Abstract: Disclosed is a method of providing continuing education for keeping professionals aware and informed of developments in easily accessed categorized topical areas of interest on a for-payment basis, utilizing the Internet primarily as an audio format distribution means. The method can include a client providing attestation of access and listened-to-grasping of the information over the internet, the client making permanent library copies, and the client accessing information utilizing time and/or topic tags.

Abstract: Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Abstract: System for and Method of analyzing a sample at substantially the exact same small spot thereon with a plurality of wavelengths using a lens system which provides the same focal length at at least two wavelengths at various positions thereof with respect to a sample, including analyzing data obtained at those wavelengths.

Abstract: Systems and methodology for orienting the tip/tilt and vertical height of samples, preferably automated, as applied in ellipsometer and the like systems.

Abstract: Application of Xenon arc-lamps to provide UV/deep UV wavelengths in spectrophotometer, reflectometer, ellipsometer, polarimeter or the like systems.

Abstract: A system and method of preventing substrate backside reflected components in a beam of electromagnetic radiation caused to reflect from the surface of a sample in an ellipsometer or polarimeter system, involving placing a mask adjacent to the surface of the sample which allows electromagnetic radiation to access the sample over only a limited area, wherein the mask can include detector elements for collecting electromagnetic radiation reflected from the sample backside.

Abstract: Reflectometer, ellipsometer, polarimeter or the like system, which functionally comprise means for providing gas confined in a mini-chamber near the surface of a sample, at a location at which a beam having UV, VUV, IR and NIR wavelengths of electromagnetic radiation is caused to be impinged thereupon.

Abstract: A spectrophotometer, reflectometer, ellipsometer polarimeter or the like system having a detector means for independently intercepting electromagnetic radiation reflected from a sample frontside or backside, and methodology for pursuing less correlated determination of refractive index and thickness values.

Abstract: Disclosed are system for and method of analyzing substantially the exact same spot size on a sample system with at least two wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Abstract: Systems and methods for providing and enhancing electromagnetic radiation beam radial energy homogeneity and intensity vs. wavelength content, for reliably directing electromagnetic radiation emitted by a source thereof in a common direction, for achromatically reducing spot size on a sample (eg. liquid cavity containing lenses and low aberration 1:1 imaging systems modified to perform as spatial filters), and for directing different wavelengths into different detectors, in ellipsometer, polarizer or the like systems.

Abstract: Improved methodology for monitoring deposition or removal of material to or from a process and/or wittness substrate which demonstrates a negative e1 at some wavelength. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angle-of-Incidence (AOI) to monitor deposition of and/or removal of minute amounts of materials onto, or from, said process and/or witness substrate. The methodology can optionally monitor ellipsometric PSI, and involves simultaneously or sequentially applying non-P-polarized electromagnetism at the same angle of incidence, or electromagnetic radiation of any polarization at a different angle-of-incidence and wavelength to the process or wittness substrate and application of conventional ellipsometric analysis.

Abstract: A substantially self-contained “on-board” material system investigation system functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a large sample, including the capability to easily and conveniently change the angle-of-incidence of a beam of electromagnetic radiation onto a sample surface.

Abstract: Disclosed is a system for enabling easy sequential setting of different Angles-of-Incidence of a beam of electromagnetic radiation to a surface of a sample system involving regression based methodology for evaluating and compensating the effects of the presence electromagnetic beam intercepting angle-of-incidence changing systems, including where desired, parameterization of calibration parameters.

Abstract: A spectrophotometer, ellipsometer or polarimeter or the like system with a spectroscopic source of wavelengths and a detector with multiple detector elements for simultaneous monitoring of a number of wavelengths in an environmental control chamber which optionally provides for secured sample entry, and methodology of use.

Abstract: System and methodology for controlling a beam spot size where it impinges onto a sample, and/or discriminant selection and analysis of data from detector elements in a two dimensional detector array which correspond to identified regions on a sample.

Abstract: A combined ellipsometer and oscillator system applied to a chamber for containing fluid, and method of decorrelated determination of thickness and optical constants of depostable materials present in a fluid. In use the ellipsometer determines the product of thickness and optical constant, and the oscillator system changes frequency of oscillation proportional to the thickness of material deposited upon a surface of an element therein.

Abstract: Disclosed is methodology for obtaining data of improved precision, including detection and replacement of data determined to be suspect to provide good data over a spectroscopic range of wavelengths.

Abstract: Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Abstract: A combined ellipsometer and oscillator system and method of decorrelated determination of thickness and optical constants of deposted materials. In use the ellipsometer determines the product of thickness and optical constant, and the oscillator system changes frequency of oscillation proportional to the thickness of material deposited upon a surface of an element therein.

Abstract: Disclosed is the application of spatial filters and beam energy homogenizing systems in ellipsometer and the like systems prior to a sample system. The purpose is to eliminate a radially outer annulus of a generally arbitrary intensity profile, so that electromagnetic beam intensity is caused to quickly decay to zero, rather than, for instance, demonstrate an irregular profile as a function of radius.