOx catalyst is provided on an exhaust passage of an engine. The NOx catalyst reduces the occluded NOx when an air-fuel ratio of exhaust gas is in the vicinity of a stoichiometric air-fuel ratio or in a richer state than the stoichiometric air-fuel ratio. Turbocharging is executed by turbochargers. In a low load region within the reduction execution region, a target air-fuel ratio is achieved, as required for NOx reduction, by air amount adjustment with an air amount control valve provided on an intake passage. Since a large amount of air is needed in the high load region within the reduction execution region, the target air-fuel ratio is achieved by air amount adjustment using turbocharging pressure control.Type: GrantFiled: May 4, 2018Date of Patent: January 7, 2020Assignee: Mazda Motor CorporationInventors: Masanobu Kanno, Hiroyuki Nishimura, Kenji Tanimura, Kenta Ando
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Publication number: 20190363257Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.Type: ApplicationFiled: August 6, 2019Publication date: November 28, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
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Publication number: 20190329277Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.Type: ApplicationFiled: July 9, 2019Publication date: October 31, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Yoshinori HIROBE, Yutaka MATSUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA, Takashi TAKEKOSHI
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Patent number: 10443521Abstract: An exhaust emission control system of an engine is provided, which includes a NOx catalyst disposed in an exhaust passage for storing NOx within exhaust gas when an air-fuel ratio of the exhaust gas is lean, and reducing the stored NOx when the air-fuel ratio is approximately stoichiometric or rich. A processor executes a NOx reduction controlling module for performing a NOx reduction control in which a fuel injector performs a post injection to control the air-fuel ratio to a target ratio, and an EGR controlling module for controlling an EGR valve to recirculate EGR gas. In the NOx reduction control, the EGR controlling module controls an opening of the EGR valve to a target opening smaller than when the NOx reduction control is not performed. The NOx reduction controlling module starts the control after the EGR valve opening is controlled to the target opening.Type: GrantFiled: June 30, 2017Date of Patent: October 15, 2019Assignee: Mazda Motor CorporationInventors: Masonobu Kanno, Hiroyuki Nishimura, Kenji Tanimura
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Publication number: 20190296240Abstract: A method for producing a multiple-surface imposition vapor deposition mask that enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.Type: ApplicationFiled: April 2, 2019Publication date: September 26, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Yoshinori HIROBE, Yutaka MATASUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Katsunari OBATA, Hiroyuki NISHIMURA
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Patent number: 10391511Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.Type: GrantFiled: November 8, 2018Date of Patent: August 27, 2019Assignee: Dai Nippon Printing Co., Ltd.Inventors: Yoshinori Hirobe, Yutaka Matsumoto, Masato Ushikusa, Toshihiko Takeda, Hiroyuki Nishimura, Katsunari Obata, Takashi Takekoshi
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Publication number: 20190248659Abstract: Realized is a solid substance concentration managing method which allows quick detection of an abnormality in a chemical reactor. The present invention is an invention of a solid substance concentration managing method of managing a concentration of a solid substance which is contained in a residue that is discharged in a reaction product gas processing step included in a trichlorosilane producing method, the solid substance concentration managing method including a concentration measuring step of measuring the concentration of the solid substance which is contained in an after-crystallization residue that is obtained by crystallizing part of aluminum chloride.Type: ApplicationFiled: October 6, 2017Publication date: August 15, 2019Inventors: Junichi ISHIDA, Masami ENOKUCHI, Isao YAMASHITA, Yoshikazu KODAMA, Hiroyuki NISHIMURA
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Publication number: 20190242312Abstract: An engine control device is provided, which includes an oxidation catalyst provided in an exhaust passage to oxidize unburned fuel within exhaust gas, a NOx catalyst provided integrally with or downstream of the oxidation catalyst, a PM filter provided in the exhaust passage downstream of the oxidation catalyst to capture fine particulate matter within the exhaust gas, a fuel injector, and a controller. When the particulate matter is accumulated by a given amount, the controller starts a PM filter regeneration control to remove the particulate matter, and after this control is started and when the accumulation amount decreases by a given amount, the controller starts a NOx catalyst regeneration control to switch between a first state in which an air-fuel ratio of the exhaust gas is a stoichiometric air-fuel ratio or less and a second state in which the air-fuel ratio is higher than the stoichiometric air-fuel ratio.Type: ApplicationFiled: January 31, 2019Publication date: August 8, 2019Inventors: Hiroyuki Nishimura, Hiroshi Hayashibara, Goro Tsuboi, Hiroshi Yamada, Yoshiyuki Sato, Yoshio Mizuta
