Abstract: The present disclosure relates to a flavored sheet, a filter for an aerosol generating article, and a wrapper including a cooling block, and an aerosol generating article including the same, and the cooling block includes a cooling agent A, a cooling agent B, and a cooling agent C in a specific combination.

Abstract: A cathode active material with controlled rheological properties for lithium secondary batteries. In particular, the cathode active material for a lithium secondary battery includes: a core part comprising a lithium metal oxide; and a coating layer covering at least a portion of a surface of the core part and comprising an inorganic compound.

Abstract: A method of processing an immersive video includes classifying view images into a basic image and an additional image, performing pruning with respect to view images by referring to a result of classification, generating atlases based on a result of pruning, generating a merged atlas by merging the atlases into one atlas, and generating configuration information of the merged atlas.

Abstract: A semiconductor device including: a substrate; a via which penetrates the substrate; a via insulating film formed along an inner wall of the via; and a core plug which fills the via, wherein a residual stress of the via insulating film is 60 MPa to ?100 MPa.

Abstract: A cathode active material for an all-solid-state battery including colloidal silica, a cathode active material, and a manufacturing method thereof are disclosed. It may be possible to achieve an enhancement in dispersion in a sulfide-based all-solid-state battery by controlling powder properties while reducing interfacial resistance between an electrolyte and a cathode active material of the sulfide-based all-solid-state battery.

Abstract: The present invention relates to a Candida tropicalis cell line, which comprises a mutant gene, having improved tolerance for cytotoxicity of stromal cells, and a method for producing dicarboxylic acid using the Candida tropicalis cell line. The Candida tropicalis cell line for producing dicarboxylic acid developed according to the present invention has improved tolerance for existing stromal toxicity as well as significantly improved efficiency for producing dicarboxylic acid compared to existing cell lines, thus can be used in biological production of dicarboxylic acid and is expected to have high industrial utility.

Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.

Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.

Abstract: The present invention relates to a Candida tropicalis cell line, which comprises a mutant gene, having improved tolerance for cytotoxicity of stromal cells, and a method for producing dicarboxylic acid using the Candida tropicalis cell line. The Candida tropicalis cell line for producing dicarboxylic acid developed according to the present invention has improved tolerance for existing stromal toxicity as well as significantly improved efficiency for producing dicarboxylic acid compared to existing cell lines, thus can be used in biological production of dicarboxylic acid and is expected to have high industrial utility.

Abstract: A semiconductor device including: a substrate; a via which penetrates the substrate; a via insulating film formed along an inner wall of the via; and a core plug which fills the via, wherein a residual stress of the via insulating film is 60 MPa to ?100 MPa.

Abstract: A semiconductor device including: a substrate; a via which penetrates the substrate; a via insulating film formed along an inner wall of the via; and a core plug which fills the via, wherein a residual stress of the via insulating film is 60 MPa to ?100 MPa.

Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.

Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.

Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.

Abstract: A semiconductor device including: a substrate; a via which penetrates the substrate; a via insulating film formed along an inner wall of the via; and a core plug which fills the via, wherein a residual stress of the via insulating film is 60 MPa to ?100 MPa.

Abstract: A manufacturing method for manufacturing a steering wheel cover is provided. At least one silicone rubber bar is provided. Two ends of the hollow silicone rubber bar are connected to form a close loop, wherein liquid silicone rubber is applied to a junction of the silicone rubber bar. Then, the hollow silicone rubber bar and the liquid silicone rubber are vulcanized to form the steering wheel cover. Therefore, the efficiency of producing the steering wheel cover is improved and the production costs are reduced.

Abstract: A control system with computer based host includes a first device, a computer based host is electrically connected to the first device. And a second device is electrically connected to the computer based host, wherein the first device has a control right to utilize said second device.