Patents by Inventor Itsuki Kajino

Itsuki Kajino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10414153
    Abstract: Force for biasing a roller member is changed according to the contact state of first and second plate-like bodies during the travel of the roller member. By that, the pressing force per unit area given from the second plate-like body to the first plate-like body during travel is suppressed. An object to be transferred is satisfactorily transferred despite a change in the contact state of the plate-like bodies during the travel of the roller member.
    Type: Grant
    Filed: July 20, 2017
    Date of Patent: September 17, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Itsuki Kajino, Mikio Masuichi, Hiroyuki Ueno, Kazuhiro Shoji
  • Publication number: 20180071771
    Abstract: A first movable body is provided movably in a separation direction and a first engaging member is provided for each suction unit. When the first movable body is moved in the separation direction, the plurality of first engaging members are respectively engaged with the first movable body in the same sequence as an array sequence of the suction units. Thereafter, the suction units are moved in the separation direction together with the first movable body.
    Type: Application
    Filed: August 14, 2017
    Publication date: March 15, 2018
    Inventors: Itsuki KAJINO, Miyoshi UENO, Mikio MASUICHI, Hiroyuki UENO, Kazuhiro SHOJI
  • Publication number: 20180029353
    Abstract: Force for biasing a roller member is changed according to the contact state of first and second plate-like bodies during the travel of the roller member. By that, the pressing force per unit area given from the second plate-like body to the first plate-like body during travel is suppressed. An object to be transferred is satisfactorily transferred despite a change in the contact state of the plate-like bodies during the travel of the roller member.
    Type: Application
    Filed: July 20, 2017
    Publication date: February 1, 2018
    Inventors: Itsuki KAJINO, Mikio MASUICHI, Hiroyuki UENO, Kazuhiro SHOJI
  • Publication number: 20170173939
    Abstract: It is aimed to provide a technique enabling a roller member to press a plate body with a uniform and stable pressing force. A transfer roller 431 configured to come into contact with a blanket BL and press the blanket BL against a substrate SB is rotatably supported by a pair of supports 430 on opposite end parts thereof. Supporting angles 4334 configured to support a rotary shaft of the transfer roller 431 are supported movably upward and downward by linear guides 4332, 4333 and biased upwardly by biasing portions 434. Displacements of the supporting angles 4334 by biasing forces are restrained at a predetermined height by stoppers 435, and the posture of the transfer roller 431 (inclination of the rotary shaft) when the transfer roller 431 approaches the blanket BL from below is controlled. Restraint by the stoppers 435 is released when the blanket BL is pressed against the substrate SB and a constant pressing force is applied to the blanket BL by the biasing forces.
    Type: Application
    Filed: December 14, 2016
    Publication date: June 22, 2017
    Inventors: Itsuki KAJINO, Kazuhiro SHOJI, Mikio MASUICHI
  • Publication number: 20170173940
    Abstract: It is aimed to suppress the influence of a positional deviation occurring in bringing two plate bodies aligned in advance into contact in a transfer apparatus for bringing two plate bodies into contact by pressing by a roller member. Alignment mechanisms 71 are mounted on a main frame 10 and an alignment stage 36 is mounted on the alignment mechanisms 71. A lower stage block 3, a transfer roller block 4 and a roller travel driver 5 are placed via a detachable stage 37 on the alignment stage 36. A positional relationship between a blanket BL held on a lower stage 31 and a transfer roller 431 for pushing up the blanket BL does not vary by an alignment adjustment. Thus, the influence of a positional deviation, a magnitude of which changes according to the amount of deflection of the blanket BL, can be suppressed.
    Type: Application
    Filed: December 14, 2016
    Publication date: June 22, 2017
    Inventors: Kazuhiro SHOJI, Itsuki KAJINO, Mikio MASUICHI
  • Patent number: 9056499
    Abstract: A plurality of through holes are provided between upstream ejection ports and downstream ejection ports. Thereby, when a rear end portion and therearound of a paper sheet is opposed to the downstream ejection ports, gas sucked to suction holes exposed at an upstream side of the paper sheet can be absorbed from the through holes. This can suppress an airflow occurring between a housing and the paper sheet. As a result, deviation of ink droplets ejected from the downstream ejection ports can be suppressed.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: June 16, 2015
    Assignee: SCREEN HOLDINGS CO., LTD.
