Patents by Inventor Hiroyuki Nishimura

Hiroyuki Nishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10600016
    Abstract: For each business process of N business processes of the business (N at least 1), a two-dimensional symmetric dissimilarity matrix in which the rows and columns denote the business components of the business is generated. Each off-diagonal element of the symmetric dissimilarity matrix is specific to a pair of two different business components and (I) includes an only dissimilarity measure assigned to the pair of two different business components, (ii) includes a mean of dissimilarity measures assigned to the pair of two different business components, or (iii) is blank which denotes that no dissimilarity measure has been assigned to the pair of two different business components. A rotatable spatial distribution of the business components, derived from the symmetric dissimilarity matrix, is displayed to a user who subsequently selects one or more business components for usage in a manner that reflects the spatial distances between the displayed business components.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: March 24, 2020
    Assignee: International Business Machines Corporation
    Inventor: Hiroyuki Nishimura
  • Patent number: 10597766
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Patent number: 10597768
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: March 24, 2020
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari Obata, Toshihiko Takeda, Hiroshi Kawasaki, Hiroyuki Nishimura, Atsushi Maki, Hiromitsu Ochiai, Yoshinori Hirobe
  • Publication number: 20200034760
    Abstract: A method and system for utilizing dissimilarity among business components of a business. For each business process of N business processes of a business, N two-dimensional symmetric dissimilarity matrices are stored, wherein N is at least 1. A single dissimilarity matrix is generated, wherein if N=1, the single dissimilarity matrix is a copy of a two-dimensional symmetric dissimilarity matrix of the N two-dimensional symmetric dissimilarity matrices, and wherein if N is at least 2, the elements of the single dissimilarity matrix are a mean of corresponding elements of the N dissimilarity matrices. A rotatable spatial distribution of the business components, derived from the single dissimilarity matrix, is displayed to a user who subsequently selects one or more business components for usage in a manner that reflects the spatial distances between the displayed business components.
    Type: Application
    Filed: October 1, 2019
    Publication date: January 30, 2020
    Inventor: Hiroyuki Nishimura
  • Patent number: 10526987
    Abstract: A NOx catalyst is provided on an exhaust passage of an engine. The NOx catalyst reduces the occluded NOx when an air-fuel ratio of exhaust gas is in the vicinity of a stoichiometric air-fuel ratio or in a richer state than the stoichiometric air-fuel ratio. Turbocharging is executed by turbochargers. In a low load region within the reduction execution region, a target air-fuel ratio is achieved, as required for NOx reduction, by air amount adjustment with an air amount control valve provided on an intake passage. Since a large amount of air is needed in the high load region within the reduction execution region, the target air-fuel ratio is achieved by air amount adjustment using turbocharging pressure control.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: January 7, 2020
    Assignee: Mazda Motor Corporation
    Inventors: Masanobu Kanno, Hiroyuki Nishimura, Kenji Tanimura, Kenta Ando
  • Publication number: 20190363257
    Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.
    Type: Application
    Filed: August 6, 2019
    Publication date: November 28, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
  • Publication number: 20190329277
    Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.
