Patents by Inventor Huaxing Zhou

Huaxing Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11111352
    Abstract: Methods of preparing organosilica materials using a starting material mixture comprising at least one compound of Formula [(RO)2SiCH2]3 (Ia) and at least one compound of Formula [R?ROSiCH2]3 (Ib), wherein each R? independently represents an RO—, an R group, or an (RO)3Si—CH2— group, at least one R? being (RO)3Si—CH2—; and R represents a C1-C4 alkyl group, in the absence of a structure directing agent and/or porogen are provided herein. Processes of using the organosilica materials, e.g., for gas separation, etc., are also provided herein.
    Type: Grant
    Filed: November 14, 2018
    Date of Patent: September 7, 2021
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Huaxing Zhou, Quanchang Li, David C. Calabro
  • Patent number: 11059941
    Abstract: The present disclosure relates to methods for preparing materials from heavy feedstocks. In particular, the disclosure provides a chemical process to convert heavy feedstocks with predominant polyaromatic hydrocarbon molecules or species, including the residues of petrochemical refining or extraction, into thermoset or thermoplastic materials that can be used alone or as a component in a composite material.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: July 13, 2021
    Assignee: ExxonMobil Research and Engineering Company
    Inventors: Huaxing Zhou, Arnold Lustiger, Victor DeFlorio, Srinivasan Rajagopalan, Timothy D. Shaffer, Donald N. Schulz
  • Patent number: 10953369
    Abstract: The present invention is directed to novel functionalized spirocentric compounds and polymers thereof that produce hyper-rigid cross-linked membranes.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: March 23, 2021
    Assignees: Georgia Tech Research Corporation, ExxonMobil Research & Engineering Company
    Inventors: M. G. Finn, Craig McKay, Nicholas Bruno, Kirstie Thompson, Huaxing Zhou
  • Patent number: 10926226
    Abstract: The present invention is directed to methods of fabricating novel cross-linked membranes and to cross-linked membranes produced by the disclosed methods. Specifically, methods of fabricating cross-linked membranes according to the present invention may comprise direct crosslinking, crosslinking by addition of a small molecule, interfacial crosslinking of free-standing film, and interfacial crosslinking on a solid support.
    Type: Grant
    Filed: March 7, 2019
    Date of Patent: February 23, 2021
    Assignees: ExxonMobil Research & Engineering Company Company, Georgia Tech Research Corporation
    Inventors: Nicholas Bruno, Ronita Mathias, Yao Ma, Kirstie Thompson, Breanne Hamlett, Ryan P. Lively, Huaxing Zhou, M. G. Finn, Dhaval Bhandari, Craig McKay, Melinda Jue
  • Publication number: 20200346196
    Abstract: The present disclosure relates to catalysts for making sulfur-containing polymeric materials. In particular, the disclosure provides catalysts, and the method of using the same, for making sulfur-containing polymeric materials through inverse vulcanization at a temperature that is lower than 150° C.
    Type: Application
    Filed: April 14, 2020
    Publication date: November 5, 2020
    Inventors: Huaxing Zhou, Victor DeFlorio
  • Publication number: 20200207941
    Abstract: Plastics composites and a method for forming the plastics composites are provided in this disclosure. An example plastic composite includes a suspension of carbon nanotubes (CNTs) in a solvent that is compounded with a plastic material. The techniques provide for the efficient incorporation of carbon nanotubes into the plastic composite.
    Type: Application
    Filed: December 17, 2019
    Publication date: July 2, 2020
    Inventors: Arnold Lustiger, Huaxing Zhou
  • Publication number: 20190315912
    Abstract: The present disclosure relates to methods for preparing materials from heavy feedstocks. In particular, the disclosure provides a chemical process to convert heavy feedstocks with predominant polyaromatic hydrocarbon molecules or species, including the residues of petrochemical refining or extraction, into thermoset or thermoplastic materials that can be used alone or as a component in a composite material.
    Type: Application
    Filed: March 25, 2019
    Publication date: October 17, 2019
    Inventors: Huaxing Zhou, Arnold Lustiger, Victor DeFlorio, Srinivasan Rajagopalan, Timothy D. Shaffer, Donald N. Schulz
  • Publication number: 20190275469
    Abstract: The present invention is directed to methods of fabricating novel cross-linked membranes and to cross-linked membranes produced by the disclosed methods. Specifically, methods of fabricating cross-linked membranes according to the present invention may comprise direct crosslinking, crosslinking by addition of a small molecule, interfacial crosslinking of free-standing film, and interfacial crosslinking on a solid support.