    Inventors: Itsuki Kajino, Masayuki Kataoka
  • Patent number: 8206548
    Abstract: Mutually different plural kinds of processing liquid are sequentially supplied to a gap space in which a substrate is arranged to perform a wet processing to the substrate with respect to each processing liquid. Further, the processing liquid used in the wet processing is sequentially released from the communicating portion upon execution of each wet processing. The liquid retrieval tanks are selectively positioned at a retrieval position corresponding to the kind of processing liquid released from the communicating portion by relatively moving the processing unit and the liquid retrieval unit. The liquid retrieval unit is separated from the processing unit and is arranged below the processing unit. The processing liquid is released from the communicating portion of the processing unit to below the gap space downwards vertically.
    Type: Grant
    Filed: February 13, 2008
    Date of Patent: June 26, 2012
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Itsuki Kajino, Akihiro Hosokawa, Kozo Terashima
  • Publication number: 20120154500
    Abstract: A plurality of through holes are provided between upstream ejection ports and downstream ejection ports. Thereby, when a rear end portion and therearound of a paper sheet is opposed to the downstream ejection ports, gas sucked to suction holes exposed at an upstream side of the paper sheet can be absorbed from the through holes. This can suppress an airflow occurring between a housing and the paper sheet. As a result, deviation of ink droplets ejected from the downstream ejection ports can be suppressed.
    Type: Application
    Filed: November 22, 2011
    Publication date: June 21, 2012
    Inventors: Itsuki KAJINO, Masayuki Kataoka
  • Patent number: 7584760
    Abstract: A substrate (W) is held and rotated in its horizontal position on a spin base (10). A processing liquid can be supplied from a processing liquid lower nozzle 15 to the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (30). A splash guard (50) is disposed so as to circumscribe the substrate (W). A guard (52) is curved such that the vertical cross section of a recovery port (52f) of the splash guard (50) is of substantially U-shape opening to the center of the splash guard (50), so that the maximum internal diameter part of the recovery port (52f) is brought near a guard (53). The space between the internal wall surface of the recovery port (52f) and the substrate (W) is increased to thereby suppress the bounce of the processing liquid flying spattering from the substrate (W) in rotation.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: September 8, 2009
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Katsuhiko Miya, Akira Izumi, Takashi Kawamura, Itsuki Kajino
  • Publication number: 20080237188
    Abstract: Mutually different plural kinds of processing liquid are sequentially supplied to a gap space in which a substrate is arranged to perform a wet processing to the substrate with respect to each processing liquid. Further, the processing liquid used in the wet processing is sequentially released from the communicating portion upon execution of each wet processing. The liquid retrieval tanks are selectively positioned at a retrieval position corresponding to the kind of processing liquid released from the communicating portion by relatively moving the processing unit and the liquid retrieval unit. The liquid retrieval unit is separated from the processing unit and is arranged below the processing unit. The processing liquid is released from the communicating portion of the processing unit to below the gap space downwards vertically.
    Type: Application
    Filed: February 13, 2008
    Publication date: October 2, 2008
    Inventors: Itsuki Kajino, Akihiro Hosokawa, Kozo Terashima
  • Publication number: 20040226655
    Abstract: A substrate processing apparatus is provided with a spin base for rotationally holding a substrate, an atmosphere cutoff plate for cutting off a top surface of the substrate from the outer atmosphere, a splash guard for receiving a processing solution spun off from the substrate or the like, a guard up-and-down moving mechanism for vertically moving the splash guard. In performing processing with a processing solution while rotating a substrate, the splash guard is disposed by the guard up-and-down moving mechanism so that the level of a top surface of the splash guard should not be higher than the level of a top surface of the atmosphere cutoff plate and it is thereby possible to prevent the atmosphere above the atmosphere cutoff plate from being involved in the recovery duct through rotation of the atmosphere cutoff plate.
