Patents by Inventor Jae-Yeol BAEK

Jae-Yeol BAEK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240071276
    Abstract: A display apparatus includes a display panel, an afterimage compensator and a data driver. The display panel displays an image. The afterimage compensator writes first stress data of input image data corresponding to a first area to a first memory area in a first block size and second stress data of the input image data corresponding to a second area to a second memory area in a second block size different from the first block size and compensates a grayscale value of the input image data based on the first stress data and the second stress data. The data driver generates a data voltage based on a compensated grayscale value and outputs the data voltage to the display panel.
    Type: Application
    Filed: October 27, 2023
    Publication date: February 29, 2024
    Inventors: JAE SHIN KIM, INBOK SONG, SUNG-YEOL BAEK, KYUNGSU LEE
  • Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Patent number: 9874812
    Abstract: Methods of forming a hardmask material film are provided.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: January 23, 2018
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Myeong-koo Kim, Nae-ry Yu, Won-ki Lee, Hyun-woo Kim, Song-se Yi, Min-soo Kim, Jae-yeol Baek, Hyun-ji Song
  • Patent number: 9482943
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: November 1, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Jae-Hwan Song, Eun-Kyoung Youn, Bum-Jin Lee, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Publication number: 20160225636
    Abstract: Methods of forming a hardmask material film are provided.
    Type: Application
    Filed: January 29, 2016
    Publication date: August 4, 2016
    Inventors: Myeong-koo KIM, Nae-ry YU, Won-ki LEE, Hyun-woo KIM, Song-se YI, Min-soo KIM, Jae-yeol BAEK, Hyun-ji SONG
  • Patent number: 9405188
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: August 2, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU
  • Patent number: 9323147
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: April 26, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Publication number: 20150291842
    Abstract: A positive photosensitive resin composition includes (A) an alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a photosensitive diazoquinone compound; and (C) a solvent, a photosensitive resin film, and a display device including the same.
    Type: Application
    Filed: October 23, 2014
    Publication date: October 15, 2015
    Inventors: Sang-Soo KIM, Jin-Hee KANG, Yong-Tae KIM, Kun-Bae NOH, Jae-Yeol BAEK, Han-Sung YU, Bum-Jin LEE, Sang-Haeng LEE, Jong-Hwa LEE, Jin-Young LEE
  • Publication number: 20150177617
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 25, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150168835
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 18, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150118622
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: May 22, 2014
    Publication date: April 30, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Publication number: 20150050594
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Application
    Filed: May 21, 2014
    Publication date: February 19, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Eun-Kyoung YOUN, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG