Patents by Inventor I-tung Chen

I-tung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11183568
    Abstract: Disclosures of the present invention mainly describe a two-dimensional semiconductor device (TDSD), comprising: a two-dimensional semiconductor material (TDSM) layer, a superacid action layer and a superacid solution. The TDSM layer is made of a transition-metal dichalcogenide, and the superacid action layer is formed on the TDSM layer. Particularly, an oxide material is adopted for making the superacid action layer, such that the superacid solution is subsequently applied to the superacid action layer so as to make the superacid solution gets into the superacid action layer by diffusion effect. Experimental data have proved that, letting the superacid solution diffuse into the superacid action layer can not only apply a chemical treatment to the TDSM layer, but also make the TDSD have a luminosity enhancement. Particularly, the luminosity enhancement would not be reduced even if the TDSD contacts with water and/or organic solution during other subsequent manufacturing processes.
    Type: Grant
    Filed: October 9, 2019
    Date of Patent: November 23, 2021
    Assignee: National Tsing Hua University
    Inventors: I-Tung Chen, Ying-Yu Lai, Chun-An Chen, Xin-Quan Zhang, Yi-Hsien Lee
  • Patent number: 11139371
    Abstract: A two-dimensional (2D) semiconductor with geometry structure and generating method thereof is disclosed herein and the method includes following steps: forming a nano-layer; disposing a 2D material on a substrate; forming a medium layer on the 2D material; transferring the medium layer and the 2D material to the nano-layer; removing the medium layer and leaving the 2D material on a surface of the nano-layer. In accordance with the generating method for 2D semiconductor with geometry structure, a nano microstructure is implemented to enhance and control the 2D materials for field emission and photon emission efficiency.
    Type: Grant
    Filed: October 7, 2019
    Date of Patent: October 5, 2021
    Assignee: National Tsing Hua University
    Inventors: Tung-han Yang, Yeu-wei Harn, Xin-quan Zhang, I-tung Chen, Yi-hsien Lee
  • Publication number: 20200312965
    Abstract: Disclosures of the present invention mainly describe a two-dimensional semiconductor device (TDSD), comprising: a two-dimensional semiconductor material (TDSM) layer, a superacid action layer and a superacid solution. The TDSM layer is made of a transition-metal dichalcogenide, and the superacid action layer is formed on the TDSM layer. Particularly, an oxide material is adopted for making the superacid action layer, such that the superacid solution is subsequently applied to the superacid action layer so as to make the superacid solution gets into the superacid action layer by diffusion effect. Experimental data have proved that, letting the superacid solution diffuse into the superacid action layer can not only apply a chemical treatment to the TDSM layer, but also make the TDSD have a luminosity enhancement. Particularly, the luminosity enhancement would not be reduced even if the TDSD contacts with water and/or organic solution during other subsequent manufacturing processes.
    Type: Application
    Filed: October 9, 2019
    Publication date: October 1, 2020
    Inventors: I-TUNG CHEN, YING-YU LAI, CHUN-AN CHEN, XIN-QUAN ZHANG, YI-HSIEN LEE
  • Publication number: 20200111868
    Abstract: A two-dimensional (2D) semiconductor with geometry structure and generating method thereof is disclosed herein and the method includes following steps: forming a nano-layer; disposing a 2D material on a substrate; forming a medium layer on the 2D material; transferring the medium layer and the 2D material to the nano-layer; removing the medium layer and leaving the 2D material on a surface of the nano-layer. In accordance with the generating method for 2D semiconductor with geometry structure, a nano microstructure is implemented to enhance and control the 2D materials for field emission and photon emission efficiency.
    Type: Application
    Filed: October 7, 2019
    Publication date: April 9, 2020
    Inventors: Tung-han Yang, Yeu-wei Harn, Xin-quan Zhang, I-tung Chen, Yi-hsien Lee