    Type: Application
    Filed: March 7, 2019
    Publication date: September 12, 2019
    Inventors: Nicholas Bruno, Ronita Mathias, VIII, Yao Ma, Kirstie Thompson, Breanne Hamlett, Ryan P. Lively, Huaxing Zhou, M.G. Finn, Dhaval Bhandari, Craig McKay, Melinda Jue
  • Publication number: 20190276952
    Abstract: The present disclosure relates to methods for using functional molecules and other structural carbon-based molecules with rigid backbones and kinked segments to alter the interactions between molecules, and consequently improve/modify the properties of materials. In particular, the disclosure provides methods for using functional molecules and other structural carbon-based molecules with rigid backbones and kinked segments as (1) precursors for carbon fiber, (2) “molecular agents” to separate and/or link ?-? stacked aromatic systems, 3) stabilizers in composite materials to achieve better blending of matrix with fiber reinforcement, and/or (4) one of the components in carbon fibers to achieve better mechanical properties.
    Type: Application
    Filed: March 7, 2019
    Publication date: September 12, 2019
    Inventors: David O. Marler, Srinivasan Rajagopalan, Dhaval Bhandari, Huaxing Zhou, M. G. Finn
  • Publication number: 20190276454
    Abstract: The present invention is directed to novel functionalized spirocentric compounds and polymers thereof that produce hyper-rigid cross-linked membranes.
    Type: Application
    Filed: March 7, 2019
    Publication date: September 12, 2019
    Inventors: M.G. Finn, Craig McKay, Nicholas Bruno, Kirstie Thompson, Huaxing Zhou
  • Publication number: 20190194414
    Abstract: Methods of preparing organosilica materials using a starting material mixture comprising at least one compound of Formula [(RO)2SiCH2]3 (Ia) and at least one compound of Formula [R?ROSiCH2]3 (Ib), wherein each R? independently represents an RO—, an R group, or an (RO)3Si—CH2— group, at least one R? being (RO)3Si—CH2—; and R represents a C1-C4 alkyl group, in the absence of a structure directing agent and/or porogen are provided herein. Processes of using the organosilica materials, e.g., for gas separation, etc., are also provided herein.
    Type: Application
    Filed: November 14, 2018
    Publication date: June 27, 2019
    Inventors: Huaxing Zhou, Quanchang Li, David C. Calabro
  • Patent number: 10042259
    Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: August 7, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
  • Patent number: 10042255
    Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: August 7, 2018
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Huaxing Zhou, Vipul Jain, Jin Wuk Sung, Peter Trefonas, III, Phillip D. Hustad, Mingqi Li
  • Publication number: 20180118970
    Abstract: Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R1 represents H, F, methyl or fluorinated methyl; R2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR5, wherein R5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions.
    Type: Application
    Filed: October 12, 2017
    Publication date: May 3, 2018
    Inventors: Irvinder Kaur, Cong Liu, Doris Kang, Mingqi Li, Deyan Wang, Huaxing Zhou
  • Patent number: 9703203
    Abstract: Pattern treatment compositions comprise a block copolymer and an organic solvent. The block copolymer comprises a first block and a second block. The first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group. The second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group. Wherein: (i) the second block comprises a unit formed from a third monomer comprising an ethylenically unsaturated polymerizable group, and the second monomer and the third monomer are different; and/or (ii) the block copolymer comprises a third block comprising a unit formed from a fourth monomer comprising an ethylenically unsaturated polymerizable group, wherein the fourth monomer is different from the first monomer and the second monomer.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: July 11, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung
  • Patent number: 9684241
    Abstract: Pattern treatment compositions comprise a block copolymer and an organic solvent. The block copolymer comprises a first block and a second block. The first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group. The second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and an aromatic group, provided that the second monomer is not styrene. Wherein: (i) the second block comprises a unit formed from a third monomer comprising an ethylenically unsaturated polymerizable group, and the second monomer and the third monomer are different; and/or (ii) the block copolymer comprises a third block comprising a unit formed from a fourth monomer comprising an ethylenically unsaturated polymerizable group. Also provided are pattern treatment methods using the described compositions.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: June 20, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung
  • Patent number: 9671697
    Abstract: Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: June 6, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Huaxing Zhou, Mingqi Li, Vipul Jain, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung
  • Patent number: 9665005
    Abstract: Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and an aromatic group, provided that the second monomer is not styrene; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 30, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung
  • Publication number: 20170123316
    Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.
    Type: Application
    Filed: October 19, 2016
    Publication date: May 4, 2017
    Inventors: Huaxing Zhou, Vipul Jain, Jin Wuk Sung, Peter Trefonas, III, Phillip D. Hustad, Mingqi Li
  • Publication number: 20160357110
    Abstract: Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 8, 2016
    Inventors: Huaxing Zhou, Mingqi Li, Vipul Jain, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung