Patents by Inventor Jana Herzberger

Jana Herzberger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12252619
    Abstract: In various aspects, a polymer resin is provided for vat or ultraviolet-assisted direct ink writing (UV-DIW) photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.
    Type: Grant
    Filed: March 30, 2019
    Date of Patent: March 18, 2025
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Daniel Rau, Jana Herzberger, Timothy Long, Christopher Williams
  • Patent number: 12018127
    Abstract: In various aspects, a polymer resin is provided for vat photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: June 25, 2024
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Jana Herzberger, Timothy E. Long, Viswanath Meenakshisundaram, Christopher B. Williams
  • Publication number: 20210115279
    Abstract: In various aspects, a polymer resin is provided for vat or ultraviolet-assisted direct ink writing (UV-DIW) photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.
    Type: Application
    Filed: March 30, 2019
    Publication date: April 22, 2021
    Applicant: Virginia Tech Intellectual Properties, Inc.
    Inventors: Daniel RAU, Jana HERZBERGER, Timothy LONG, Christopher WILLIAMS
  • Publication number: 20200369831
    Abstract: In various aspects, a polymer resin is provided for vat photopolymerization. The resin can include a polyamic acid salt formed from the addition of a photocrosslinkable amine to a polyamic acid. The resin can include a photoinitiator suitable for initiating crosslinking of the photocrosslinkable amine when exposed to a light source of a suitable wavelength and intensity. The polyamic acid can be formed, for instance, by the addition of a diamine to a suitable dianhydride. Methods of additive manufacturing using the resins are also provided.
    Type: Application
    Filed: February 13, 2019
    Publication date: November 26, 2020
    Inventors: Jana Herzberger, Timothy E. Long, Viswanath Meenakshisundaram, Christopher B. Williams