Patents by Inventor Hung-Chin Guthrie

Hung-Chin Guthrie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8557708
    Abstract: Methods for fabricating TMR and CPP GMR magnetic heads using a chemical mechanical polishing (CMP) process with a patterned CMP conductive protective layer for sensor stripe height patterning. The method comprises defining a stripe height of a read sensor of a magnetic head reader. The method further comprises refill depositing an insulator layer on the read sensor. The method further comprises performing a CMP process down to the conductive protective layer on the read sensor deposited while defining the read sensor to remove an overfill portion of the insulator layer above the conductive protective layer and to remove a sensor pattern masking structure on the conductive protective layer. As a result, the insulator layer is planarized and smooth with the read sensor, eliminating fencing and alumina bumps typically encountered in the insulator layer at the edge of the patterned sensor.
    Type: Grant
    Filed: May 2, 2007
    Date of Patent: October 15, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ying Hong, Ming Jiang
  • Patent number: 8503131
    Abstract: A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: August 6, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
  • Patent number: 8500916
    Abstract: Systems and methods for aligning wafers within wafer processing equipment. In a first embodiment, a wafer alignment nozzle comprises a fixed cylindrical member. A moveable cylindrical member is disposed with the fixed cylindrical member in a sliding fit. The moveable cylindrical member comprises a plurality of angled fluid orifices for directing a plurality of streams of the fluid onto a surface of the wafer.
    Type: Grant
    Filed: November 5, 2004
    Date of Patent: August 6, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Jian-Huei Feng, Hung-Chin Guthrie, Quang Le, James Nystrom
  • Publication number: 20120107645
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
    Type: Application
    Filed: December 28, 2011
    Publication date: May 3, 2012
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-Chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
  • Patent number: 8108985
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole, and then depositing a refill layer. A mask structure can be formed over the writ pole and refill layer, the mask structure being configured to define a stitched pole. An ion milling or reactive ion milling can then be performed to remove portions of the refill layer that are not protected by the mask structure. Then a magnetic material can be deposited to form a stitched write pole that defines a secondary flare point. The stitched pole can also be self aligned with an electrical lapping guide in order to accurately locate the front edge of the secondary flare point relative to the air bearing surface of the write head.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: February 7, 2012
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yi Zheng, Yimin Hsu, Wen-Chien David Hsiao, Ming Jiang, Aron Pentek, Sue Siyang Zhang, Edward Hin Pong Lee, Hung-Chin Guthrie, Ning Shi, Vladimir Nikitin, Prabodh Ratnaparkhi, Yinshi Liu
  • Patent number: 8066892
    Abstract: A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: November 29, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Yimin Hsu, Ming Jiang, Sue Siyang Zhang
  • Patent number: 7881010
    Abstract: A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: February 1, 2011
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Edward Hin Pong Lee, Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Patent number: 7804662
    Abstract: In a perpendicular recording head, a notch is formed in the top write gap at a location on top of the main pole. A perpendicular head with this notched top write gap structure has less transition curvature and better writability while reducing the adjacent track interference (ATI). Also, the process used to fabricate the head ensures that the trailing edge (writing edge) of the main pole is extremely flat with no corner rounding.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: September 28, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Tsung Yuan Chen, Hung-Chin Guthrie, Yimin Hsu, Ming Jiang
  • Patent number: 7788798
    Abstract: A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.
    Type: Grant
    Filed: November 21, 2007
    Date of Patent: September 7, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Changqing Shi, Sue Siyang Zhang
  • Patent number: 7768743
    Abstract: A perpendicular magnetic recording write head supported on an air-bearing slider has a magnetic write pole (WP) with a WP end at the air-bearing surface (ABS) having a width generally equal to the data track width and a trailing shield (TS) with a TS end generally coplanar with the WP end. The TS has a first portion with a width at the TS end substantially wider than the width of the WP end and a TS notch (TSN) portion with a width at the TS end generally equal to the width of the WP end. The TS first portion has a height in a direction perpendicular to the ABS, and the TSN portion has a throat height (TH) in a direction perpendicular to the ABS that is less than the height of the TS first portion. A nonmagnetic gap layer separates the WP from the TSN portion and a nonmagnetic pad layer separates the WP from the TS first portion.
