Patents by Inventor James V. Crivello

James V. Crivello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5073643
    Abstract: Synthesis use of a new class of diaryliodonium salt photo and thermal polymerization initiators in which the aryl groups are substituted with alkoxy group bearing hydroxy groups. Good to excellent yields are obtained of diaryliodonium salts in which the aryl groups are substituted with long chain alkoxy groups, which alkoxy groups also possess at least one hydroxyl moiety attached at the 2-position of an alkoxy group. The resultant salts have enhanced solubility when compared with their lower molecular weight counterparts. The hydroxyl groups serve as chain transfer agents; and, in cross linking UV-induced cationic polymerizations, the hydroxyl groups effect marked accelertion on polymerization rates. The salts also have excellent compatability with nonpolar monomers such as epoxidized oil and poly(1,2-butadience oxide) and provide further benefits when they are used along with copper cocatalysts in thermally curable polymer systems.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: December 17, 1991
    Assignee: Polyset Corporation
    Inventor: James V. Crivello
  • Patent number: 5064882
    Abstract: A heat curable composition is provided which is useful for encapsulating microelectronic devices using a heat curable epoxy composition having a diaryliodonium hexafluoroantimonate salt as a catalyst in combination with an effective amount of a free radical generating aromatic compound as a cocatalyst.
    Type: Grant
    Filed: January 25, 1991
    Date of Patent: November 12, 1991
    Assignee: General Electric Company
    Inventors: Erik W. Walles, John H. Lupinski, James V. Crivello
  • Patent number: 5037861
    Abstract: The present invention relates to epoxy function silicone monomers represented by the formula: ##STR1## wherein each R group is, independently, a monovalent substituted or unsubstituted C.sub.1-12 alkyl, C.sub.1-12 cycloalkyl, or phenyl radical;each R' group is, independently, R, a monovalent C.sub.2-12 alkyl radical, or a monovalent epoxy functional group having 2-10 carbon atoms with the proviso that at least one of the R' groups is epoxy functional;and n is from 3-10.
    Type: Grant
    Filed: August 9, 1989
    Date of Patent: August 6, 1991
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 5015675
    Abstract: A heat curable composition is provided which is useful for encapsulating microelectronic devices using a heat curable epoxy composition having a diaryliodonium hexafluoroantimonate salt as a catalyst in combination with an effective amount of a free radical generating aromatic compound as a cocatalyst.
    Type: Grant
    Filed: July 31, 1989
    Date of Patent: May 14, 1991
    Assignee: General Electric Company
    Inventors: Erik W. Walles, John H. Lupinski, James V. Crivello
  • Patent number: 5012001
    Abstract: Triarylsulfonium polyfluoro metal or metalloid salts are provided by effecting the oxidation of a diarylsulfide, while under dehydrating conditions, in the presence of a strong protonic acid. The resulting triarylsulfonium acid salt can thereafter be directly metathesized with an alkali metal or alkaline earth metal polyhalo salt.These compounds have the general formula ##STR1## where Q is selected from .dbd.S.fwdarw.O, --S-- and mixtures thereof, M is a transition metal or metalloid, "c" is an integer of 1 to 3, "d" is an integer of 0 to 3, R.sup.6 is phenyl or naphthyl, R.sup.7 is phenylene or naphthalene optionally substituted with one or more radicals selected from the class consisting of --CH.sub.3, --OCH.sub.3, --CO.sub.2 H, --Br, --Cl, and NO.sub.2.
    Type: Grant
    Filed: April 30, 1990
    Date of Patent: April 30, 1991
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4992571
    Abstract: A one pot method is provided for preparing an (octyloxyphenyl) phenyliodonium tosylate and the corresponding hexafluorometalloid salt. n-Octylphenyl ether is initially prepared using a halooctane and phenol in the presence of a phase transfer catalyst followed by the addition of iodobenzene, a peracid, and p-toluene sulfonic acid. The resulting (octyloxyphenyl)phenyl iodonium tosylate can be directly metathesized after an optional treatment step with an alkali metal hexafluoroantimonate salt. The (octyloxyphenyl)phenyl iodonium hexafluorometalloid salt can be used as a photoinitiator for UV curable organic materials such as epoxy resins.
    Type: Grant
    Filed: October 31, 1989
    Date of Patent: February 12, 1991
    Assignee: General Electric Company
    Inventors: James M. Fukuyama, Julia L. Lee, James V. Crivello
  • Patent number: 4981881
    Abstract: A method is provided for coating a substrate with a non-toxic irradiation curable epoxy resin composition. There is used an alkoxy-substituted aryl onium salt, in combination with a non-toxic oxirane-containing organic or silicone resin.
    Type: Grant
    Filed: July 24, 1989
    Date of Patent: January 1, 1991
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4895967
    Abstract: A method is provided for making cyclic poly(siloxane) by incrementally contacting linear polysilxoane with a fixed bed cracking catalyst, such as an acidic Zeolite under reduced pressure. The resulting volatile cyclic poly(siloxane) is then recovered.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: January 23, 1990
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4882201
    Abstract: A method is provided for coating a substrate with a non-toxic irradiation curable epoxy resin composition. There is used an alkoxy-substituted aryl onium salt, in combination with a non-toxic oxirane-containing organic or silicone resin.
