Abstract: The present invention relates to a method for manufacturing a polyimide-powder composite separator using water and a polyimide-powder composite separator manufactured by the method, and is environmentally friendly since an organic solvent is not used in the overall process of manufacturing the composite separator and has advantageous effects in terms of time, cost, and manufacturing process since a high temperature/high pressure environment is not required.

Abstract: Disclosed are a flexible vibration cushion and a method of controlling the same. The flexible vibration cushion may include a cover member, a first soft filler material filled in the cover member; and a vibration generation device including components made of a soft material and disposed in the soft filler. The vibration generation device is configured to generate vibration as an electrostatic force is repeatedly generated and released. The vibration generation device may be applied in a vehicle part, e.g., headrest, thereby minimizing the foreign body sensation acting on the user’s skin while delivering soft and various senses of vibrations to the user.

Abstract: The present invention provides an eco-friendly smart photosensitizer comprising a conjugate of hydroxypropyl methylcellulose and porfimer sodium photosensitizer, and a photo-stem cell therapy product comprising the photosensitizer. The photosensitizer of the present invention can be advantageously used in various fields including anticancer therapy, stem cell therapy, and the like, without side effects.

Abstract: The present specification discloses a urate oxidase-albumin conjugate, a preparation method thereof, a urate oxidase variant contained in the urate oxidase-albumin conjugate, and a preparation method thereof. The urate oxidase-albumin conjugate is characterized in that three or more albumins are conjugated to the urate oxidase variant through a linker, thereby improving half-life and reducing immunogenicity. In addition, the urate oxidase-albumin conjugate can be used to prevent or treat various diseases, disorders and/or indications caused by uric acid.

Abstract: A display device includes a display panel, a cover glass disposed on the display panel, and a biometric sensor device disposed below the display panel. The biometric sensor device includes a printed circuit board, a biometric sensor disposed on the printed circuit board, and a housing disposed on the printed circuit board and in which an opening is formed. The biometric sensor is disposed in the opening of the housing and is attached to a surface of the display panel through the housing.

Abstract: A deposition apparatus, including: a substrate supporter, wherein a substrate is fixed to the substrate supporter; a target facing the substrate; a first magnet assembly disposed below the target and including a first magnet extending in a first direction and having a first length, and a second magnet at least partially surrounding the first magnet; and a second magnet assembly disposed below the target and spaced apart from the first magnet assembly in a second direction which is substantially perpendicular to the first direction, and including a first magnet extending in the first direction and having a second length greater than the first length, and a second magnet at least partially surrounding the first magnet, and wherein the second magnet of the first magnet assembly and the second magnet of the second magnet assembly have substantially the same length as each other in the first direction.

Abstract: An exposure mask includes a pattern part exposed to light to form a pattern on a substrate, a surrounding part that surrounds a periphery of the pattern part, and correcting pattern parts disposed on the surrounding part. The correcting pattern parts are disposed in a line along an edge of the pattern part. A correcting method of an exposure apparatus includes correcting a light supply direction of a light supply unit based on a movement direction and a speed of the light supply unit, exposing light in the corrected light supply direction, forming exposure patterns by exposing light to correcting pattern parts, determining whether an error occurs in the light supply direction by using the exposure patterns, and correcting the light supply direction based on the determined error.

Abstract: An additive for a photoresist, a photoresist composition for a EUV including the same, and a method for manufacturing a semiconductor device using the same, the additive including a copolymer that includes a first repeating unit represented by the following Chemical Formula 1-1, and a second repeating unit represented by the following Chemical Formula 2, wherein a molar ratio of the first repeating unit to the second repeating unit is 7:3 to 2:8,

Abstract: The present invention provides an eco-friendly smart photosensitizer comprising a conjugate of hydroxypropyl methylcellulose and porfimer sodium photosensitizer, and a photo-stem cell therapy product comprising the photosensitizer. The photosensitizer of the present invention can be advantageously used in various fields including anticancer therapy, stem cell therapy, and the like, without side effects.

Abstract: A display device includes a display panel including a first display area; a second display area protruding in a first direction from the first display area; and a first non-display area adjacent to a side of the second display area. Each of the first display area and the second display area includes subpixels that display an image and scan lines electrically connected to the subpixels. The first non-display area includes dummy pixels; a common scan line electrically connected to the dummy pixels; load matching switch elements respectively disposed between the scan lines and the common scan line; and a load matching driving circuit that outputs load matching control signals to control turn-on and turn-off of the load matching switch elements.

