Patents by Inventor Hoang Vi Tran

Hoang Vi Tran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11611157
    Abstract: This invention provides a polymer thick film electrically conductive paste composition, comprising conductive metal powder, a resin blend of polyol and phenoxy resin, blocked aliphatic polyisocyanate and one or more polar, aprotic solvents. In one embodiment the paste composition is used to form electrically conductive adhesive. In another embodiment the paste composition is used to form an electrically conductive polymer thick film.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: March 21, 2023
    Assignee: Du Pont China Limited
    Inventors: Hee Hyun Lee, Edmund Francis Schieffer, Jr., Hoang Vi Tran
  • Patent number: 10741300
    Abstract: The present invention provides a thick-film paste composition for printing the front side of a solar cell device having one or more insulating layers. The thick-film paste comprises an electrically conductive metal and an oxide composition dispersed in an organic medium that includes microgel particles and an organopolysiloxane.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: August 11, 2020
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Hoang Vi Tran, Hee Hyun Lee, Michael Stephen Wolfe
  • Publication number: 20190386403
    Abstract: This invention provides a polymer thick film electrically conductive paste composition, comprising conductive metal powder, a resin blend of polyol and phenoxy resin, blocked aliphatic polyisocyanate and one or more polar, aprotic solvents. In one embodiment the paste composition is used to form electrically conductive adhesive. In another embodiment the paste composition is used to form an electrically conductive polymer thick film.
    Type: Application
    Filed: June 18, 2019
    Publication date: December 19, 2019
    Inventors: HEE HYUN LEE, EDMUND FRANCIS SCHIEFFER, JR., HOANG VI TRAN
  • Patent number: 10403770
    Abstract: A conductive paste composition comprises (i) an inorganic powder comprising at least a conductive powder, (ii) at least one microgel polymer, and (iii) a solvent. The paste composition may be used in a process for manufacturing an electrical device comprising: preparing a substrate; applying the conductive paste onto the substrate in a preselected pattern; and heating the applied conductive paste to form a conductive structure that provides an electrode for connecting the device. The paste composition beneficially permits the formation of narrow, high aspect ratio features in the conductive structure.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: September 3, 2019
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Michael Stephen Wolfe, John Donald Summers, Bryan Benedict Sauer, Hoang Vi Tran, Brian D Mather, Hee Hyun Lee, Esther Kim, Ma Helen Cativo, Yuefei Tao
  • Publication number: 20180102198
    Abstract: The present invention provides a thick-film paste composition for printing the front side of a solar cell device having one or more insulating layers. The thick-film paste comprises an electrically conductive metal and an oxide composition dispersed in an organic medium that includes microgel particles and an organopolysiloxane.
    Type: Application
    Filed: September 25, 2017
    Publication date: April 12, 2018
    Inventors: Hoang VI Tran, Hee Hyun Lee, Michael Stephen Wolfe
  • Patent number: 9815947
    Abstract: In a first aspect, a composition of matter includes a substantially symmetrical 3-arm star block copolymer having a central core and diblock copolymer arms having inner blocks and outer blocks. In a second aspect, an article includes a substrate, a block copolymer composition on the substrate, and a neutral layer between the substrate and the block copolymer composition.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: November 14, 2017
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: William Brown Farnham, Michael Thomas Sheehan, Hoang Vi Tran, Daqing Zhang
  • Publication number: 20170121468
    Abstract: In a first aspect, a composition of matter includes a substantially symmetrical 3-arm star block copolymer having a central core and diblock copolymer arms having inner blocks and outer blocks. In a second aspect, an article includes a substrate, a block copolymer composition on the substrate, and a neutral layer between the substrate and the block copolymer composition.
    Type: Application
    Filed: October 27, 2016
    Publication date: May 4, 2017
    Inventors: William Brown Farnham, Michael Thomas Sheehan, Hoang Vi Tran, Daqing Zhang
  • Publication number: 20160225925
    Abstract: A conductive paste composition comprises (i) an inorganic powder comprising at least a conductive powder, (ii) at least one microgel polymer, and (iii) a solvent. The paste composition may be used in a process for manufacturing an electrical device comprising: preparing a substrate; applying the conductive paste onto the substrate in a preselected pattern; and heating the applied conductive paste to form a conductive structure that provides an electrode for connecting the device. The paste composition beneficially permits the formation of narrow, high aspect ratio features in the conductive structure.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 4, 2016
    Inventors: MICHAEL STEPHEN WOLFE, JOHN DONALD SUMMERS, BRYAN BENEDICT SAUER, HOANG VI TRAN, BRIAN D MATHER, HEE HYUN LEE, ESTHER KIM, MA HELEN CATIVO, YUEFEI TAO
  • Publication number: 20150337068
    Abstract: This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers.
    Type: Application
    Filed: February 11, 2013
    Publication date: November 26, 2015
    Inventors: KARL K BERGGREN, WILLIAM BROWN FARNHAM, THEODORE H FEDYNYSHYN, SAMUEL M. NICAISE, MICHAEL THOMAS SHEEHAN, HOANG VI TRAN
  • Patent number: 9169383
    Abstract: This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers. Such copolymers contain two segments (“blocks”) of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.
    Type: Grant
    Filed: February 11, 2013
    Date of Patent: October 27, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: William Brown Farnham, Michael Thomas Sheehan, Hoang Vi Tran
  • Publication number: 20150011700
    Abstract: This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers. Such copolymers contain two segments (“blocks”) of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.
    Type: Application
    Filed: February 11, 2013
    Publication date: January 8, 2015
    Inventors: William Brown Farnham, Michael Thomas Sheehan, Hoang Vi Tran
  • Publication number: 20150004379
    Abstract: This invention relates to the preparation and purification of high-X (“chi”) diblock copolymers. Such copolymers contain two segments (“blocks”) of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.
    Type: Application
    Filed: February 11, 2013
    Publication date: January 1, 2015
    Inventors: William Brown Farnham, Michael Thomas Sheehan, Hoang Vi Tran
  • Publication number: 20090299113
    Abstract: A method for purifying liquid alkanes, especially dicyclic alkanes, for use in immersion lithography is provided. The method produces alkanes having absorbance at 193 nm of ?0.1/cm, and residue of ?100 ppm. The liquid alkane compositions are useful as immersion liquids in photomicrolithography employed for production of electronic circuits.
    Type: Application
    Filed: May 28, 2008
    Publication date: December 3, 2009
    Applicant: E. I. duPont de Nemours and Company
    Inventors: Douglas J. Adelman, Hoang Vi Tran
  • Patent number: 7507522
    Abstract: The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: March 24, 2009
    Assignee: E. I. DuPont de Nemours and Company
    Inventors: Michael Karl Crawford, Hoang Vi Tran, Frank Leonard Schadt, III, Fredrick Claus Zumsteg, Jr., Andrew Edward Feiring, Michael Fryd