Patents by Inventor Ian Wakefield Wylie

Ian Wakefield Wylie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10907264
    Abstract: A durable composite diamond electrode is disclosed which comprise at least a relatively thicker conductive UNCD (Ultrananocrystalline Diamond) layer, with low deposition cost, on a substrate underlying a relatively thinner conductive MCD (Microcrystalline Diamond) layer. The electrode exhibits long life and superior delamination resistance under extremely stressed electrochemical oxidation conditions. It is hypothesized that this improvement in electrode reliability is due to a combination of stress relief by the composite film with the slightly “softer” underlying UNCD “root” layer and the electrochemically durable overlying MCD “shield” layer, an effective disruption mechanism of the fracture propagation between the compositing layers, and thermal expansion coefficient match between the diamond layers and the substrate.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: February 2, 2021
    Assignee: Advanced Diamond Technologies, Inc.
    Inventors: Hongjun Zeng, John Arthur Carlisle, Ian Wakefield Wylie
  • Patent number: 10662523
    Abstract: A novel composite diamond film comprising of a relatively thick layer of UNCD (Ultrananocrystalline Diamond) with a Young's modulus of less than 900 GPa and a relatively thin MCD (microcrystalline diamond) outermost layer with a Young's modulus of greater than 900 GPa, has been shown to exhibit superior delamination resistance under extreme shear stress. It is hypothesized that this improvement is due to a combination of stress relief by the composite film with a slightly “softer” UNCD layer, a disruption of the fracture mechanism through the composite layer(s), and the near ideal chemical and thermal expansion coefficient match between the two diamond layers. The combination of a thick but “softer” underlying UNCD layer with a thin but harder overlying MCD layer provides an excellent compromise between the low deposition cost and smoothness of UNCD with the extreme hardness and unparalleled chemical, electrochemical and immunological inertness of even a thin layer of MCD.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: May 26, 2020
    Assignee: JOHN CRANE INC.
    Inventors: Hongjun Zeng, John Arthur Carlisle, Ian Wakefield Wylie
  • Patent number: 10259727
    Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: April 16, 2019
    Assignee: Advanced Diamond Technologies, Inc.
    Inventors: Ian Wakefield Wylie, Prabhu U. Arumugam, Hongjun Zeng, John Arthur Carlisle
  • Publication number: 20180346352
    Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.
    Type: Application
    Filed: August 10, 2018
    Publication date: December 6, 2018
    Applicant: Advanced Diamond Technologies, Inc.
    Inventors: Ian Wakefield Wylie, Prabhu U. Arumugam, Hongjun Zeng, John Arthur Carlisle
  • Patent number: 10046989
    Abstract: An electrochemical system and method are disclosed for On Site Generation (OSG) of oxidants, such as free available chlorine, mixed oxidants and persulfate. Operation at high current density, using at least a diamond anode, provides for higher current efficiency, extended lifetime operation, and improved cost efficiency. High current density operation, in either a single pass or recycle mode, provides for rapid generation of oxidants, with high current efficiency, which potentially allows for more compact systems. Beneficially, operation in reverse polarity for a short cleaning cycle manages scaling, provides for improved efficiency and electrode lifetime and allows for use of impure feedstocks without requiring water softeners. Systems have application for generation of chlorine or other oxidants, including mixed oxidants providing high disinfection rate per unit of oxidant, e.g. for water treatment to remove microorganisms or for degradation of organics in industrial waste water.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: August 14, 2018
    Assignee: Advanced Diamond Technologies, Inc.
    Inventors: Ian Wakefield Wylie, Prabhu U. Arumugam, Hongjun Zeng, John Arthur Carlisle
  • Publication number: 20160362803
    Abstract: A novel durable composite diamond electrode comprising at least a relatively thicker conductive layer of UNCD (Ultrananocrystalline Diamond) layer with a Young's modulus of less than 900 GPa on a niobium substrate underlying a relatively thinner conductive MCD (Microcrystalline Diamond) layer with a Young's modulus of greater than 900 GPa, has been shown to exhibit superior delamination resistance under extreme shear stress during electrochemical oxidation reliability testing. Highly accelerated lifetime testing of these durable composite diamond electrodes at a constant current density of 2.5 amps/cm2 (25000 amps/m2) in a 1 M NaCl (58 g/L) solution, have demonstrated lifetimes before delamination failure of greater than 2000 hours (i.e. >5000 Ahr/cm2). Using a conservative estimate of lifetime to failure with a cubed dependence on current density, the lifetime at a more typical operating current density of 0.25 amps/cm2 (2500 amps/m2) would be at least 2,000,000 hours (228 years) and >3.5 years at 1.
    Type: Application
    Filed: June 10, 2016
    Publication date: December 15, 2016
    Applicant: Advanced Diamond Technologies, Inc.
    Inventors: Hongjun Zeng, John Arthur Carlisle, Ian Wakefield Wylie
  • Publication number: 20160348236
    Abstract: A novel composite diamond film comprising of a relatively thick layer of UNCD (Ultrananocrystalline Diamond) with a Young's modulus of less than 900 GPa and an underlying relatively thin MCD (microcrystalline diamond) layer with a Young's modulus of greater than 900 GPa, has been shown to exhibit superior delamination resistance under extreme shear stress. It is hypothesized that this improvement is due to a combination of stress relief by the composite film with a slightly “softer” UNCD layer, a disruption of the fracture mechanism through the composite layer(s), and the near ideal chemical and thermal expansion coefficient match between the two diamond layers. The combination of a thick but “softer” underlying UNCD layer with a thin but harder overlying MCD layer provides an excellent compromise between the low deposition cost and smoothness of UNCD with the extreme hardness and unparalleled chemical, electrochemical and immunological inertness of even a thin layer of MCD.
    Type: Application
    Filed: May 27, 2016
    Publication date: December 1, 2016
    Applicant: Advanced Diamond Technologies, Inc.
    Inventors: Hongjun Zeng, John Arthur Carlisle, Ian Wakefield Wylie
  • Patent number: 6444536
    Abstract: In accordance with the invention, a bipolar transistor is fabricated by disposing a sacrificial layer over the conventional semiconductor workpiece. The sacrificial layer is patterned into a stripe corresponding to the emitter stripe, and the base contacts are formed in relation to the sacrificial stripe. The stripe is removed, and the base and emitter are formed. In the preferred embodiment, the sacrificial layer is a stack of layers providing etch selectivity.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: September 3, 2002
    Assignee: Agere Systems Guardian Corp.
    Inventor: Ian Wakefield Wylie
  • Publication number: 20020013025
    Abstract: In accordance with the invention, a bipolar transistor is fabricated by disposing a sacrificial layer over the conventional semiconductor workpiece. The sacrificial layer is patterned into a stripe corresponding to the emitter stripe, and the base contacts are formed in relation to the sacrificial stripe. The stripe is removed, and the base and emitter are formed. In the preferred embodiment, the sacrificial layer is a stack of layers providing etch selectivity.
    Type: Application
    Filed: July 8, 1999
    Publication date: January 31, 2002
    Inventor: IAN WAKEFIELD WYLIE