Abstract: A nuclear fusion reactor includes a geodesic-shaped reaction chamber having at least j planar faces, where j equals 2, 6, 8, 12 or 20 and j conical plasma injectors (CPIs) for creating circular rings of neutral plasma. Each CPI includes a conical inner cathode electrode disposed coaxially within a hollow conical outer anode electrode, the space between the anode electrode and the cathode electrode forming a converging conical plasma channel for creating circular rings of neutral plasma, the converging conical plasma channel accelerating the plasma fuel into a converging plasma ring that comes to a focus at the center of the reaction chamber. The angle between axes of adjacent CPIs defines a CPI face angle, the angle defined by the converging conical plasma channel at its apex defining a CPI convergence angle, wherein the CPI convergence angle is approximately half the CPI face angle.

Abstract: A maskless, direct write electron lithography apparatus for accurately and simultaneously writing plural sub-micron patterns on a silicon substrate employs plural parallel electron beams with precise X-Y mechanical translation of the substrate to provide low cost, high throughput integrated circuit (IC) fabrication. Plural compact micro electron gun assemblies arranged in an I×J rectangular grid each simultaneously expose one IC pattern on the substrate, with each electron gun assembly including a K×L array of individually controlled electron guns emitting K×L electron beams. The regular, small spacing between electron beams in each array, i.e., approximately 1 mm or less, requires a correspondingly small X-Y translation of the substrate to write the entire wafer. Each electron gun array includes plural AC blanked cathodes and DC biased plates having plural aligned beam passing apertures.

Abstract: A maskless, direct write electron lithography apparatus for accurately and simultaneously writing plural sub-micron patterns on a silicon substrate employs plural parallel electron beams with precise X-Y mechanical translation of the substrate to provide low cost, high throughput integrated circuit (IC) fabrication. Plural compact micro electron gun assemblies arranged in a I×J rectangular grid each simultaneously expose one IC pattern on the substrate, with each electron gun assembly including a K×L array of individually controlled electron guns emitting K×L electron beams. The regular, small spacing between electron beams in each array, i.e., approximately 1 mm or less, requires a correspondingly small X-Y translation of the substrate to write the entire wafer. Each electron gun array includes plural AC blanked cathodes and DC biased plates having plural aligned beam passing apertures.

Abstract: An electron gun includes plural aligned charged grids each having an aperture (in a monochrome CRT) or plural apertures (in a color CRT) through which an electron beam (or beams) is directed. The beams emitted by a cathode sequentially transit a beam forming region (BFR), a dynamic focus lens and a main focus lens prior to being incident on the CRT's display screen. The electron beam tends to expand in diameter in the direction of the CRT's display screen. This results in an increase in the focusing effect on the electron beam of the electron gun's grids in proceeding from the BFR toward the display screen where the beam passing apertures in the various grids are of the same size. To increase electron beam focusing sensitivity while reducing the beam's dynamic focus voltage, the beam passing apertures in the gun's dynamic focus lens are provided with progressively reduced size in proceeding toward the electron gun's cathode.

Abstract: An electron beam device includes an electron beam source, plural spaced plates having aligned apertures through which an electron beam is directed, an electrostatic focusing arrangement, and plural electrostatically charged deflection plates for deflecting the beam and displacing it over a target surface. The apertures in the spaced plates are of deceasing size in the direction of travel of the electron beam for intercepting the outer periphery of the beam and providing a beam of reduced cross section. The electron beam is simultaneously deflected by the deflection plates and focused by the electrostatic focusing arrangement. The electrostatic focusing arrangement includes first and second focusing elements through which the beam is directed which are disposed along the beamline and adjacent the upper and lower end portions, respectively, of the beam deflection plates.

Abstract: An inline electron gun for use in a multi-beam electron gun as in a color cathode ray tube (CRT) includes a main focus lens for focusing the electron beams on the CRT's display screen for providing a video image. The main focus lens includes plural charged grids aligned in a spaced manner along the electron gun's longitudinal axis through which plural (typically three) electron beams are directed. One or more of these charged grids includes at least two aligned common apertures for passing the three electron beams. The layered common aperture arrangement allows for increasing the length of the electron gun as well as the effective diameter of the electron gun's main focus lens for improved video image resolution without introducing electron beam astigmatism.

