Abstract: A gas barrier film including a polymer base, an undercoat layer that contains, as the main component, an acrylic resin having at least one side chain selected from the group consisting of the side chains (I) to (III) mentioned below, and an inorganic layer, wherein the undercoat layer and the inorganic layer are arranged in this order on at least one surface of the polymer base in such a manner that the undercoat layer and the inorganic layer are in contact with each other: (I) a side chain having an acrylic polymer skeleton; (II) a side chain having a dimethylsiloxane skeleton; and (III) a side chain having a skeleton containing a fluorine atom.

Abstract: The gas barrier film includes a polymer base having an inorganic layer [A] and a silicon compound layer [B] stacked in this order at least on one side of the polymer base, the inorganic layer [A] containing a zinc compound and silicon oxide, the silicon compound layer [B] containing silicon oxynitride, and the inorganic layer [A] and the silicon compound layer [B] being in contact with each other.

Abstract: A gas barrier film including a polymer base, an undercoat layer that contains, as the main component, an acrylic resin having at least one side chain selected from the group consisting of the side chains (I) to (III) mentioned below, and an inorganic layer, wherein the undercoat layer and the inorganic layer are arranged in this order on at least one surface of the polymer base in such a manner that the undercoat layer and the inorganic layer are in contact with each other: (I) a side chain having an acrylic polymer skeleton; (II) a side chain having a dimethylsiloxane skeleton; and (III) a side chain having a skeleton containing a fluorine atom.

Abstract: A gas barrier film is provided including a polymer film substrate and a gas barrier layer containing at least zinc oxide and silicon dioxide on at least one surface of the polymer film substrate, wherein the gas barrier layer satisfies at least one of the following [I] to [III]: [I] with regard to X-ray absorption near edge structure (XANES) spectrum at K absorption edge of zinc, the value of (spectrum intensity at 9664.0 eV)/(spectrum intensity at 9668.0 eV) is in the range of 0.910 to 1.000; [II] the value obtained by dividing atomic concentration of zinc with atomic concentration of silicon is in the range of 0.1 to 1.5, and structural density index represented by the following equation: structural density index={density of the gas barrier layer obtained by X-ray reflectometry (XRR)}/{(theoretical density calculated from compositional ratio determined by X-ray photoelectron spectroscopy (XPS)} is 1.20 to 1.

Abstract: An object of the invention is to provide a gas barrier characteristic film that has a gas barrier characteristic and that is excellent in the repetitive reproducibility of the gas barrier characteristic. The film is a gas barrier characteristic film in which an [A] layer and a [B] layer mentioned below are sequentially layered on at least one surface of a macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm.

Abstract: The gas barrier film includes a polymer base having an inorganic layer [A] and a silicon compound layer [B] stacked in this order at least on one side of the polymer base, the inorganic layer [A] containing a zinc compound and silicon oxide, the silicon compound layer [B] containing silicon oxynitride, and the inorganic layer [A] and the silicon compound layer [B] being in contact with each other.

Abstract: [Problem] The purpose of the present invention is to provide a gas barrier film having high gas barrier performance and excellent repeated reproducibility of gas barrier performance. [Solution] A gas barrier film comprising a polymer base, an undercoat layer that contains, as the main component, an acrylic resin having at least one side chain selected from the group consisting of the side chains (I) to (III) mentioned below, and an inorganic layer, wherein the undercoat layer and the inorganic layer are arranged in this order on at least one surface of the polymer base in such a manner that the undercoat layer and the inorganic layer are in contact with each other: (I) a side chain having an acrylic polymer skeleton; (II) a side chain having a dimethylsioxane skeleton; and (III) a side chain having a skeleton containing a fluorine atom.

Abstract: The present invention provides a gas barrier film which has high gas barrier performance and excellent repeated reproducibility of the gas barrier performance. A gas barrier film of the present invention comprises three inorganic compound layers (layer [A], layer [B] and layer [C]) that are sequentially arranged in this order on at least one surface of a polymer film base. The layer [B] has a thickness of 0.2-20 nm and a density that is higher than those of the layer [A] and the layer [C].

Abstract: A gas barrier film is provided comprising a base film of polyester provided, on at least one of its surfaces, with a deposited layer of an inorganic compound and a gas barrier layer of a copolymer resin composition formed on the former. The gas barrier layer is produced from a mixture of a base material composed at least of the two components of (a) an unsaturated nitrile that accounts for 10% to 30% by mass of the copolymer and (b) an unsaturated compound with a hydroxyl group that accounts for 30% to 70% by mass of the copolymer; (c) a curing agent that contains a compound with an isocyanate group; and (d) a compound that has either two or more carboxylic acid groups or one or more carboxylic anhydride groups.

Abstract: The present invention provides a gas barrier film which has high gas barrier performance and excellent repeated reproducibility of the gas barrier performance. A gas barrier film of the present invention comprises three inorganic compound layers (layer [A], layer [B] and layer [C]) that are sequentially arranged in this order on at least one surface of a polymer film base. The layer [B] has a thickness of 0.2-20 nm and a density that is higher than those of the layer [A] and the layer [C].

Abstract: An object of the invention is to provide a gas barrier characteristic film that has a gas barrier characteristic and that is excellent in the repetitive reproducibility of the gas barrier characteristic. The film is a gas barrier characteristic film in which an [A] layer and a [B] layer mentioned below are sequentially layered on at least one surface of a macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm.

Abstract: A gas barrier film is provided comprising a base film of polyester provided, on at least one of its surfaces, with a deposited layer of an inorganic compound and a gas barrier layer of a copolymer resin composition formed on the former. The gas barrier layer is produced from a mixture of a base material composed at least of the two components of (a) an unsaturated nitrile that accounts for 10% to 30% by mass of the copolymer and (b) an unsaturated compound with a hydroxyl group that accounts for 30% to 70% by mass of the copolymer; (c) a curing agent that contains a compound with an isocyanate group; and (d) a compound that has either two or more carboxylic acid groups or one or more carboxylic anhydride groups.