Abstract: A precursor for preparing a chemical mechanical polishing pad includes a prepolymer, a disulfide-containing component, and a curative. The chemical mechanical polishing pad prepared from the precursor includes a disulfide bridge in a polymer matrix. The disulfide bridge may include a disulfide bond capable of undergoing a chain exchange reaction at temperatures experienced during chemical mechanical polishing processes, resulting in rearrangement of nearby disulfide bonds during the chemical mechanical polishing processes rather than breakage of these bonds.

Abstract: A laundry treating apparatus incudes a first treating apparatus, a second treating apparatus that is disposed vertically below the first treating apparatus and supports the first treating apparatus, and an insulating portion that connects the first treating apparatus and the second treating apparatus to each other. The first treating apparatus includes a first cabinet that defines an external appearance of the first treating apparatus, and a first drum disposed inside the first cabinet and configured to accommodate laundry therein. The second treating apparatus includes a second cabinet that defines an external appearance of the second treating apparatus, and a second drum disposed inside the second cabinet and configured to accommodate laundry therein. The insulating portion includes an insulating material and electrically insulates the first treating apparatus and the second treating apparatus from each other.

Abstract: Antibody-mediated rejection (ABMR) is one of the main obstacles to successful transplantation, including ABO blood group-incompatible (ABOi) transplantation. C4d deposition is a marker of ABMR and is also found in most ABOi allograft tissues. Described herein are anti-C4d CAR Tregs that suppress ABMR in ABOi allografts. Anti-C4d CAR Tregs prepared by retroviral transduction of CAR into CD62L +CD4 +CD25 +Tregs, expressed Foxp3, CD25, CTLA-4, LAP, and GITR to similar extents as non-transduced Tregs. Anti-C4d CAR Tregs were activated by specific binding to C4d and suppressed in vitro T cell proliferation as well as non-transduced Tregs. Furthermore, adoptive transfer of anti-C4d CAR Tregs significantly prolonged mouse ABOi heart allograft survival (P<0.05).

Abstract: Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.

Abstract: A laundry treating apparatus incudes a first treating apparatus, a second treating apparatus that is disposed vertically below the first treating apparatus and supports the first treating apparatus, and an insulating portion that connects the first treating apparatus and the second treating apparatus to each other. The first treating apparatus includes a first cabinet that defines an external appearance of the first treating apparatus, and a first drum disposed inside the first cabinet and configured to accommodate laundry therein. The second treating apparatus includes a second cabinet that defines an external appearance of the second treating apparatus, and a second drum disposed inside the second cabinet and configured to accommodate laundry therein. The insulating portion includes an insulating material and electrically insulates the first treating apparatus and the second treating apparatus from each other.

Abstract: In some embodiments, a display module for implementing an image using an inorganic light emitting device includes a substrate, a thin film transistor (TFT) layer provided on the substrate, a plurality of connection pads provided on the TFT layer, an anisotropic conductive layer provided on the TFT layer, an inorganic light emitting element bonded to the anisotropic conductive layer, and a conductive ball control layer provided in a surrounding area of the plurality of connection pads. The anisotropic conductive layer includes an adhesive layer and a plurality of conductive balls distributed inside the adhesive layer. The inorganic light emitting element includes a plurality of electrodes corresponding to the plurality of connection pads. The conductive ball control layer is configured to restrict the plurality of conductive balls from moving in a direction perpendicular to a bonding direction while the inorganic light emitting element is being bonded to the anisotropic conductive layer.

Abstract: Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.

Abstract: A transparent display module includes: a transparent substrate; a line pattern provided on the transparent substrate in a form of a two-dimensional grid; a plurality of micro-pixel integrated circuits (ICs) provided on the line pattern; a plurality of inorganic light emitting elements provided on the line pattern or the plurality of micro-pixel ICs; a plurality of transparent areas formed in areas in which the line pattern is not provided, and at least one pixel circuit configured to supply a driving current to the plurality of inorganic light emitting elements.

Abstract: A stack-type laundry treating apparatus includes upper and lower treating apparatuses and aligning legs. The upper treating apparatus includes an upper cabinet including an upper side panel and an upper base panel. The lower treating apparatus includes a lower cabinet including a lower side panel. A top of the lower cabinet is covered with the upper base panel. The aligning legs are interposed between the upper side panel and the lower side panel to space the upper side panel and the lower side panel from each other by a predefined vertical spacing. The upper side panel has a bottom portion vertically and downwardly extending along the predefined vertical spacing.

Abstract: A laundry treating apparatus incudes a first treating apparatus, a second treating apparatus that is disposed vertically below the first treating apparatus and supports the first treating apparatus, and an insulating portion that connects the first treating apparatus and the second treating apparatus to each other. The first treating apparatus includes a first cabinet that defines an external appearance of the first treating apparatus, and a first drum disposed inside the first cabinet and configured to accommodate laundry therein. The second treating apparatus includes a second cabinet that defines an external appearance of the second treating apparatus, and a second drum disposed inside the second cabinet and configured to accommodate laundry therein. The insulating portion includes an insulating material and electrically insulates the first treating apparatus and the second treating apparatus from each other.

Abstract: Polishing pads having discrete and selectively arranged regions of varying porosity within a continuous phase of polymer material are provided herein. In one embodiment a polishing pad features a plurality of polishing elements each comprising a polishing surface and sidewalls extending downwardly from the polishing surface to define a plurality of channels disposed between the polishing elements, wherein one or more of the polishing elements is formed of a continuous phase of polymer material having one or more first regions comprising a first porosity and a second region comprising a second porosity, wherein the second porosity is less than the first porosity.