Abstract: A method for forming photoresist patterns and a semiconductor device on which a photoresist pattern manufactured according to the method is formed are disclosed. The method includes forming a preliminary photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer, the acrylic polymer including a structural unit containing a hydroxy group and a fluorine, and an acid compound on the preliminary photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an acetate-based compound on the substrate coated with the topcoat to remove the topcoat.

Abstract: A sputtering apparatus includes a back plate supporting a sputtering target, a magnet module disposed under the back plate and including a magnet unit reciprocating in a first direction, a first shielding member attached on a portion of the magnet unit, moving together with the magnet unit, and covering at least a portion of the magnet unit, a protective sheet disposed between the back plate and the magnet module, and a second shielding member disposed between the back plate and the magnet module, and having a fixed position.

Abstract: A resist topcoat composition and a method of forming patterns using the resist topcoat composition.

Abstract: A method of forming a photoresist pattern and a semiconductor device on which a photoresist pattern manufactured according to the same is formed. The method includes forming a photoresist pattern on a substrate; coating an organic topcoat composition including an acrylic polymer including a structural unit containing a hydroxy group and a fluorine and an acidic compound on the photoresist pattern; drying and heating the substrate on which the organic topcoat composition is coated to coat it with a topcoat; and spraying a rinse solution including an ether-based compound on the substrate coated with the topcoat to remove the topcoat.

Abstract: A resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; a mixture including a sulfonic acid compound containing at least one fluorine and a carboxylic acid compound containing at least one fluorine in a weight ratio of about 1:0.1 to about 1:50; and a solvent. A method of forming patterns uses the resist topcoat composition to form a topcoat over a patterned substrate.

Abstract: A resist topcoat composition and a method of forming patterns utilizing the resist topcoat composition are disclosed. The resist topcoat composition includes an acrylic polymer comprising a structural unit comprising a hydroxy group and a fluorine; a mixture comprising a first acid compound comprising at least one fluorine; and a second acid compound different from the first acid compound and comprising at least one fluorine, the first acid compound and the second acid compound are each independently selected from a sulfonic acid compound and a sulfonimide compound, the first acid compound and the second acid compound being in a weight ratio of about 1:0.1 to about 1:50; and a solvent.

Abstract: A resist topcoat composition and a method of forming patterns using the resist topcoat composition are provided. The resist topcoat resist topcoat composition includes an acrylic polymer including a structural unit containing a hydroxy group and a fluorine; at least one acid compound selected from a sulfonic acid compound containing at least one fluorine, a sulfonimide compound containing at least one fluorine, and a carboxylic acid compound containing at least one fluorine; and a solvent.

Abstract: The present application relates to a method of preparing urate oxidase (Uox) including a non-nature amino acid (NNAA) and Uox prepared thereby. The present application showed that the method of preparing Uox including an NNAA may be effectively used to prolong the half-life of a protein which is difficult to be linked to a carrier. In addition, the Uox produced by the method may be effectively used for various biopharmaceuticals since its efficacy is maintained and drug persistency increases due to site-specific conjugation of a carrier, a risk of an immune response is reduced, and it is easily separated due to formation of uniform conjugate.

Abstract: Provided are an apparatus and method for a statistical memory network. The apparatus includes a stochastic memory, an uncertainty estimator configured to estimate uncertainty information of external input signals from the input signals and provide the uncertainty information of the input signals, a writing controller configured to generate parameters for writing in the stochastic memory using the external input signals and the uncertainty information and generate additional statistics by converting statistics of the external input signals, a writing probability calculator configured to calculate a probability of a writing position of the stochastic memory using the parameters for writing, and a statistic updater configured to update stochastic values composed of an average and a variance of signals in the stochastic memory using the probability of a writing position, the parameters for writing, and the additional statistics.

Abstract: A semiconductor device includes a plurality of channels, source/drain layers, and a gate structure. The channels are sequentially stacked on a substrate and are spaced apart from each other in a first direction perpendicular to a top surface of the substrate. The source/drain layers are connected to the channels and are at opposite sides of the channels in a second direction parallel to the top surface of the substrate. The gate structure encloses the channels. The channels have different lengths in the second direction and different thicknesses in the first direction.