Abstract: For use in the fabrication of semiconductor devices by electron beam lithography, a transport system provides relative displacement between an array of plural vacuum stations and a first ultra clean room for sequentially transporting each vacuum station through the first clean room. The first ultra clean room and vacuum stations are disposed in a second clean room having an atmosphere not as contaminant-free as the first ultra clean room. Each vacuum station includes an evacuated housing within which is disposed a combination of a semiconductor substrate, or wafer, and plural electron beam sources for forming integrated circuits on the substrate as the vacuum station is transported through the second clean room.

Abstract: An electron beam device includes an electron beam source, plural spaced plates having aligned apertures through which an electron beam is directed, an electrostatic focusing arrangement, and plural electrostatically charged deflection plates for deflecting the beam and displacing it over a target surface. The apertures in the spaced plates are of deceasing size in the direction of travel of the electron beam for intercepting the outer periphery of the beam and providing a beam of reduced cross section. The electron beam is simultaneously deflected by the deflection plates and focused by the electrostatic focusing arrangement. The electrostatic focusing arrangement includes first and second focusing elements through which the beam is directed which are disposed along the beamline and adjacent the upper and lower end portions, respectively, of the beam deflection plates.

Abstract: An inline electron gun for use in a multi-beam electron gun as in a color cathode ray tube (CRT) includes a main focus lens for focusing the electron beams on the CRT's display screen for providing a video image. The main focus lens includes plural charged grids aligned in a spaced manner along the electron gun's longitudinal axis through which plural (typically three) electron beams are directed. One or more of these charged grids includes at least two aligned common apertures for passing the three electron beams. The layered common aperture arrangement allows for increasing the length of the electron gun as well as the effective diameter of the electron gun's main focus lens for improved video image resolution without introducing electron beam astigmatism.

Abstract: An electron gun includes plural aligned charged grids each having an aperture (in a monochrome CRT) or plural apertures (in a color CRT) through which an electron beam (or beams) is directed. The beams emitted by a cathode sequentially transit a beam forming region (BFR), a dynamic focus lens and a main focus lens prior to being incident on the CRT's display screen. The electron beam tends to expand in diameter in the direction of the CRT's display screen. This results in an increase in the focusing effect on the electron beam of the electron gun's grids in proceeding from the BFR toward the display screen where the beam passing apertures in the various grids are of the same size. To increase electron beam focusing sensitivity while reducing the beam's dynamic focus voltage, the beam passing apertures in the gun's dynamic focus lens are provided with progressively reduced size in proceeding toward the electron gun's cathode.

Abstract: An electron gun for use in a cathode ray tube (CRT) includes a source of energetic electrons, i.e., a cathode, a beam forming region for forming the energetic electrons into a narrow beam, an arrangement for deflecting the beam over a display screen, and a focus arrangement for focusing the beam on the display screen in the form of a small spot in forming a video image. The beam forming region includes a G1 control grid, a G2 screen grid and a portion of a G3 grid in facing relation to the G2 grid, where each grid includes a respective aperture through which the electron beam is directed, with the apertures aligned along a common axis. The size of the aperture on the side of the G2 grid in facing relation to the G1 grid forms a first focusing lens and is smaller than the size of the aperture on the opposed side of the G2 grid in facing relation to the G3 grid which forms a second focusing lens.

Abstract: For use in the fabrication of semiconductor devices by electron beam lithography, a transport system provides relative displacement between an array of plural vacuum stations and a first ultra clean room for sequentially transporting each vacuum station through the first clean room. The first ultra clean room and vacuum stations are disposed in a second clean room having an atmosphere not as contaminant-free as the first ultra clean room. Each vacuum station includes an evacuated housing within which is disposed a combination of a semiconductor substrate, or wafer, and plural electron beam sources for forming integrated circuits on the substrate as the vacuum station is transported through the second clean room.

Abstract: A multi-beam color index cathode ray tube (CRT) includes vertically spaced, horizontal phosphor stripes on the inner surface of its display screen. The parallel phosphor bands are arranged in groups of three, with each phosphor stripe in a group providing a respective one of the three primary colors of red, green and blue. An electron gun directs three electron beams onto the display screen, with the three electron beams deflected over the display screen in unison in a raster pattern. The three electron beams are focused in the form of three spots on the display screen, with each spot coincident with a respective horizontal phosphor stripe of a given color. The intensity of each electron beam is independently modulated as it sweeps across the width of the display screen by a respective color video signal in accordance with the displayed image.