    Type: Application
    Filed: March 26, 2004
    Publication date: November 18, 2004
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Itsuki Kajino, Takashi Kawamura, Kaori Asakino
  • Patent number: 6793769
    Abstract: A substrate processing apparatus injects gas from an injection port formed on a shielding surface of an atmosphere shielding part and sucks a substrate by Bernoulli effect. The substrate is sucked in a state coming into contact with a contact supporting surface of a support member provided on the atmosphere shielding part, and rotated with the upper surface shielded by a shielding surface of the shielding part. A solution supply part supplies a chemical solution to the lower surface of the substrate. Therefore, mist of a processing solution or the processing solution can be reliably prevented from reaching the upper surface of the substrate. Thus provided is a substrate processing apparatus capable of reliably preventing the mist of the processing solution or the processing solution from reaching the upper surface of the substrate.
    Type: Grant
    Filed: October 25, 2002
    Date of Patent: September 21, 2004
    Assignee: Dainippon Screen Mfg. Co. Ltd.
    Inventors: Itsuki Kajino, Hideki Adachi
  • Publication number: 20040050491
    Abstract: A substrate (W) is held and rotated in its horizontal position on a spin base (10). A processing liquid can be supplied from a processing liquid lower nozzle 15 to the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (30). A splash guard (50) is disposed so as to circumscribe the substrate (W). A guard (52) is curved such that the vertical cross section of a recovery port (52f) of the splash guard (50) is of substantially U-shape opening to the center of the splash guard (50), so that the maximum internal diameter part of the recovery port (52f) is brought near a guard (53). The space between the internal wall surface of the recovery port (52f) and the substrate (W) is increased to thereby suppress the bounce of the processing liquid flying spattering from the substrate (W) in rotation.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 18, 2004
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Katsuhiko Miya, Akira Izumi, Takashi Kawamura, Itsuki Kajino
  • Patent number: 6669808
    Abstract: A support member of a rotary base member engages with a substrate for preventing the substrate from horizontal movement and rotation with respect to the rotary base member while allowing vertical movement of the substrate, and a proximity suction plate is provided above the rotary base member so that the lower surface thereof is formed on a plane on the rotary base member parallel to the substrate for downwardly and outwardly injecting gas toward the overall upper surface of the substrate and sucking the substrate in a proximity state by Bernoulli effect. It is possible to provide an apparatus capable of reliably preventing mist of a processing solution or the processing solution from reaching the upper surface of the substrate when rotating the substrate and supplying the processing solution to the lower surface for processing the substrate.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: December 30, 2003
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Hideki Adachi, Katsuhiko Miya, Akira Izumi, Itsuki Kajino
  • Publication number: 20030079835
    Abstract: A substrate processing apparatus injects gas from an injection port formed on a shielding surface of an atmosphere shielding part and sucks a substrate by Bernoulli effect. The substrate is sucked in a state coming into contact with a contact supporting surface of a support member provided on the atmosphere shielding part, and rotated with the upper surface shielded by a shielding surface of the shielding part. A solution supply part supplies a chemical solution to the lower surface of the substrate. Therefore, mist of a processing solution or the processing solution can be reliably prevented from reaching the upper surface of the substrate. Thus provided is a substrate processing apparatus capable of reliably preventing the mist of the processing solution or the processing solution from reaching the upper surface of the substrate.
    Type: Application
    Filed: October 25, 2002
    Publication date: May 1, 2003
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Itsuki Kajino, Hideki Adachi
  • Publication number: 20020134512
    Abstract: A support member of a rotary base member engages with a substrate for preventing the substrate from horizontal movement and rotation with respect to the rotary base member while allowing vertical movement of the substrate, and a proximity suction plate is provided above the rotary base member so that the lower surface thereof is formed on a plane on the rotary base member parallel to the substrate for downwardly and outwardly injecting gas toward the overall upper surface of the substrate and sucking the substrate in a proximity state by Bernoulli effect. It is possible to provide an apparatus capable of reliably preventing mist of a processing solution or the processing solution from reaching the upper surface of the substrate when rotating the substrate and supplying the processing solution to the lower surface for processing the substrate.
    Type: Application
    Filed: March 18, 2002
    Publication date: September 26, 2002
    Applicant: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Hideki Adachi, Katsuhiko Miya, Akira Izumi, Itsuki Kajino