Abstract: A laundry treatment apparatus in accordance with the present disclosure includes a drum configured to accommodate laundry, an air channel through which air is flowed into or out of the drum, a fan configured to put pressure on air in the air channel for flowing of the air, a fan motor configured to rotate the fan and being controlled by adjusting of a RPM, an abnormal airflow detection unit disposed on the air channel and configured to detect whether an abnormal state of airflow is occurred, and a controller configured to cause the RPM of the fan motor to be increased. The controller configured to cause laundry to be dried by rotating the fan motor at a predetermined base RPM, and to cause the RPM to be increased if the abnormality of airflow is detected by the abnormal airflow detection unit while the fan motor is rotating.

Abstract: An optical sensor is disclosed. The optical sensor may include a substrate, a topological insulator layer formed on the substrate, an oxide layer formed on the topological insulator layer, a graphene layer stacked on the oxide layer, and a dielectric layer covering the graphene layer.

Abstract: A laundry treating apparatus comprises a cabinet forming a profile, provided with a laundry opening; a door having an inner frame arranged toward the laundry opening and an outer frame coupled to the inner frame and arranged toward the outside of the cabinet, and opening and closing the laundry opening; a hinge part having a first pivot rotating the door along a first rotational direction and a second pivot rotating the door along a second rotational direction different from the first rotational direction; a pivot switching member movable to rotatably fix the door to any one of the first pivot and the second pivot; and a pressing piece provided in the door and pressed by a user to move the pivot switching member, wherein the pressing piece includes a pressing point pressed by the user, and the pressing point is provided at an upper end of the pressing piece.

Abstract: Provided are a TSM rate-distortion optimizing method, encoding method and device using the same, and an image processing apparatus. The TSM rate-distortion optimizing method includes calculating a cost of each intra-prediction mode with respect to a block to be encoded using a sum of absolute values of differences between original pixels and reference pixels; selecting candidate modes of the intra-prediction modes according to the cost; calculating a TSM (Transform Skip Mode)-based rate-distortion cost according to the candidate modes; and comparing rate-distortion costs of the candidate modes and deciding a mode to be used for intra-prediction of the block.

Abstract: A laundry treatment apparatus in accordance with the present disclosure includes a drum configured to accommodate laundry, an air channel through which air is flowed into or out of the drum, a fan configured to put pressure on air in the air channel for flowing of the air, a fan motor configured to rotate the fan and being controlled by adjusting of a RPM, an abnormal airflow detection unit disposed on the air channel and configured to detect whether an abnormal state of airflow is occurred, and a controller configured to cause the RPM of the fan motor to be increased. The controller configured to cause laundry to be dried by rotating the fan motor at a predetermined base RPM, and to cause the RPM to be increased if the abnormality of airflow is detected by the abnormal airflow detection unit while the fan motor is rotating.

Abstract: A method of manufacturing a semiconductor device includes forming on a substrate gate electrodes extending in a first direction and spaced apart from each other in a second direction, forming capping patterns on the gate electrodes, forming interlayer dielectric layer filling spaces between adjacent gate electrodes, forming a hardmask on the interlayer dielectric layer with an opening selectively exposing second to fourth capping patterns, using the hardmask as an etch mask to form holes in the interlayer dielectric layer between the second and third gate electrodes and between the third and fourth gate electrodes, forming a barrier layer and a conductive layer in the holes, performing a first planarization to expose the hardmask, performing a second planarization to expose a portion of the barrier layer covering the second to fourth capping patterns, and performing a third planarization to completely expose the first to fourth capping patterns.

Abstract: A method of manufacturing a semiconductor device includes forming on a substrate gate electrodes extending in a first direction and spaced apart from each other in a second direction, forming capping patterns on the gate electrodes, forming interlayer dielectric layer filling spaces between adjacent gate electrodes, forming a hardmask on the interlayer dielectric layer with an opening selectively exposing second to fourth capping patterns, using the hardmask as an etch mask to form holes in the interlayer dielectric layer between the second and third gate electrodes and between the third and fourth gate electrodes, forming a barrier layer and a conductive layer in the holes, performing a first planarization to expose the hardmask, performing a second planarization to expose a portion of the barrier layer covering the second to fourth capping patterns, and performing a third planarization to completely expose the first to fourth capping patterns.

Abstract: An optical sensor is disclosed. The optical sensor may include a substrate, a topological insulator layer formed on the substrate, an oxide layer formed on the topological insulator layer, a graphene layer stacked on the oxide layer, and a dielectric layer covering the graphene layer.

Abstract: A laundry treating apparatus comprising a cabinet including a laundry introduction port, a door to open and close the introduction port, a hinge unit configuring a first rotating axis and a second rotating axis, the hinge unit including a first shaft and a second shaft configuring the first rotating axis and a third shaft and a fourth shaft configuring the second rotating axis, and a rotating shaft shifting unit that rotatably fastens the door to any one of the first rotating axis and the second rotating axis, the rotating shaft shifting unit including a first shifting unit and a second shifting unit selectively and rotatably fastening the fourth shaft to the cabinet. The fourth shaft includes a protrusion protruding toward the second shifting unit, and a fourth side flat surface is formed on the protrusion and supports the second shifting unit by establishing surface contact with the second shifting unit.