Abstract: The present invention is directed to an article with a patterned appearance provided by a visually observable contrast between one or more generally transparent thin film coatings deposited over a substrate. At least one of the deposited coatings exhibits a reflected color and/or contrast and visible differing transmitted color and/or contrast or a plurality of coatings together exhibit different reflected colors and/or contrasts. The coatings are selected from the group of: metals depositable by magnetron sputtering vacuum deposition, chemical vapor deposition, pyrolytic coating, or sol-gel techniques, metal oxide coatings, metal nitride coatings, semi-conductor containing coatings, metal oxynitrides and mixtures thereof. The present invention is also directed to a method of making the articles having a visually observable patterned appearance involving masking and applying the coating or applying the coating and removing a portion of the coating to form the pattern.

Abstract: A method and coating are provided for temporarily protecting a substrate or article during shipping, handling or storage by applying a removable protective coating over at least a portion of the substrate. The substrate may be flat or curved and may have zero, one or more functional coatings. A plurality of substrates with the protective coating of the invention may be arranged in a shipping container so that the protective coating reduces the possibility of damage to the substrate or optional functional coating. In one embodiment, the protective coating is the evaporation or reaction product of an aqueous coating composition containing a polyvinyl alcohol polymer which may be subsequently removed by aqueous washing, thermal decomposition or combustion. In another embodiment, the protective coating is formed by sputtering a substantially carbon coating onto the substrate. The carbon coating is subsequently removed by combustion.

Abstract: A method of making a coated substrate includes providing a substrate having at least one functional coating with a first emissivity value; depositing at least one coating material having a second emissivity value over at least a portion of the at least one functional coating wherein the deposited coating has a thickness ranging from greater than 100 Å to less than 10 microns and a refractive index ranging from 1.4 to 2. The resulting coating stack has an emissivity value greater than the emissivity value of the functional coating. Optionally the coated substrate is heated whereby the coated substrate can be bent to a desired shape and/or tempered.

Abstract: The present invention is directed to a low emissivity, low shading coefficient, multi-layer coating and coated article having a luminous transmission of less than about 70 percent, a shading coefficient less than about 0.44 and a solar heat gain coefficient of less than about 0.38 and a ratio of luminous transmittance to solar heat gain coefficient of greater than about 1.85. The coated article, e.g. an IG unit, has a substrate with at least one antireflective layer deposited over the substrate. At least one infrared reflective layer is deposited over the antireflective layer and at least one primer layer is deposited over the infrared reflective layer. Optionally a second antireflective layer is deposited over the first primer layer and optionally a second infrared reflective layer is deposited over the second antireflective layer.

Abstract: Silicon—chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon—chromium-containing material in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon—nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon—chromium, silicon—chromium nitride or silicon—chromium oxynitride respectively.

Abstract: A method and resultant product are disclosed wherein a metal film is deposited by sputtering a metal cathode target in an essentially nonreactive atmosphere comprising inert gas and a reactive gas, wherein the concentration of reactive gas is sufficiently low that the sputtering is accomplished in the metallic mode, i.e. the film is deposited as metal. The metal film of the present invention is harder than a metal film sputtered in an atmosphere consisting of only inert gas. The method and resultant product may further comprise thermal oxidation of the metal film, which proceeds more efficiently than oxidation of a metal film sputtered in an atmosphere consisting of only inert gas.

Abstract: Methods are presented for depositing an infrared reflective, e.g., silver, containing multi-layer coating onto a substrate to form a coated article. One or more ceramic cathodes are used to deposit a protective layer over the silver layer. The use of the ceramic cathodes eliminates the need for the metal primer layers common in the prior art. Both the infrared reflective layer and a ceramic layer can be deposited in the same coating zone, this coating zone containing sufficient oxygen to provide a substantially oxidized ceramic coating layer without adversely impacting upon the properties of the infrared reflective layer.

Abstract: Hydrophilic and/or rutile and anatase titanium oxide are obtained by sputter depositing titanium metal oxide on a film of zirconium oxide in the cubic phase. Another technique is to deposit a titanium metal on a film of zinc oxide in the cubic phase and heating the coating in an oxidizing atmosphere to provide an anatase and/or rutile phase(s) of titanium oxide.

Abstract: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, for sputtering in oxygen, inert gas, nitrogen or a mixture of nitrogen and oxygen. The chromium in the target may be replaced in part with nickel to produce coatings of silicon-chromium-nickel and the oxides, nitrides and oxynitrides thereof.

