Patents by Inventor Jae-Bong Lim

Jae-Bong Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240329519
    Abstract: The imprinting device according to a representative embodiment includes: a stamp holder configured such that a stamp is mounted thereon; a substrate holder arranged in a first direction with respect to the stamp holder and configured such that a substrate is mounted thereon; an ultraviolet emitter configured to emit ultraviolet rays toward the substrate mounted on the substrate holder; and a pressing module configured to move at least one of the substrate holder or the stamp holder such that the substrate holder and the stamp mounted on the stamp holder come into contact with each other, wherein the imprinting device is configured to allow the stamp to be mounted on the stamp holder in a state in which the substrate holder and the stamp holder are spaced apart from each other by a predetermined distance or more.
    Type: Application
    Filed: March 30, 2022
    Publication date: October 3, 2024
    Applicants: KOH YOUNG TECHNOLOGY INC, KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Hyung Jun LIM, Soon Geun KWON, Hak Jong CHOI, Jun Hyoung AHN, Gee Hong KIM, Kee Bong CHOI, Jae Jong LEE
  • Publication number: 20230418161
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Patent number: 11822248
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: November 21, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Patent number: 11567409
    Abstract: A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: January 31, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung June Lee, Suwoong Kim, Min Kyung Jang, Jin Hong Park, Jae Hwan Sim, Jae Bong Lim
  • Patent number: 11493845
    Abstract: An anti-reflective coating composition is provided. The anti-reflective coating composition of the present invention can be useful in preventing a pull-back phenomenon in which an anti-reflective coating layer tears on a corner of a pattern of a substrate during a heat curing process and improving gap-filling performance of the pattern since a crosslinker is attached to a polymer in the composition and the content of the low-molecular-weight crosslinker in the composition is minimized to regulate a heat curing initiation temperature.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: November 8, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jae Hwan Sim, So-Yeon Kim, Jung Kyu Jo, Hye-Won Lee, Jihoon Kang, Jae-Bong Lim, Jun-Han Yun
  • Patent number: 11448964
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a thermal acid generator that comprises: i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl; and ii) a sulfonic acid component.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: September 20, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Bong Lim, Jun-Han Yun, Ji-Hoon Kang
  • Patent number: 11269252
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: March 8, 2022
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • Patent number: 11262656
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
    Type: Grant
    Filed: March 31, 2016
    Date of Patent: March 1, 2022
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Hye-Won Lee, Eunhye Cho, Jung Kyu Jo, Jin Hong Park, Eui Hyun Ryu, Jae-Bong Lim
  • Publication number: 20210324122
    Abstract: A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.
    Type: Application
    Filed: April 17, 2020
    Publication date: October 21, 2021
    Inventors: Jung June Lee, Suwoong Kim, Min Kyung Jang, Jin Hong Park, Jae Hwan Sim, Jae Bong Lim
  • Patent number: 11092894
    Abstract: The present invention relates to a method for forming a pattern by negative tone development (NTD) which is prepared by forming an anti-reflective coating composition layer comprising a photoacid generator between the substrate and the photoresist composition layer, and thus exhibits improved line width (CD) in the pattern and prevents pattern collapse owing to thorough activation of de-blocking of the photoresist composition layer during the exposure process.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: August 17, 2021
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jihoon Kang, Hye-Won Lee, Seung Uk Lee, Sook Lee, Jae-Bong Lim
  • Publication number: 20210200081
    Abstract: Pattern formation methods comprise: (a) forming an underlayer on a substrate, wherein the underlayer has a thickness of 5 microns or more; (b) forming a photoresist layer on the underlayer, wherein the photoresist layer is formed from a photoresist composition comprising a silicon-containing polymer, a photoacid generator, and a solvent, wherein the silicon-containing polymer comprises as polymerized units a monomer of formula (I): wherein: R1 is independently chosen from H, F, OH, C1-C6 alkyl, C1-C6 haloalkyl, C1-C6 hydroxy-haloalkyl, C1-C6 alkoxy, or C1-C6 haloalkoxy; R2 is independently chosen from H or F; R3 is independently chosen from H, F, CH3, CF3, CHF2, or CH2F; comprises an acid cleavable group; and m is an integer from 0 to 2; (c) patternwise exposing the photoresist layer to activating radiation; (d) developing the exposed photoresist layer to form a photoresist pattern; and (f) transferring the pattern of the photoresist pattern into the underlayer using the photoresist pattern as an etch mas
    Type: Application
    Filed: December 3, 2020
    Publication date: July 1, 2021
    Inventors: Cheng-Bai XU, Cong Liu, James Field Cameron, Jae-Bong Lim, Xisen Hou, Jae-Hwan Sim
  • Publication number: 20210026242
    Abstract: An antireflective coating composition, including a polymer, a photoacid generator having a crosslinkable group, a compound capable of crosslinking the polymer and the photoacid generator, a thermal acid generator, and an organic solvent.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 28, 2021
    Inventors: Jung-June Lee, Jae-Yun Ahn, Jae-Hwan Sim, Jae-Bong Lim, Emad Aqad, Myung-Yeol Kim
  • Publication number: 20200133126
    Abstract: A monomer represented by Chemical Formula (1): wherein, X, Y, and Z are the same as described in the specification, and the polymer including repeat units derived from the monomer.
