Abstract: The present invention relates to a surface property measuring apparatus for a polishing pad used for polishing a substrate, such as a semiconductor wafer, a surface property measuring method for a polishing pad, and a surface property judging mehod for a polishing pad. The surface property measuring apparatus (30) includes: a light-emitting structure (32) configured to irradiate the polishing pad (2) with light from a plurality of directions as viewed from a polishing surface (2a) of the polishing pad (2); and a light-receiving structure (32) configured to receive reflected light traveling in a plurality of directions from the surface of the polishing pad (2).

Abstract: A setting facilitation apparatus (1400) includes a keyword input reception section (1410), a control command selection section (1420), and a specific control registration section (1430) and is used to facilitate setting of specific control in a control system (1001) that controls a control device through sound inputs. The keyword input reception section (1410) receives an input of information corresponding to a keyword. The control command selection section (1420) displays a certain control command to the control device (1010, 1020) on an edit screen (G) and receives selection of the control command. The specific control registration section (1430) registers a keyword (K) input by the keyword input reception section (1410) and the control command selected by the control command selection section (1420) to a specific control (DB 1104T) while associating the keyword and the control command with each other.

Abstract: A setting facilitation apparatus (1400) includes a keyword input reception section (1410), a control command selection section (1420), and a specific control registration section (1430) and is used to facilitate setting of specific control in a control system (1001) that controls a control device through sound inputs. The keyword input reception section (1410) receives an input of information corresponding to a keyword. The control command selection section (1420) displays a certain control command to the control device (1010, 1020) on an edit screen (G) and receives selection of the control command. The specific control registration section (1430) registers a keyword (K) input by the keyword input reception section (1410) and the control command selected by the control command selection section (1420) to a specific control (DB 1104T) while associating the keyword and the control command with each other.

Abstract: A management system (1090) includes an air conditioner (1062), a sound input unit (1064), an operation sound analyzing unit (1016), a first preprocessing unit (1011), a command extracting unit (1014), and a control unit (1017). The sound input unit (1064) is provided in a room where the air conditioner is provided and obtains sound data (SD). The operation sound analyzing unit (1016) analyzes the sound data by a predetermined analysis method so as to obtain a determination result (RE) regarding whether an abnormality exists in the air conditioner or details of the abnormality. The first preprocessing unit (1011) performs first preprocessing on the sound data. The command extracting unit (1014) extracts a command (CM) of a user from the sound data that has been subjected to the first preprocessing. The control unit (1017) controls the air conditioner on the basis of the command.