Patents by Inventor Hisajiro Nakano

Hisajiro Nakano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240082885
    Abstract: A substrate cleaning device includes a rotation mechanism that rotates the substrate, a first cleaning solution supply nozzle that discharges a cleaning solution to which ultrasonic vibration is applied to the surface of the substrate, and a swing mechanism that swings the first cleaning solution supply nozzle from a vicinity of a rotation center of the substrate toward an outer peripheral edge of the substrate in a range narrower than a half-surface of the substrate.
    Type: Application
    Filed: November 16, 2023
    Publication date: March 14, 2024
    Inventors: Fumitoshi Oikawa, Koichi Fukaya, Erina Baba, Shuichi Suemasa, Hisajiro Nakano
  • Publication number: 20240082987
    Abstract: A substrate clamping apparatus includes a substrate holding part which is movable between a closed state in which a substrate is clamped and an open state in which clamping of the substrate is released, a support column part which supports the substrate holding part and is capable of being raised and lowered, and an interlocking mechanism which interlocks a raising and lowering operation of the support column part with an opening and closing operation of the substrate holding part, in which an opening and closing operation range A of the substrate holding part in an up-and-down stroke S of the support column part includes at least a part of an intermediate region M of the up-and-down stroke S.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 14, 2024
    Inventors: Daichi KONDO, Hisajiro NAKANO, Mitsuru MIYAZAKI
  • Publication number: 20230390898
    Abstract: A substrate clamping apparatus includes a substrate holding part which is movable between a closed state in which a substrate is clamped and an open state in which clamping of the substrate is released, a support column part which supports the substrate holding part and is capable of being raised and lowered, and an interlocking mechanism which interlocks a raising and lowering operation of the support column part with an opening and closing operation of the substrate holding part, in which an opening and closing operation range A of the substrate holding part in an up-and-down stroke S of the support column part includes at least a part of an intermediate region M of the up-and-down stroke S.
    Type: Application
    Filed: June 7, 2022
    Publication date: December 7, 2023
    Inventors: Daichi KONDO, Hisajiro NAKANO, Mitsuru MIYAZAKI
  • Patent number: 11664252
    Abstract: A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.
    Type: Grant
    Filed: December 21, 2020
    Date of Patent: May 30, 2023
    Assignee: EBARA CORPORATION
    Inventors: Michiaki Matsuda, Hisajiro Nakano, Fuyuki Ogaki, Yusuke Watanabe, Junji Kunisawa
  • Patent number: 11626299
    Abstract: A cover for a swing member of a substrate processing apparatus includes an upper surface including a first groove, and a first side edge and a second side edge located respectively at both ends of the upper surface in the short-length direction of the cover, where a bottom portion of the first groove is located lower than the first side edge and the second side edge.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: April 11, 2023
    Assignee: EBARA CORPORATION
    Inventors: Yoshitaka Kitagawa, Hisajiro Nakano, Tomoatsu Ishibashi
  • Publication number: 20220401997
    Abstract: The disclosure provides one technique for suppressing wear of a cleaning member and unexpected dust generation. A substrate support mechanism 100 includes a first support part 110 which is swingable and has a contact region that can come into contact with a peripheral edge of one surface of a substrate W in a closed state, a second support part 120 which supports the other surface of the substrate W, and a first support part moving part 140 which swings the first support part 110.
    Type: Application
    Filed: June 12, 2022
    Publication date: December 22, 2022
    Applicant: EBARA CORPORATION
    Inventors: MITSURU MIYAZAKI, HISAJIRO NAKANO, Takuya INOUE
  • Publication number: 20220406633
    Abstract: A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.
    Type: Application
    Filed: December 21, 2020
    Publication date: December 22, 2022
    Inventors: Michiaki MATSUDA, Hisajiro NAKANO, Fuyuki OGAKI, Yusuke WATANABE, Junji KUNISAWA
  • Publication number: 20220402003
    Abstract: The disclosure provides a substrate cleaning device and a substrate processing device capable of suppressing erroneous rotation detection of an optical sensor due to adhesion of droplets or mist. A substrate cleaning device includes a substrate cleaning part for cleaning a substrate, a drive roller for rotating the substrate, a driven roller rotated by the substrate, and a rotation detection part for detecting rotation of the driven roller. The rotation detection part includes a detected part provided on the driven roller, an optical sensor for detecting rotation of the detected part by irradiation with detection light, and a liquid filling part for filling an optical path forming space in which an optical path of the detection light is formed with a liquid having transmittance.
    Type: Application
    Filed: May 30, 2022
    Publication date: December 22, 2022
    Applicant: EBARA CORPORATION
    Inventors: YOHEI ETO, MITSURU MIYAZAKI, HISAJIRO NAKANO
  • Patent number: 11532491
    Abstract: A substrate cleaning apparatus and related apparatuses/methods are disclosed. In one embodiment, a substrate cleaning apparatus includes: a first spindle group including a first driving spindle having a first driving roller configured to rotate a substrate and an idler spindle having a driven roller rotated by the substrate; a second spindle group including a plurality of second driving spindles each having a second driving roller configured to rotate the substrate; a cleaning mechanism configured to clean the substrate rotated by the first driving roller and the plurality of second driving rollers; and a rotation detector configured to detect the rotational speed of the driven roller. The driven roller is positioned on the opposite side to a direction in which the substrate receives a force from the cleaning mechanism.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: December 20, 2022
    Assignee: Ebara Corporation
    Inventors: Hisajiro Nakano, Junji Kunisawa
  • Patent number: 11495475
    Abstract: Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: November 8, 2022
    Assignee: EBARA CORPORATION
    Inventors: Koji Maeda, Hiroshi Shimomoto, Hisajiro Nakano, Masayoshi Imai, Yoichi Shiokawa
  • Publication number: 20220203411
    Abstract: A substrate cleaning device includes a rotation mechanism that rotates the substrate, a first cleaning solution supply nozzle that discharges a cleaning solution to which ultrasonic vibration is applied to the surface of the substrate, and a swing mechanism that swings the first cleaning solution supply nozzle from a vicinity of a rotation center of the substrate toward an outer peripheral edge of the substrate in a range narrower than a half-surface of the substrate.