    Type: Grant
    Filed: May 11, 2007
    Date of Patent: August 3, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Changqing Shi
  • Patent number: 7757380
    Abstract: Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: July 20, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Hung-chin Guthrie, Yimin Hsu, Ming Jiang, Aron Pentek
  • Patent number: 7722436
    Abstract: During planarization of wafers, the thickness of a layer of a wafer is measured at a number of locations, after the wafer has been planarized by chemical mechanical polishing. The thickness measurements are used to automatically determine, from a center to edge profile model to which the measurements are fit, a parameter that controls chemical mechanical polishing, called “backside pressure.” Backside pressure is determined in some embodiments by a logic test based on the center-to-edge profile model, coefficient of determination R-square of the model, and current value of backside pressure. Note that a “backside pressure” set point is adjusted only if the fit of the measurements to the model is good, e.g. as indicated by R-square being greater than a predetermined limit. Next, the backside pressure that has been determined from the model is used in planarizing a subsequent wafer.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: May 25, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Yeak-Chong Wong
  • Publication number: 20100078406
    Abstract: A method for manufacturing a write pole for a perpendicular magnetic write head. The method employs a damascene process to construct the write pole with a very accurately controlled track width. The method includes depositing a layer of material that can be readily removed by reactive ion etching. This material can be referred to as a RIEable material. A mask is formed over the RIEable material and a reactive ion etching is performed to form a tapered trench in the RIEAble material. A CMP stop layer can the be deposited, and a write pole plated into the trench. A CMP can then be performed to define the trailing edge of the write pole. Another masking, etching and plating step can be performed to form a trailing, wrap-around magnetic shield.
    Type: Application
    Filed: September 30, 2008
    Publication date: April 1, 2010
    Inventors: Hung-Chin Guthrie, Yimin Hsu, Ming Jiang, Sue Siyang Zhang
  • Patent number: 7675709
    Abstract: A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: March 9, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hung-Chin Guthrie, Wen-Chien David Hsiao, Jyh-Shuey Lo, Aron Pentek
  • Patent number: 7648731
    Abstract: Methods of fabricating perpendicular write elements for perpendicular magnetic recording heads are discussed. In write element fabrication, write poles are fabricated according to one of many desired methods. The write poles during fabrication are typically covered by a hard mask and a photolithographic soft mask. According to the methods described herein, the soft mask is removed such as by chemical etching. The hard mask is then removed, such as by CMP and ion etching, to expose the write poles. Shield gap material may then be deposited on the write poles to define the shield gap between the write poles and the trailing shields. Trailing shield material may then be deposited on the shield gap material to form the trailing shields corresponding with the write poles.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: January 19, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
    Inventors: Hung-Chin Guthrie, Ming Jiang, Yinshi Liu, Aron Pentek, John J. Yang, Sue Siyang Zhang
  • Patent number: 7593186
    Abstract: A magnetic disk drive head is disclosed including a write head, which includes a P1 layer having a pedestal portion, a gap layer formed on the P1 layer, and a P2 layer formed on the gap layer. The P1 layer includes a shoulder formation having a neck portion and a beveled portion. Also disclosed is a disk drive having a write head with a P1 layer with shoulder formation, and a method for fabricating a write pole for a magnetic recording head having a P1 layer with shoulder formation.
    Type: Grant
    Filed: January 31, 2005
    Date of Patent: September 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Daniel Wayne Bedell, Hung-Chin Guthrie, Ming Jiang, Hieu Lam, Jyh-Shuey Lo, Edward Hin Pong Lee, Aron Pentek
  • Patent number: 7576951
    Abstract: A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: August 18, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Michael Feldbaum, Hung-Chin Guthrie, Wen-Chien David Hsiao, Yimin Hsu, Ming Jiang, Yinshi Liu, Aaron Neuhaus, Vladimir Nikitin, Aron Pentek, Katalin Pentek, Yi Zheng
  • Patent number: 7551397
    Abstract: A magnetic write head and method of manufacture thereof that has a first pole structure having a step notched first pole structure. The step notched structure includes a bottom notched portion that is wider than the second notched portion formed thereover. The upper, or narrower, notched portion has a width that is substantially equal to and self aligned with a second pole structure (P2) formed thereover. The invention may also include first and second wing portions formed in the first pole that are recessed from the ABS and that extend laterally from the first notched portions of the first pole. The formation of the winged portions is assisted by an ion mill resistant bump (alumina bump) formed thereover, which acts as a mask during the ion milling operations that are used to form the first and second notches.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Bin V. Cao, Hung-Chin Guthrie, Wen-Chien Hsiao, Jyh-Shuey Lo
  • Publication number: 20090152234
    Abstract: A method for manufacturing a magnetic write head having a write pole with a flared step feature that defines a secondary flare point. The method involves depositing a magnetic write pole material on a substrate and then depositing a magnetic material over the write pole material followed by a non-magnetic material. A first mask is formed having a front edge to define the location of the secondary flare point, and one or more material removal processes are used to remove portions of the magnetic layer and non-magnetic layer that are not protected by this first mask. The first mask is replaced by a second mask that is configured to define a write pole, and an ion milling is performed to define the write pole. Shadowing from the magnetic layer and non-magnetic layer form a flared secondary flare point.
    Type: Application
    Filed: December 13, 2007
    Publication date: June 18, 2009
    Inventors: Hung-Chin Guthrie, Ming Jiang, Edward Hin Pong Lee, Aron Pentek, Sue Siyang Zhang, Yi Zheng
  • Publication number: 20090128964
    Abstract: A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.
    Type: Application
    Filed: November 21, 2007
    Publication date: May 21, 2009
    Inventors: Hung-Chin Guthrie, Ming Jiang, Changqing Shi, Sue Siyang Zhang