Patents by Inventor Ichiki Takemoto

Ichiki Takemoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8476473
    Abstract: A compounds represented by the Formula (I) or the Formula (I?). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q?1 to Q?4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
    Type: Grant
    Filed: September 1, 2009
    Date of Patent: July 2, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando, Mitsuhiro Hata
  • Patent number: 8378016
    Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: February 19, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
  • Patent number: 8329377
    Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: December 11, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Tatsuro Masuyama, Takashi Hiraoka
  • Patent number: 8173350
    Abstract: An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: May 8, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Takashi Hiraoka, Ichiki Takemoto
  • Patent number: 8158329
    Abstract: The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: April 17, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Patent number: 8110336
    Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: February 7, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Patent number: 8071270
    Abstract: The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.
    Type: Grant
    Filed: February 23, 2009
    Date of Patent: December 6, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Patent number: 8062830
    Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: November 22, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
  • Patent number: 8057983
    Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
    Type: Grant
    Filed: April 17, 2009
    Date of Patent: November 15, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando, Ichiki Takemoto
  • Publication number: 20110236827
    Abstract: The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a C1-C6 alkyl group, R2, R3 and R4 each independently represents a C1-C6 alkyl group and R1, R2, R3, R4 and A1 are bonded to form a ring, A1 represents a C1-C20 saturated hydrocarbon group in which one or more —CH2— can be replaced by —O—, B1 and B2 each independently represent a C1-C6 alkylene group, L1 and L2 each independently represent a halogen atom, —O—CH?CH2, —O—CH?CH(CH3) or —O—SO2—R? in which R? represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.
    Type: Application
    Filed: March 23, 2011
    Publication date: September 29, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ichiki TAKEMOTO, Nobuo ANDO
  • Publication number: 20110189610
    Abstract: The present invention provides a photoresist composition comprising a compound represented by the formula (I): wherein R1, R2, R3 and R4 independently represent a hydrogen atom etc., X1 to X8 independently represent a hydrogen atom or a group represented by the formula (II): wherein R11 and R12 independently represent a hydrogen atom etc., m represents an integer of 1 to 4, R13 represents a C1-C6 alkyl group etc., and ring Y1 represents a C3-C20 saturated hydrocarbon ring, and an acid generator represented by the formula (B1): wherein Q1 and Q2 independently represent a fluorine atom etc., Lb1 represents a C1-C17 saturated divalent hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C1-C18 aliphatic hydrocarbon group etc., and Z+ represents an organic cation.
    Type: Application
    Filed: February 1, 2011
    Publication date: August 4, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Nobuo ANDO, Ichiki TAKEMOTO
  • Publication number: 20110165519
    Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
    Type: Application
    Filed: March 18, 2011
    Publication date: July 7, 2011
    Inventors: Nobuo ANDO, Ichiki TAKEMOTO, Isao YOSHIDA, Yukako HARADA
  • Patent number: 7932334
    Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: April 26, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
  • Publication number: 20100279226
    Abstract: The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.
    Type: Application
    Filed: December 22, 2008
    Publication date: November 4, 2010
    Inventors: Mitsuhiro Hata, Yoshiyuki Takata, Satoshi Yamaguchi, Ichiki Takemoto, Takayuki Miyagawa, Yusuke Fuji
  • Patent number: 7794914
    Abstract: The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.
    Type: Grant
    Filed: February 12, 2007
    Date of Patent: September 14, 2010
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Nobuo Ando, Yusuke Fuji, Ichiki Takemoto
  • Publication number: 20100151379
    Abstract: The present invention provides a compound represented by the formula (I): wherein P1, P2, P3, P4 and P5 each independently represents a hydrogen atom etc., and at least one selected from the group consisting of R1, R2, R3, R4, R5, R6, R7, R8 and R9 is the group represented by the formula (II): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others each independently represent a hydrogen atom, a C1-C6 alkyl group or a hydroxyl group, and a chemically amplified resist composition containing the same.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 17, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Publication number: 20100151380
    Abstract: A resist composition comprising: (A) a resin being insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a polyhydric phenol compound represented by the formula (1): wherein at least one selected from the group consisting of R1, R2, R3, R4, and R5 is a group represented by the formula (2): wherein X1 and X2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and (C) an acid generator.
    Type: Application
    Filed: December 8, 2009
    Publication date: June 17, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Nobuo ANDO, Ichiki TAKEMOTO
  • Publication number: 20100075257
    Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.
    Type: Application
    Filed: September 18, 2009
    Publication date: March 25, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Ichiki TAKEMOTO, Nobuo ANDO
  • Publication number: 20100055609
    Abstract: A compounds represented by the Formula (I) or the Formula (I?). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q?1 to Q?4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
    Type: Application
    Filed: September 1, 2009
    Publication date: March 4, 2010
    Inventors: Ichiki TAKEMOTO, Nobuo Ando, Mitsuhiro Hata
  • Publication number: 20100028807
    Abstract: An imide compound represented by the formula (I): wherein R1 represents a C1-C20 aliphatic hydrocarbon group etc., W1 represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., and A represents a group represented by the formula (I-1): wherein A1 represents —CH2—CH2— etc., and a chemically amplified resist composition containing the same.
    Type: Application
    Filed: July 21, 2009
    Publication date: February 4, 2010
    Applicant: SUMITOMO CHEMICAL COMPANY, LTD.
    Inventors: Ichiki TAKEMOTO, Tatsuro MASUYAMA, Takashi HIRAOKA