    Type: Application
    Filed: December 23, 2021
    Publication date: June 30, 2022
    Inventors: Fumitoshi Oikawa, Koichi Fukaya, Erina Baba, Shuichi Suemasa, Hisajiro Nakano
  • Patent number: 11311918
    Abstract: A substrate cleaning apparatus includes a substrate holding mechanism holding the substrate, a rotation mechanism rotating the substrate held by the substrate holding mechanism, and a cleaning mechanism cleaning the substrate. The cleaning mechanism includes a support column, an arm extending from the support column and having a fixed height position, a cleaning tool supported by the arm and cleaning a surface of the substrate by contacting the surface, a lift mechanism moving the cleaning tool vertically with respect to the arm between an raised position separated from the substrate and a lowered position in contact with the substrate, and a controller controlling at least a speed at which the cleaning tool descends.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: April 26, 2022
    Assignee: Ebara Corporation
    Inventor: Hisajiro Nakano
  • Publication number: 20220016651
    Abstract: According to one embodiment, provided is a substrate cleaning device including a nozzle that includes: a first supply port; a second supply port; a third supply port; a first discharge port; and a third discharge port, wherein the substrate cleaning device is configured to clean a substrate with jets of the second mixed fluid of the gas, the treatment liquid and the surface tension reducing gas.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 20, 2022
    Inventors: Fumitoshi Oikawa, Koichi Fukaya, Hisajiro Nakano
  • Patent number: 11180303
    Abstract: A storage container of a scrub member includes a container main body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid body are engaged.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: November 23, 2021
    Assignee: EBARA CORPORATION
    Inventors: Hisajiro Nakano, Tomoatsu Ishibashi
  • Patent number: 11142386
    Abstract: A storage container of a scrub member includes a container main body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid body are engaged.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: October 12, 2021
    Assignee: EBARA CORPORATION
    Inventors: Hisajiro Nakano, Tomoatsu Ishibashi
  • Patent number: 11094548
    Abstract: An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: August 17, 2021
    Assignee: EBARA CORPORATION
    Inventors: Shinji Kajita, Hisajiro Nakano, Tomoatsu Ishibashi, Koichi Fukaya, Yasuyuki Motoshima, Yohei Eto, Fumitoshi Oikawa
  • Publication number: 20210163208
    Abstract: A storage container of a scrub member includes a container warn body and a lid body engaging with the container main body, where the scrub member is accommodated in an internal portion of the storage container surrounded by the container main body and the lid body, and a ventilation groove which communicates the internal portion of the storage container and an outside of the storage container is formed on an engagement surface where the container main body and the lid both are engaged.
    Type: Application
    Filed: November 14, 2018
    Publication date: June 3, 2021
    Inventors: Hisajiro Nakano, Tomoatsu Ishibashi
  • Patent number: 10991602
    Abstract: A substrate washing device includes a substrate holding mechanism 70 that holds a substrate W, a substrate rotating mechanism 72 that rotates the substrate W held by the substrate holding mechanism 70, and a two-fluid nozzle 46 that ejects a two-fluid jet toward a surface of the rotating substrate W. The two-fluid nozzle 46 is formed of a conductive material. Accordingly, the electrification amount of droplets ejected as the two-fluid jet from the two-fluid nozzle 46 can be suppressed.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Koichi Fukaya, Tomoatsu Ishibashi, Hisajiro Nakano
  • Publication number: 20210023592
    Abstract: A substrate cleaning apparatus includes a substrate holding mechanism holding the substrate, a rotation mechanism rotating the substrate held by the substrate holding mechanism, and a cleaning mechanism cleaning the substrate. The cleaning mechanism includes a support column, an arm extending from the support column and having a fixed height position, a cleaning tool supported by the arm and cleaning a surface of the substrate by contacting the surface, a lift mechanism moving the cleaning tool vertically with respect to the arm between an raised position separated from the substrate and a lowered position in contact with the substrate, and a controller controlling at least a speed at which the cleaning tool descends.
    Type: Application
    Filed: July 21, 2020
    Publication date: January 28, 2021
    Applicant: Ebara Corporation
    Inventor: Hisajiro NAKANO
  • Publication number: 20200402820
    Abstract: A cover for a swing member of a substrate processing apparatus includes an upper surface including a first groove, and a first side edge and a second side edge located respectively at both ends of the upper surface in the short-length direction of the cover, where a bottom portion of the first groove is located lower than the first side edge and the second side edge.
    Type: Application
    Filed: June 22, 2020
    Publication date: December 24, 2020
    Inventors: Yoshitaka KITAGAWA, Hisajiro NAKANO, Tomoatsu ISHIBASHI