Abstract: A sensor is used at a substrate level in a lithographic projection apparatus having a projection system with a numeric aperture that is greater than 1 and is configured to project a patterned radiation beam onto a target portion of a substrate The sensor includes a radiation-detector; a transmissive plate having a front surface and a back surface, the transmissive plate being positioned such that radiation projected by the projection system passes into the front surface of the transmissive plate and out of the back surface thereof to the radiation detector; and a luminescent layer provided on the back surface of the transmissive plate, the luminescent layer absorbing the radiation and emitting luminescent radiation of a different wavelength, wherein the back surface is rough.

Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.

Abstract: An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

Abstract: An exposure apparatus which expose a photosensitive layer on an object with light via a mask having a pattern to be transferred onto the photosensitive layer, includes an illumination optical system having plural optical elements provided along an optical axis substantially perpendicular to a plane on which the pattern is placed, and which include an optical integrator from which the mask is illuminated with the light through a part of the plural optical elements. The apparatus also includes a filter device having a rotatable filter element provided between the optical integrator and the plane, and having a transmittance distribution in a predetermined area. Light from the optical integrator passes through a portion in the predetermined area. Light from the filter element has a variable intensity distribution different from that of the light incident on the filter element from the optical integrator, and made variable by rotating the filter element.

Abstract: An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected.

Abstract: An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected.

Abstract: An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the reticle onto a wafer via a projection optical system. An illumination characteristic is measured by using an evaluation mark plate on a reticle stage and a spatial image-measuring system provided for a wafer stage. The states of the second fly's eye lens and the lens system are adjusted by the aid of a driving unit on the basis of the measured value. A concentration filter plate, which is formed with a pattern of a predetermined transmittance distribution, is rotatably arranged in the vicinity of a conjugate plane with respect to an image plane between the second lens system and the blind. The angle of rotation of the concentration filter plate 51 is controlled so that the uneven illuminance is corrected.