    Type: Application
    Filed: July 9, 2019
    Publication date: October 31, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yoshinori HIROBE, Yutaka MATSUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA, Takashi TAKEKOSHI
  • Patent number: 10443521
    Abstract: An exhaust emission control system of an engine is provided, which includes a NOx catalyst disposed in an exhaust passage for storing NOx within exhaust gas when an air-fuel ratio of the exhaust gas is lean, and reducing the stored NOx when the air-fuel ratio is approximately stoichiometric or rich. A processor executes a NOx reduction controlling module for performing a NOx reduction control in which a fuel injector performs a post injection to control the air-fuel ratio to a target ratio, and an EGR controlling module for controlling an EGR valve to recirculate EGR gas. In the NOx reduction control, the EGR controlling module controls an opening of the EGR valve to a target opening smaller than when the NOx reduction control is not performed. The NOx reduction controlling module starts the control after the EGR valve opening is controlled to the target opening.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: October 15, 2019
    Assignee: Mazda Motor Corporation
    Inventors: Masonobu Kanno, Hiroyuki Nishimura, Kenji Tanimura
  • Publication number: 20190296240
    Abstract: A method for producing a multiple-surface imposition vapor deposition mask that enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
    Type: Application
    Filed: April 2, 2019
    Publication date: September 26, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yoshinori HIROBE, Yutaka MATASUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Katsunari OBATA, Hiroyuki NISHIMURA
  • Patent number: 10391511
    Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: August 27, 2019
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Yoshinori Hirobe, Yutaka Matsumoto, Masato Ushikusa, Toshihiko Takeda, Hiroyuki Nishimura, Katsunari Obata, Takashi Takekoshi
  • Publication number: 20190248659
    Abstract: Realized is a solid substance concentration managing method which allows quick detection of an abnormality in a chemical reactor. The present invention is an invention of a solid substance concentration managing method of managing a concentration of a solid substance which is contained in a residue that is discharged in a reaction product gas processing step included in a trichlorosilane producing method, the solid substance concentration managing method including a concentration measuring step of measuring the concentration of the solid substance which is contained in an after-crystallization residue that is obtained by crystallizing part of aluminum chloride.
    Type: Application
    Filed: October 6, 2017
    Publication date: August 15, 2019
    Inventors: Junichi ISHIDA, Masami ENOKUCHI, Isao YAMASHITA, Yoshikazu KODAMA, Hiroyuki NISHIMURA
  • Publication number: 20190242312
    Abstract: An engine control device is provided, which includes an oxidation catalyst provided in an exhaust passage to oxidize unburned fuel within exhaust gas, a NOx catalyst provided integrally with or downstream of the oxidation catalyst, a PM filter provided in the exhaust passage downstream of the oxidation catalyst to capture fine particulate matter within the exhaust gas, a fuel injector, and a controller. When the particulate matter is accumulated by a given amount, the controller starts a PM filter regeneration control to remove the particulate matter, and after this control is started and when the accumulation amount decreases by a given amount, the controller starts a NOx catalyst regeneration control to switch between a first state in which an air-fuel ratio of the exhaust gas is a stoichiometric air-fuel ratio or less and a second state in which the air-fuel ratio is higher than the stoichiometric air-fuel ratio.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 8, 2019
    Inventors: Hiroyuki Nishimura, Hiroshi Hayashibara, Goro Tsuboi, Hiroshi Yamada, Yoshiyuki Sato, Yoshio Mizuta
  • Publication number: 20190234330
    Abstract: An exhaust gas controller for an engine is equipped to appropriately regenerate a filter while restraining a deterioration in fuel efficiency. An oxidation catalyst and a filter capable of collecting particles in an exhaust passage, such that a regenerative injection in which fuel is injected for regenerating the filter is performed, even when a main injection is stopped. Under a first operating condition, in which the main injection is performed and a regeneration condition for the filter is satisfied, the regenerative injection is performed after the main injection. Under a second operating condition, in which the main injection is stopped and the regeneration condition for the filter is satisfied, a fuel injector is controlled to perform a former injection Q1 during a compression stroke and latter injections Q2, Q3 during an expansion stroke, as the regenerative injection.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Applicant: Mazda Motor Corporation
    Inventors: Hiroyuki Nishimura, Koichi Sugimoto
  • Publication number: 20190232225
