Patents by Inventor HYUK-YUL CHOI

HYUK-YUL CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Vaporizer and thin film deposition apparatus including the same
    Patent number: 10538843
    Abstract: A vaporizer includes a main body including a first body and a second body. The first body has an upper portion narrowing in a direction of a height of the first body and the second body has a cavity in which the first body is positioned. A mixing chamber is between the first and second bodies. The second body includes a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber. The carrier gas injection path carries a carrier gas. A source material injection path is connected to a source material inlet formed in the mixing chamber. The source material injection path carries a liquid source material. A discharge is connected to an outlet formed in a lower portion of the mixing chamber. A mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: January 21, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., HORIBA STEC, CO., LTD.
    Inventors: Hyun-Sik Sim, Jung-Suk Oh, Jae-Seok Kim, Ho-Gon Kim, Jun-Won Lee, Hyuk-Yul Choi, Hyung-Ho Kim, Sang-Jin Choi, Heok-Jae Lee, Dong-Ok Shin, Jang-Hyoun Youm, Ichiro Nishikawa, Masanori Terasaka, Masashi Hamada, Tae-Hoon Lee
  • VAPORIZER AND THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME
    Publication number: 20170241015
    Abstract: A vaporizer includes a main body including a first body and a second body. The first body has an upper portion narrowing in a direction of a height of the first body and the second body has a cavity in which the first body is positioned. A mixing chamber is between the first and second bodies. The second body includes a carrier gas injection path connected to a carrier gas inlet formed in an upper portion of the mixing chamber. The carrier gas injection path carries a carrier gas. A source material injection path is connected to a source material inlet formed in the mixing chamber. The source material injection path carries a liquid source material. A discharge is connected to an outlet formed in a lower portion of the mixing chamber. A mixed fluid including the carrier gas and the liquid source material is discharged through the discharge path.
    Type: Application
    Filed: December 20, 2016
    Publication date: August 24, 2017
    Applicant: HORIBA STEC, CO., LTD.
    Inventors: HYUN-SIK SIM, JUNG-SUK OH, JAE-SEOK KIM, HO-GON KIM, JUN-WON LEE, HYUK-YUL CHOI, HYUNG-HO KIM, SANG-JIN CHOI, HEOK-JAE LEE, DONG-OK SHIN, JANG-HYOUN YOUM, ICHIRO NISHIKAWA, MASANORI TERASAKA, MASASHI HAMADA, TAE-HOON LEE