Abstract: A multi-beam color index cathode ray tube (CRT) includes vertically spaced, horizontal phosphor stripes on the inner surface of its display screen. The parallel phosphor bands are arranged in groups of three, with each phosphor stripe in a group providing a respective one of the three primary colors of red, green and blue. An electron gun directs three electron beams onto the display screen, with the three electron beams deflected over the display screen in unison in a raster pattern. The three electron beams are focused in the form of three spots on the display screen, with each spot coincident with a respective horizontal phosphor stripe of a given color. The intensity of each electron beam is independently modulated as it sweeps across the width of the display screen by a respective color video signal in accordance with the displayed image.

Abstract: For use in a beam index color cathode ray tube (CRT), a multi-beam group electron gun directs first and second groups of vertically aligned electron beams on respective parallel, horizontally aligned color phosphor stripes on the CRT's display screen. Each group of electron beams includes three beams, one for each of the three primary colors of red, green and blue. The first and second electron beam groups are horizontally offset from one another, with the upper, intermediate and lower electron beams in each group tracing the same horizontal phosphor stripe as the beams scan the display screen and with a time delay provided to synchronize the video information of both electron beam groups. A color video signal is provided either to a respective cathode or to a respective segmented conductive portion containing a beam passing aperture in the electron gun's G1 control grid for individually modulating each beam with color video image information.

Abstract: An electron beam device includes an electron beam source, plural spaced plates having aligned apertures through which an electron beam is directed, an electrostatic focusing arrangement, and plural electrostatically charged deflection plates for deflecting the beam and displacing it over a target surface. The apertures in the spaced plates are of deceasing size in the direction of travel of the electron beam for intercepting the outer periphery of the beam and providing a beam of reduced cross section. The electron beam is simultaneously deflected by the deflection plates and focused by the electrostatic focusing arrangement. The electrostatic focusing arrangement includes first and second focusing elements through which the beam is directed which are disposed along the beamline and adjacent the upper and lower end portions, respectively, of the beam deflection plates.

Abstract: An internal resistor within a color cathode ray tube (CRT) is connected to a voltage source and is coupled across a G4 grid and a G6 grid of the CRT's multi-grid quadrupole (QPF) electron gun. De-coupling the G4 grid from the G2 grid in the electron gun's prefocus lens and operating the G4 grid at a higher voltage as used in the gun's high voltage main focus lens moves the equivalent lens of the prefocus and main focus lenses toward the CRT's display screen and reduces electron beam magnification and spot size for improved video image definition and focusing.

Abstract: In a multi-stage, multi-beam electron gun of the common lens type for use in a color cathode ray tube (CRT), a charged grid in the prefocus lens of the electron gun is provided with three inline asymmetric beam passing apertures. The three asymmetric apertures may be either in the G4 grid, in the upper side of the G3 grid, or on the lower side of the G5 grid, i.e., in facing relation to the G4 grid, or may be incorporated in both the G3 and G5 grids. The small G3-G4 and G4-G5 spacing gives rise to isolation of the electron optic lenses of the two outer electron beams from that of the center electron beam allowing the asymmetric auxiliary apertures to asymmetrically and independently correct for electron beam astigmatism, i.e., the difference between the beam's horizontal and vertical focus voltage, and differences in the focus voltages of the two outer electron beams relative to the center electron beam.

Abstract: A color cathode ray tube (CRT) includes a multi-beam electron gun capable of operating in two or more modes for use as either a television receiver display or as a high resolution video monitor. The electron gun directs a plurality of electron beams onto the CRT's display screen, with the electron beams arranged in two or more groups. In one group of electron beams, the beam forming portion of the electron gun provides small diameter electron beams having reduced spot size on the CRT's display screen for high video image resolution when used as a monitor for graphics and/or character display. In another group of electron beams, the beam forming portion of the electron gun provides electron beams having a larger diameter and current for increased video image brightness when used as a television receiver. Each group of electron beams includes a plurality of horizontally aligned electron beams, with each beam providing one of the primary colors of red, green, or blue.

Abstract: An electron gun for use in a cathode ray tube (CRT) includes a cathode, a low voltage beam forming region (BFR), and a high voltage deflection focus lens disposed in the beam deflection region of the CRT's magnetic deflection yoke for simultaneous and coincident focusing and deflection of the electron beam on the CRT's display screen. The deflection lens includes a plurality of first focus grids disposed in the CRT's neck portion including a spaced first pair of grids (G42, G44) having respective beam passing apertures disposed horizontally off-center in opposed directions relative to the electron beam axis, and a second pair of grids (G46, G48) having respective beam passing apertures disposed vertically off-center in opposed directions relative to the axis. Other grids disposed on opposed sides of each of the first and second pair of grids have respective beam passing apertures centered with respect to the electron beam axis and are maintained at a fixed focus voltage.