    Abstract: An exhaust emission control device for an engine is provided with a first purifying catalyst including an HC adsorbent that adsorbs HC at a low temperature and releases HC at a high temperature and a diesel oxidation catalyst capable of oxidizing HC, a second purifying catalyst including a NOx catalyst capable of storing NOx contained in exhaust, a NOx catalyst regenerator that regenerates the NOx catalyst while raising the temperature of the NOx catalyst, and HC controller that decides whether the amount of adsorbed HC that is HC adsorbed by the HC adsorbent is equal to or more than a preset reference amount and, when the amount of adsorbed HC is decided to be equal to or more than the reference amount, raises the temperature of the first purifying catalyst.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Applicant: Mazda Motor Corporation
    Inventors: Hiroyuki Nishimura, Koichi Sugimoto, Masanobu Kanno
  • Patent number: 10316782
    Abstract: A pressure reducing valve control apparatus is provided for a fuel supply system having a common rail and a pressure reducing valve to control rail pressure in the common rail by controlling a current supply state of the pressure reducing valve. The pressure reducing valve operates to open a valve body for discharging fuel from the common rail against a biasing force applied in a valve-closing direction by fuel-generated valve-opening force biasing the valve body in a valve-opening direction by the rail pressure and an electromagnetic force generated by current supply to an electromagnetic coil. The ECU starts to open the valve body during a period of holding a hold value by holding current supplied to the electromagnetic coil at a predetermined hold value after starting current supply to the electromagnetic coil. The ECU sets the hold value to increase as the rail pressure decreases.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: June 11, 2019
    Assignee: DENSO CORPORATION
    Inventors: Takuya Sakai, Hiroyuki Nishimura
  • Publication number: 20190155346
    Abstract: An electronic apparatus includes a circuit board including a processor, and a pluggable board detachably coupled to the circuit board, wherein the pluggable board includes a first arbitration circuit that autonomously outputs a control request to the circuit board, and the circuit board performs processing based on the control request and supplies a result of the processing to the pluggable board.
    Type: Application
    Filed: November 15, 2018
    Publication date: May 23, 2019
    Applicant: FUJITSU LIMITED
    Inventors: Tomohiro UENO, Hiroyuki Kitajima, Hiroyuki Nishimura, Kiyoshi Miyano
  • Patent number: 10283969
    Abstract: A solar photovoltaic output optimizer circuit includes a PV input device for receiving output of a solar photovoltaic panel; a switching device for converting a DC voltage input through the PV input device into a predetermined pulse voltage or AC voltage; and a voltage doubler rectification device for stepping up power output of the switching device to a predetermined voltage. The PV input device includes: an inductance L1 connected in series to “+” output of the PV panel; and a surge protection circuit that is connected in parallel to the inductance L1, operates so as to absorb surge voltage to occur in output of the inductance L1 only when output of the PV panel is small and normal control cannot be performed, and is automatically separated from the inductance L1 when the output of the PV panel is large.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: May 7, 2019
    Assignees: MERSINTEL, CO., LTD., CLEAN ENERGY FACTORY CO., LTD.
    Inventor: Hiroyuki Nishimura
  • Publication number: 20190123280
    Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.
    Type: Application
    Filed: December 18, 2018
    Publication date: April 25, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA
  • Publication number: 20190100835
    Abstract: There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal mask 10 in which a slit 15 is provided and a resin mask 20 in which openings 25 corresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slit 15 are stacked, and the metal mask 10 has a general region 10a in which the slit 15 is provided and a thick region 10b larger in thickness than the general region.
    Type: Application
    Filed: November 14, 2018
    Publication date: April 4, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Katsunari OBATA, Toshihiko TAKEDA, Hiroshi KAWASAKI, Hiroyuki NISHIMURA, Atsushi MAKI, Hiromitsu OCHIAI, Yoshinori HIROBE
  • Publication number: 20190070625
    Abstract: A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size increased, a method for producing a vapor deposition mask device capable of aligning the vapor deposition mask to a frame with high precision, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows, are stacked.
    Type: Application
    Filed: November 8, 2018
    Publication date: March 7, 2019
    Applicant: Dai Nippon Printing Co., Ltd.
    Inventors: Yoshinori HIROBE, Yutaka MATSUMOTO, Masato USHIKUSA, Toshihiko TAKEDA, Hiroyuki NISHIMURA, Katsunari OBATA, Takashi TAKEKOSHI