    Type: Grant
    Filed: March 21, 1988
    Date of Patent: November 21, 1989
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4864054
    Abstract: A method is provided for making cationically polymerizable aromatic polypropenylethers and to the aromatic polypropenylethers made thereby. Aromatic polyalkylene glycol prepared from the corresponding polyphenol is reacted with an allylhalide to produce aromatic polyallylether which is thereafter isoemrized to the corresponding cationically polymerizable aromatic polypropenylether.
    Type: Grant
    Filed: May 2, 1983
    Date of Patent: September 5, 1989
    Assignee: General Electric Company
    Inventors: James V. Crivello, David A. Conlon
  • Patent number: 4842800
    Abstract: A method for encapsulating microelectronic devices is provided using a heat curable epoxy composition having a monomeric or polymeric diaryliodonium hexafluoroantimonate salt. Curable compositions are also provided as well as encapsulated microelectronic devices.
    Type: Grant
    Filed: October 1, 1987
    Date of Patent: June 27, 1989
    Assignee: General Electric Company
    Inventors: Erik W. Walles, James V. Crivello, John H. Lupinski
  • Patent number: 4840977
    Abstract: Photosensitive iodonium polymers are provided useful as positive photoresists. The iodonium polymers can be converted to polymeric diaryl iodonium polyfluorometal and metalloid salts by a metathesis reaction. These polymeric iodonium polyfluorometal and metalloid salts can be used as a catalyst in combination with a copper compound cocatalyst to make heat curable compositions with cationically polymerizable materials such as an epoxy resin.
    Type: Grant
    Filed: October 1, 1987
    Date of Patent: June 20, 1989
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4780511
    Abstract: Polymeric photoactive iodonium salts are provided which are useful as photoinitiators and thermal initiators when used in combination with copper salts for cationically polymerizable organic materials. Methods for making the photoactive polymeric iodonium salts also are provided.
    Type: Grant
    Filed: June 22, 1987
    Date of Patent: October 25, 1988
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4705887
    Abstract: Aromatic polyvinylethers and active hydrogen compound reaction products thereof have been found to provide fast heat curable molding compositions when used with various heat activated curing catalysts, for example, diaryliodonium salts in combination with aromatic polyvinylether soluble copper compounds, or dialkylhydroxyarylsulfonium salts in combination with certain organic oxidants.
    Type: Grant
    Filed: April 1, 1985
    Date of Patent: November 10, 1987
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4689289
    Abstract: Block polymer compositions are provided which are useful as positive or negative resists utilizing aryl onium salts in combination with silicone-organic block polymers, such as polydimethylsiloxane-poly-t-butylmethacrylate block polymers. A silicone prepolymer is used in combination with certain polymerizable vinyl monomers such as t-butylmethacrylate. The silicone prepolymer has chemically combined pinacolate groups in the backbone or terminal positions which are capable of generating free-radicals upon thermolysis.
    Type: Grant
    Filed: April 30, 1986
    Date of Patent: August 25, 1987
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4683317
    Abstract: Aryliodonium salts resulting from the condensation of aryliodosotosylates and aryl ketones are provided which are used as photoinitiators to effect deep section UV cures. Deep section photopolymerizable organic materials are also provided which can be used as encapsulating agents to encapsulate a wide variety of electronic components.
    Type: Grant
    Filed: April 8, 1985
    Date of Patent: July 28, 1987
    Assignee: General Electric Company
    Inventors: James V. Crivello, Julia L. Lee
  • Patent number: 4677169
    Abstract: A method is provided for making silicone-organic block polymers, such as polydimethylsiloxane-polystyrene block polymers resulting from the thermal generation of free-radicals in the presence of free-radical polymerizable organic monomer. A silicone prepolymer is used having chemically combined pinacolate groups in the backbone or terminal positions which are capable of generating free-radicals upon thermolysis and which retain chemically combined remnants of such pinacolate diradicals which serve as connecting sites for free-radical polymerized organic blocks.
    Type: Grant
    Filed: March 17, 1986
    Date of Patent: June 30, 1987
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4675426
    Abstract: There is provided curable compositions of free-radical polymerizable organic monomers and polymers and cyclicsilylpinacoles which can be used in combination to make such curable compositions.
    Type: Grant
    Filed: June 11, 1986
    Date of Patent: June 23, 1987
    Assignee: General Electric Company
    Inventor: James V. Crivello
  • Patent number: 4617238
    Abstract: Photo-curable vinyloxy-functional organosiloxane polymers are provided. Also provided are release coating compositions made by combining said polymers with various photo-initiators. The polymers have a unique vinyloxy functionality; and the release coating compositions cure with brief exposure to ultraviolet radiation to form premium abhesive coatings. Process for preparing the vinyloxy-functional polysiloxanes and the release coating are also disclosed.
    Type: Grant
    Filed: August 7, 1985
    Date of Patent: October 14, 1986
    Assignee: General Electric Company
    Inventors: James V. Crivello, Richard P. Eckberg
  • Patent number: 4610952
    Abstract: Water soluble blends are provided of alkanolacrylamide, water soluble hydroxyl containing film forming organic oligomer and an effective amount of an onium salt photoinitiator. These photocurable compositions can be used as photoresists.
    Type: Grant
    Filed: April 22, 1985
    Date of Patent: September 9, 1986
    Assignee: General Electric Company
    Inventor: James V. Crivello