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Publication number: 20190234330Abstract: An exhaust gas controller for an engine is equipped to appropriately regenerate a filter while restraining a deterioration in fuel efficiency. An oxidation catalyst and a filter capable of collecting particles in an exhaust passage, such that a regenerative injection in which fuel is injected for regenerating the filter is performed, even when a main injection is stopped. Under a first operating condition, in which the main injection is performed and a regeneration condition for the filter is satisfied, the regenerative injection is performed after the main injection. Under a second operating condition, in which the main injection is stopped and the regeneration condition for the filter is satisfied, a fuel injector is controlled to perform a former injection Q1 during a compression stroke and latter injections Q2, Q3 during an expansion stroke, as the regenerative injection.Type: ApplicationFiled: January 31, 2019Publication date: August 1, 2019Applicant: Mazda Motor CorporationInventors: Hiroyuki Nishimura, Koichi Sugimoto
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Publication number: 20190232225Abstract: An exhaust emission control device for an engine is provided with a first purifying catalyst including an HC adsorbent that adsorbs HC at a low temperature and releases HC at a high temperature and a diesel oxidation catalyst capable of oxidizing HC, a second purifying catalyst including a NOx catalyst capable of storing NOx contained in exhaust, a NOx catalyst regenerator that regenerates the NOx catalyst while raising the temperature of the NOx catalyst, and HC controller that decides whether the amount of adsorbed HC that is HC adsorbed by the HC adsorbent is equal to or more than a preset reference amount and, when the amount of adsorbed HC is decided to be equal to or more than the reference amount, raises the temperature of the first purifying catalyst.Type: ApplicationFiled: January 31, 2019Publication date: August 1, 2019Applicant: Mazda Motor CorporationInventors: Hiroyuki Nishimura, Koichi Sugimoto, Masanobu Kanno
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Patent number: 10316782Abstract: A pressure reducing valve control apparatus is provided for a fuel supply system having a common rail and a pressure reducing valve to control rail pressure in the common rail by controlling a current supply state of the pressure reducing valve. The pressure reducing valve operates to open a valve body for discharging fuel from the common rail against a biasing force applied in a valve-closing direction by fuel-generated valve-opening force biasing the valve body in a valve-opening direction by the rail pressure and an electromagnetic force generated by current supply to an electromagnetic coil. The ECU starts to open the valve body during a period of holding a hold value by holding current supplied to the electromagnetic coil at a predetermined hold value after starting current supply to the electromagnetic coil. The ECU sets the hold value to increase as the rail pressure decreases.Type: GrantFiled: September 19, 2017Date of Patent: June 11, 2019Assignee: DENSO CORPORATIONInventors: Takuya Sakai, Hiroyuki Nishimura
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Publication number: 20190155346Abstract: An electronic apparatus includes a circuit board including a processor, and a pluggable board detachably coupled to the circuit board, wherein the pluggable board includes a first arbitration circuit that autonomously outputs a control request to the circuit board, and the circuit board performs processing based on the control request and supplies a result of the processing to the pluggable board.Type: ApplicationFiled: November 15, 2018Publication date: May 23, 2019Applicant: FUJITSU LIMITEDInventors: Tomohiro UENO, Hiroyuki Kitajima, Hiroyuki Nishimura, Kiyoshi Miyano
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Patent number: 10283969Abstract: A solar photovoltaic output optimizer circuit includes a PV input device for receiving output of a solar photovoltaic panel; a switching device for converting a DC voltage input through the PV input device into a predetermined pulse voltage or AC voltage; and a voltage doubler rectification device for stepping up power output of the switching device to a predetermined voltage. The PV input device includes: an inductance L1 connected in series to “+” output of the PV panel; and a surge protection circuit that is connected in parallel to the inductance L1, operates so as to absorb surge voltage to occur in output of the inductance L1 only when output of the PV panel is small and normal control cannot be performed, and is automatically separated from the inductance L1 when the output of the PV panel is large.Type: GrantFiled: August 6, 2015Date of Patent: May 7, 2019Assignees: MERSINTEL, CO., LTD., CLEAN ENERGY FACTORY CO., LTD.Inventor: Hiroyuki Nishimura
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Publication number: 20190123280Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.Type: ApplicationFiled: December 18, 2018Publication date: April 25, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
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Publication number: 20190100835Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.Type: ApplicationFiled: November 14, 2018Publication date: April 4, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Katsunari OBATA, Toshihiko TAKEDA, Hiroshi KAWASAKI, Hiroyuki NISHIMURA, Atsushi MAKI, Hiromitsu OCHIAI, Yoshinori HIROBE
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Publication number: 20190070625Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.Type: ApplicationFiled: November 8, 2018Publication date: March 7, 2019Applicant: Dai Nippon Printing Co., Ltd.Inventors: Yoshinori HIROBE, Yutaka MATSUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA, Takashi TAKEKOSHI