    Type: Application
    Filed: October 31, 2018
    Publication date: April 30, 2020
    Inventors: Jae Hwan Sim, Suwoong Kim, Jin Hong Park, Myung Yeol Kim, Yoo-Jin Ghang, Jae-Bong Lim
  • Patent number: 10527942
    Abstract: In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more glycidyl groups; and 2) one or more aromatic groups that each comprises two or more substituents that comprise hydroxy, thiol and/or amine moieties. Catechol-containing polymers and methods for producing same also are provided.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: January 7, 2020
    Assignee: Rohm and Haas Electronics Materials Korea Ltd.
    Inventors: Jae Hwan Sim, Jung Kyu Jo, EunHye Cho, Hye-Won Lee, Jin Hong Park, Eui-Hyun Ryu, Jae-Bong Lim
  • Patent number: 10429737
    Abstract: New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: October 1, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Jung-June Lee, Jae Bong Lim
  • Publication number: 20190085173
    Abstract: New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.
    Type: Application
    Filed: September 21, 2017
    Publication date: March 21, 2019
    Inventors: Jung-June Lee, Jae Bong Lim
  • Publication number: 20180364576
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more PDQ compounds that are distinct from the 1) one or more resins.
    Type: Application
    Filed: June 19, 2017
    Publication date: December 20, 2018
    Inventors: Jung-June Lee, Jae Yun Ahn, Bon-Ki Ku, Jae Hwan Sim, Jae-Bong Lim
  • Publication number: 20170336709
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a thermal acid generator that comprises: i) a pyridinium component having one or more ring substituents selected from optionally substituted alkyl and optionally substituted heteroalkyl; and ii) a sulfonic acid component.
    Type: Application
    Filed: May 23, 2016
    Publication date: November 23, 2017
    Inventors: Jung-June Lee, Jae-Bong Lim, Jun-Han Yun, Ji-Hoon Kang
  • Publication number: 20170283651
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.
    Type: Application
    Filed: March 31, 2016
    Publication date: October 5, 2017
    Inventors: Jae Hwan Sim, Hye-Won Lee, Eunhye Cho, Jung Kyu Jo, Jin Hong Park, Eui Hyun Ryu, Jae-Bong Lim
  • Patent number: 9676903
    Abstract: A polyester resin copolymerized with isosorbide and 1,4-cyclohexane dimethanol and having an improved impact strength, and a method for preparing the same are disclosed. The copolymerized polyester resin has an alternating structure of acid moieties which are derived from acid components and diol moieties which are derived from diol components, wherein the acid components comprise terephthalic acid, and the diol components comprise (i) 5˜99 mol % of 1,4-cyclohexanedimethanol and (ii) 1˜60 mol % of isosorbide with respect to the total diol components.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: June 13, 2017
    Assignee: SK CHEMICALS CO., LTD.
    Inventors: Roy Lee, Jong-Ryang Kim, Jae-Bong Lim, Won-Jae Yoon, Dong-Jin Kim, Kyu-Tae Park, Yoo-Jin Lee