Patents by Inventor Jan Bernard Plechelmus Van Schoot

Jan Bernard Plechelmus Van Schoot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10558126
    Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: February 11, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Sascha Migura, Bernhard Kneer
  • Patent number: 10289006
    Abstract: A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: May 14, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Markus Franciscus Antonius Eurlings, Hermanus Johannes Maria Kreuwel
  • Patent number: 10248027
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Raoul Maarten Simon Knops, Bob Streefkerk, Christiaan Louis Valentin, Jan Bernard Plechelmus Van Schoot, Wilhelmus Franciscus Johannes Simons, Leon Leonardus Franciscus Merkx, Robertus Johannes Marinus De Jongh, Roel Johannes Elisabeth Merry, Michael Frederik Ypma
  • Patent number: 10001709
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Grant
    Filed: February 14, 2017
    Date of Patent: June 19, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Antonius Johannes Josephus Van Dijsseldonk, Wilhelmus Petrus De Boeij
  • Patent number: 9989863
    Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
    Type: Grant
    Filed: January 23, 2015
    Date of Patent: June 5, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Andrei Mikhailovich Yakunin
  • Patent number: 9986628
    Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: May 29, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Andrey Nikipelov, Edgar Alberto Osorio Oliveros, Alexander Matthijs Struycken, Bert Pieter Van Drieënhuizen, Jan Bernard Plechelmus Van Schoot
  • Patent number: 9958787
    Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: May 1, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Christiaan Louis Valentin, Antonius Johannes Josephus Van Dijsseldonk
  • Patent number: 9860966
    Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.
    Type: Grant
    Filed: April 29, 2013
    Date of Patent: January 2, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Antonius Theodorus Wilhelmus Kempen, Hermanus Kreuwel, Andrei Mikhailovich Yakunin
  • Publication number: 20170363965
    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.
    Type: Application
    Filed: November 16, 2015
    Publication date: December 21, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Hans BUTLER, Raoul Maarten Simon KNOPS, Bob STREEFKERK, Christiaan Louis VALENTIN, Jan Bernard Plechelmus VAN SCHOOT, Wilhelmus Franciscus Johanne SIMONS, Leon Leonardus Franciscus MERKX, Robertus Johannes Marinus DE JONGH, Roel Johannes Elisabeth MERRY, Michael Frederik YPMA
  • Patent number: 9835950
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: December 5, 2017
    Assignee: ASML Netherland B.V.
    Inventors: Markus Franciscus Antonius Eurlings, Niek Antonius Jacobus Maria Kleemans, Antonius Johannes Josephus Van Dijsseldonk, Ramon Mark Hofstra, Oscar Franciscus Jozephus Noordman, Tien Nang Pham, Jan Bernard Plechelmus Van Schoot, Jiun-Cheng Wang, Kevin Weimin Zhang
  • Patent number: 9785051
    Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: October 10, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Sven Antoin Johan Hol, Edwin Johan Buis, Erik Maria Rekkers, Gosse Charles De Vries, Hako Botma, Marinus Johannes Maria Van Dam, Ramon Pascal Van Gorkom
  • Publication number: 20170176868
    Abstract: A lithographic apparatus including a support structure constructed to support a mask having a patterned area which is capable of imparting an EUV radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the support structure is movable in a scanning direction, a substrate table constructed to hold a substrate, wherein the substrate table is movable in the scanning direction, and a projection system configured to project the patterned radiation beam onto an exposure region of the substrate, wherein the projection system has a demagnification in the scanning direction which is greater than a demagnification in a second direction which is perpendicular to the scanning direction and wherein the demagnification in the second direction is greater than 4×.
    Type: Application
    Filed: February 10, 2015
    Publication date: June 22, 2017
    Inventors: Jan Bernard Plechelmus VAN SCHOOT, Sascha MIGURA, Bernhard KNEER
  • Publication number: 20170160646
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Application
    Filed: February 14, 2017
    Publication date: June 8, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich BANINE, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin, Antonius Johannes Josephus Van Dijsseldonk, Wilhelmus Petrus De Boeij
  • Patent number: 9632419
    Abstract: A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: April 25, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus Van Schoot, Vadim Yevgenyevich Banine, Olav Waldemar Vladimir Frijns, Hermanus Kreuwel, Johannes Hubertus Josephina Moors, Uwe Bruno Heini Stamm, Gerardus Hubertus Petrus Maria Swinkels, Ivo Vanderhallen, Andrei Mikhailovich Yakunin
  • Patent number: 9618859
    Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: April 11, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Jan Bernard Plechelmus Van Schoot, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee
  • Patent number: 9594306
    Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: March 14, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Wilhelmus Petrus De Boeij, Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk, Erik Roelof Loopstra, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels, Andrei Mikhailovich Yakunin
  • Publication number: 20170052456
    Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
    Type: Application
    Filed: January 23, 2015
    Publication date: February 23, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Jan Bernard Plechelmus VAN SCHOOT, Minne CUPERUS, Andrei Mikhailovich YAKUNIN
  • Publication number: 20160334711
    Abstract: A faceted reflector (32, 32?) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
    Type: Application
    Filed: December 19, 2014
    Publication date: November 17, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Markus Franciscus Antonius EURLINGS, Niek Antonius Jacobus Maria KLEEMANS, Antonius Johannes Josephus VAN DIJSSELDONK, Ramon Mark HOFSTRA, Oscar Franciscus Jozephus NOORDMAN, Tien Nang PHAM, Jan Bernard Plechelmus VAN SCHOOT, Jiun-Cheng WANG, Kevin Weimin ZHANG
  • Patent number: 9411238
    Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: August 9, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Jan Bernard Plechelmus Van Schoot, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Vladimir Mihailovitch Krivtsun, Gerardus Hubertus Petrus Maria Swinkels, Michel Riepen, Hendrikus Gijsbertus Schimmel, Viacheslav Medvedev
  • Patent number: 9414477
    Abstract: A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: August 9, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Gerardus Hubertus Petrus Maria Swinkels