Patents by Inventor Huai-Ying CHIN

Huai-Ying CHIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240402617
    Abstract: In some embodiments, one or more non-transitory, machine-readable medium has instructions thereon, the instructions when executed by a processor being configured to perform operations comprising obtaining scanning electron microscopy (SEM) metrology data for first areas on a training wafer, obtaining optical metrology data for second areas on the training wafer, and training a model, by using the SEM metrology data and the optical metrology data for the training wafer, to generate parameters for features on a production wafer based on optical metrology data for areas of the production wafer.
    Type: Application
    Filed: August 9, 2024
    Publication date: December 5, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Spencer ALEXANDER, Junru RUAN, Haiyan LI, Nathan Richard KEECH, Huai-Ying CHIN