Abstract: Amorphous metal oxide barrier layers of titanium oxide, zirconium oxide and zinc/tin oxide are effective as alkali metal ion barrier layers at thicknesses below 180 Angstroms. The amorphous metal oxide barrier layers are most effective when the density of the layer is equal to or greater than 75% of the crystalline density. The barrier layers prevent migration of alkali metal ions such as sodium ions from glass substrates into a medium e.g. electrolyte of a photochromic cell, liquid material of a liquid crystal display device contacting the glass surface and a photocatalytic coating. The properties of the medium, particularly electroconductive metal oxide coatings, are susceptible to deterioration by the presence of sodium ions migrating from the glass.

Abstract: A method and resultant product are disclosed wherein a metal film is deposited by sputtering a metal cathode target in an essentially nonreactive atmosphere comprising inert gas and a reactive gas, wherein the concentration of reactive gas is sufficiently low that the sputtering is accomplished in the metallic mode, i.e. the film is deposited as metal. The metal film of the present invention is harder than a metal film sputtered in an atmosphere consisting of only inert gas. The method and resultant product may further comprise thermal oxidation of the metal film, which proceeds more efficiently than oxidation of a metal film sputtered in an atmosphere consisting of only inert gas.

Abstract: A temperable coated article with metallic properties is prepared by coating a glass substrate with a metal-containing film such as titanium nitride, which ordinarily oxidizes at high temperature, overcoating with a protective layer of a silicon compound which forms a durable layer and prevents oxidation of the underlying metal-containing film and undercoating with a stabilizing metal-containing layer. The coated article can be tempered without losing its metallic properties to oxidation.

Abstract: A temperable coated article with metallic properties is prepared by coating a glass substrate with a metal-containing film such as titanium nitride, which ordinarily oxidizes at high temperature, overcoating with a protective layer of a silicon compound which forms a durable layer and prevents oxidation of the underlying metal-containing film and undercoating with a stabilizing metal-containing layer. The coated article can be tempered without losing its metallic properties to oxidation.

Abstract: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-chromium, silicon-chromium nitride or silicon-chromium oxynitride respectively.

Abstract: Low absorbance coatings of silicon-nickel alloy in the form of oxides, nitrides and oxynitrides are disclosed along with a method for producing them by sputtering silicon-nickel targets comprising 3 to 18 weight percent nickel in atmospheres comprising reactive gases such as nitrogen, oxygen and mixtures thereof which may further comprise inert gas such as argon. The presence of nickel in the range of 3 to 18 weight percent provides target stability and enhanced sputtering rates over target of silicon alone or alloyed with aluminum, while maintaining a low refractive index and low absorbance, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-nickel nitride or oxynitride respectively.

Abstract: A low emissivity coated article comprising a glass substrate and a coating comprising a layer of infrared reflective metal between layers of antireflective metal oxide is heated to a temperature below the strain point of the substrate for a sufficient time to anneal the coating without affecting the substrate to improve the chemical and mechanical durability of the coating.

Abstract: A method for bonding silicon-containing compositions to metal surfaces is disclosed wherein a coarse silicon-containing surface is arc-sprayed with a first adhesive layer, a second solderable layer, and a third solder layer, and the arc-sprayed surface is then soldered to the metal surface. The method is particularly useful for producing silicon-containing targets for cathode sputtering.

Abstract: Amorphous metal oxide barrier layers of titanium oxide, zirconium oxide and zinc/tin oxide are effective as alkali metal ion barrier layers at thicknesses below 180 Angstroms. The amorphous metal oxide barrier layers are most effective when the density of the layer is equal to or greater than 90% of the crystalline density. The barrier layers prevent migration of alkali metal ions such as sodium ions from glass substrates into a medium e.g. electrolyte of a photochromic cell, liquid material of a liquid crystal display device contacting the glass surface. The properties of the medium, particularly electroconductive metal oxide coatings, are susceptible to deterioration by the presence of sodium ions migrating from the glass.

Abstract: Silicon-chromium cathode targets comprising 5 to 80 weight percent chromium are disclosed for sputtering absorbing coatings of silicon-chromium alloy in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof which may further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides as well as metallic films. The presence of chromium in the cathode target in the range of 5 to 80 weight percent provides target stability and enhanced sputtering rates over targets of silicon alone, comparable to the target stability and sputtering rates of silicon-nickel, not only when sputtering in oxygen to produce an oxide coating, but also when sputtering in inert gas, nitrogen or a mixture of nitrogen and oxygen to produce coatings of silicon-chromium, silicon-chromium nitride or silicon-chromium oxynitride respectively.

Abstract: A temperable coated article with metallic properties is prepared by coating a glass substrate with a metal-containing film such as titanium nitride, which ordinarily oxidizes at high temperature, overcoating with a protective layer of a silicon compound which forms a durable layer and prevents oxidation of the underlying metal-containing film and undercoating with a stabilizing metal-containing layer. The coated article can be tempered without losing its metallic properties to oxidation.