Patents by Inventor Hyeong-Jin NOR

Hyeong-Jin NOR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface treatment method for semiconductor device
    Patent number: 9520459
    Abstract: A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: December 13, 2016
    Assignee: SK Hynix Inc.
    Inventors: Sung-Hyuk Cho, Hyo-Sang Kang, Sung-Ki Park, Kwon Hong, Hyung-Soon Park, Hyung-Hwan Kim, Young-Bang Lee, Ji-Hye Han, Tae-Yeon Jung, Hyeong-Jin Nor
  • SURFACE TREATMENT METHOD FOR SEMICONDUCTOR DEVICE
    Publication number: 20160172433
    Abstract: A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.
    Type: Application
    Filed: February 19, 2016
    Publication date: June 16, 2016
    Inventors: Sung-Hyuk CHO, Hyo-Sang KANG, Sung-Ki PARK, Kwon HONG, Hyung-Soon PARK, Hyung-Hwan KIM, Young-Bang LEE, Ji-Hye HAN, Tae-Yeon JUNG, Hyeong-Jin NOR
  • SURFACE TREATMENT METHOD FOR SEMICONDUCTOR DEVICE
    Publication number: 20140179118
    Abstract: A surface treatment method for a semiconductor device includes providing a substrate where a plurality of projected patterns are formed, forming a hydrophobic coating layer on a surface of each of the plurality of projected patterns, rinsing the substrate with deionized water, and drying the substrate, wherein the hydrophobic coating layer is formed using a coating agent that includes phosphate having more than one hydrocarbon group, phosphonate having more than one hydrocarbon group, or a mixture thereof.
    Type: Application
    Filed: March 15, 2013
    Publication date: June 26, 2014
    Applicant: SK hynix Inc.
    Inventors: Sung-Hyuk CHO, Hyo-Sang KANG, Sung-Ki PARK, Kwon HONG, Hyung-Soon PARK, Hyung-Hwan KIM, Young-Bang LEE, Ji-Hye HAN, Tae-Yeon JUNG, Hyeong-Jin NOR