Patents by Inventor Inez Marlena SOCHAL

Inez Marlena SOCHAL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220011683
    Abstract: A method for determining a layout of mark positions across a patterning device or substrate, the method including: obtaining a model configured to model data associated with measurements performed on the patterning device or substrate at one or more mark positions; obtaining an initial mark layout including initial mark positions; reducing the initial mark layout by removal of one or more mark positions to obtain a plurality of reduced mark layouts, each reduced mark layout obtained by removal of a different mark position from the initial mark layout; determining a model uncertainty metric associated with usage of the model for each reduced mark layout out of the plurality of reduced mark layouts; and selecting one or more reduced mark layouts based on its associated model uncertainty metric.
    Type: Application
    Filed: October 21, 2019
    Publication date: January 13, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Pavel SMAL, Inez Marlena SOCHAL, Gautam SARMA