Patents by Inventor James Vincent Crivello

James Vincent Crivello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6863701
    Abstract: Compositions that can be photopolymerized by a cationic initiator at an accelerated rate include at least one epoxy monomer, at least one cationic photoinitiator, and a photosensitizer/accelerator. The accelerator is a phenolic resole, or a compound having a structure according to the formula R1(CR2R3OH)n, wherein R1 is selected from phenyl, polycyclic aryl, and polycyclic heteroaryl, each optionally substituted with one or more electron donating group substituted phenyl; R2 and R3 are independently selected from hydrogen, alkyl, aryl, alkylaryl, substituted alkyl, substituted aryl and substituted alkylaryl; and n is an integer from 1 to 10.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 8, 2005
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6828404
    Abstract: A process for the preparation of an alkoxysilyl siloxane substituted with at least one epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group comprises selectively reacting a hydrosilane compound with a compound containing a vinyl or allyl group and a epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group, or a compound containing at least one vinyl or allyl group and at least one dialkoxysilyl or trialkoxysilyl group, to form at least one monohydrosiloxane. The monohydrosiloxane is further reacted to form an ambifunctional alkoxysilyl siloxane.
    Type: Grant
    Filed: October 19, 2001
    Date of Patent: December 7, 2004
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Publication number: 20030176519
    Abstract: Compositions that can be photopolymerized by a cationic initiator at an accelerated rate include at least one epoxy monomer, at least one cationic photoinitiator, and a photosensitizer/accelerator.
    Type: Application
    Filed: March 10, 2003
    Publication date: September 18, 2003
    Applicant: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6602602
    Abstract: Epoxy-functionallized polymeric microbeads and dispersions thereof may be prepared using a cationic non-aqueous dispersion-suspension photopolymerization. The polymeric microbeads may be further modified with a variety of additional groups by reaction with various reagents with the epoxy moities.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: August 5, 2003
    Assignee: Renssealer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6555595
    Abstract: Disclosed are radiation-curable or photopolymerizable compositions, processes for applying and curing the compositions and articles bearing a cured coating of the compositions utilizing radiation-curable compositions which contain, in addition to the typical components of radiation-curable compositions, a polymer derived from 3,4-epoxy-1-butene.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: April 29, 2003
    Assignee: Rensselaer Polytechnic Institute
    Inventors: James Vincent Crivello, Marco Sangermano, Stephen Neal Falling
  • Publication number: 20020137870
    Abstract: A process for the preparation of an alkoxysilyl siloxane substituted with at least one epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group comprises selectively reacting a hydrosilane compound with a compound containing a vinyl or allyl group and a epoxy, vinyl ether, 1-propenyl ether, acrylate or methacrylate group, or a compound containing at least one vinyl or allyl group and at least one dialkoxysilyl or trialkoxysilyl group, to form at least one monohydrosiloxane. The monohydrosiloxane is further reacted to form an ambifunctional alkoxysilyl siloxane.
    Type: Application
    Filed: October 19, 2001
    Publication date: September 26, 2002
    Applicant: RENSSELAER POLYTECHNIC INSTITUTE
    Inventor: James Vincent Crivello
  • Patent number: 6391999
    Abstract: Polymerizable siloxane oligomers comprising a plurality of repeating units of formula A and at least one unit of formula B: and terminating in a residue R2 or R8 are disclosed. In these formulae FG is a functional group, such as 2-(3,4-epoxycyclohexyl), and the R groups are alkyl, aryl, haloalkyl, aralkyl, alkoxy or aryloxy of 1 to 10 carbons. Processes for preparing the oligmers by hydrolysis/condensation of monomers of formula (RO)3Si FG and one or more alkoxy silane monomers of formula R3R4R8SiOR2a are also disclosed, as are polymers resulting from the cationic polymerization of the oligomers.
    Type: Grant
    Filed: January 21, 2000
    Date of Patent: May 21, 2002
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6210790
    Abstract: Transparent, hard, abrasion-resistant polymer composites, composed of a highly crosslinked silica-reinforced epoxy or 1-alkenyl resin wherein silica particles are covalently bonded to the resin. A method for producing such composites by preparing an epoxy- or 1-alkenyl ether-functional colloidal silica includes mixing a multifunctional epoxy- or 1-alkenylether monomer and a polymerization initiator; applying the mixture to a substrate and curing, by exposure to heat or radiation. A surface-modified colloidal silica containing epoxy- or 1-alkenylether functionality covalently bonded to a surface of a finely divided silica particle, and a process for the preparation thereof is disclosed. A photocurable composition which is a mixture of an epoxy- or 1-alkenyl ether-functional silica and a multifunctional epoxy- or 1-alkenyl ether monomer is also disclosed.
    Type: Grant
    Filed: July 15, 1998
    Date of Patent: April 3, 2001
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6124418
    Abstract: The invention provides a method for making a curable epoxysilicone composition through the hydrosilation reaction between an ethylenically unsaturated epoxide and an SiH-containing silicone to produce an epoxysilicone product, and catalyzed by a quaternary ammonium, phosphonium or arsonium hexahaloplatinate which does not promote the oxirane ring-opening reaction of either the ethylenically unsaturated epoxide starting material or the epoxysilicone product. The invention also provides for a curable epoxysilicone composition made by the above method.
    Type: Grant
    Filed: February 14, 1994
    Date of Patent: September 26, 2000
    Assignee: General Electric Company
    Inventors: James Vincent Crivello, Mingxin Fan
  • Patent number: 6069259
    Abstract: A composition relating to an oligomeric alkoxy siloxane substituted with polymerizible epoxy or 1-alkenyl groups, and a process for the production of that composition, are disclosed. The process entails a hydrolysis-condensation oligomerization of an epoxy- or 1-alkenyl ether-functional trialkoxy silane, catalyzed by an ion exchange resin, and separation of the resin from the resulting oligomer.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: May 30, 2000
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 5639413
    Abstract: An improved system for producing a three-dimensional object from a fluid medium is described. The fluid medium includes an epoxy-functional silicon-containing monomer or oligomer, and a suitable cationic photoinitiator. The medium is used in a stereolithographic apparatus, which converts computer-generated data for the desired part to a real three-dimensional part, via the directed action of a laser beam or similar energy form on the liquid medium. This invention also embraces a method for producing the three-dimensional object from the liquid medium, utilizing a family of epoxy-functional silicon-containing materials.
    Type: Grant
    Filed: March 30, 1995
    Date of Patent: June 17, 1997
    Inventor: James Vincent Crivello