Abstract: The present disclosure discloses a non-slip condom, including a sleeve body, where the sleeve body has an open end, a closed end, a male side, and a female side; no less than 5% of a bottom surface of the male side has a primary microstructure capable of increasing a surface area; and an area ratio of a total surface area per unit area of the bottom surface of the male side including the primary microstructure to the unit area is 1.05 to 565.00. The condom provided by the present disclosure can keep fit with a male penis during sexual intercourse to reduce the relative slip between the condom and the penis skin, and is not easy to wrinkle or slip off, thus reducing the mucosal injury and unreality sensation. Moreover, the condom helps to increase the consumers' willingness to use the condom and prevent sexually transmitted diseases (STDs).

Abstract: Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed.

Abstract: Methods of forming metal-containing layers are provided where heteroleptic organometallic compounds containing at least one formamidinate ligand are conveyed in a gaseous form to a reactor; and films comprising a metal are deposited on a substrate. These heteroleptic organometallic compounds have improved properties over conventional vapor deposition precursors. Such compounds are suitable for use as vapor deposition precursors including direct liquid injection. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds or their solutions in organic solvents.

Abstract: Metal(IV) tetrakis(N,N?-dialkylamidinates) were synthesized and characterized. Exemplary metals include hafnium, zirconium, tantalum, niobium, tungsten, molybdenum, tin and uranium. These compounds are volatile, highly stable thermally, and suitable for vapor deposition of metals and their oxides, nitrides and other compounds.

Abstract: Heteroleptic organometallic compounds containing at least one formamidinate ligand are provided. These heteroleptic organometallic compounds have improved properties over conventional vapor deposition precursors. Such compounds are suitable for use as vapor deposition precursors including direct liquid injection. Also provided are methods of depositing thin films, such as by ALD and CVD, using such compounds or their solutions in organic solvents.

Abstract: Metal(IV) tetrakis(N,N?-dialkylamidinates) were synthesized and characterized. Exemplary metals include hafnium, zirconium, tantalum, niobium, tungsten, molybdenum, tin and uranium. These compounds are volatile, highly stable thermally, and suitable for vapor deposition of metals and their oxides, nitrides and other compounds.