Abstract: The present disclosure provides a polishing pad, which may maintain polishing performances required for a polishing process, such as a removal rate and a polishing profile, minimize defects that may occur on a wafer during the polishing process, and polish layers of different materials so as to have the same level of flatness even when the layers are polished at the same time, and a method for producing the polishing pad. In addition, according to the present disclosure, it is possible to determine a polishing pad, which shows an optimal removal rate selectivity along with excellent performance in a CMP process, through the physical property values of the polishing pad without a direct polishing test.

Abstract: Embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, a process for preparing the same, and a process for preparing a semiconductor device using the same. In the polishing pad according to the embodiment, the size (or diameter) and distribution of a plurality of pores are adjusted, whereby the polishing performance such as polishing rate and within-wafer non-uniformity can be further enhanced.

Abstract: Provided is a heater for an aerosol-generating device including a first electrically conductive pattern configured to perform heating and a second electrically conductive pattern arranged in parallel with the first electrically conductive pattern. The first electrically conductive pattern and/or the second electrically conductive pattern may include a material having a relatively small resistance temperature coefficient. Accordingly, a temperature increase rate of the heater may be greatly improved.

Abstract: An aerosol generation system includes a tobacco medium accommodation portion and a moisturizer accommodation portion located at an upstream end or a downstream end of the tobacco medium accommodation portion. In addition, an aerosol generation system includes an aerosol generation device including an elongated cavity for accommodating the cigarette, a first heater for heating the tobacco medium accommodation portion, and a second heater for heating the moisturizer accommodation portion.

Abstract: Provided is an aerosol-generating device including a heating assembly including an accommodation space into which at least a portion of the aerosol-generating article is accommodated, and at least one spiral coil arranged outside of the accommodation space and configured to generate an induced magnetic field. The spiral coil has a plate shape curved along a circumference direction of the accommodation space and a center around which the spiral coil is wound is at an external surface of the accommodation space.

Abstract: An insulating material for an aerosol generating device includes an insulation sheet and a waterproof film arranged on at least one surface of the insulation sheet.

Abstract: As an embodiment of the present disclosure, there is disclosed an aerosol generating device including: a heater configured to generate an aerosol by heating an aerosol generating substrate; a storage unit configured to store information regarding a first time period and a second time period for controlling a temperature of the heater; and a controller configured to control power supplied to the heater, wherein the controller, when the first time period time elapses after the temperature of the heater reaches the first target temperature, changes the temperature of the heater to a second target temperature for the second time period, and the sum of the first time period and the second time period is a time period in a preset change.

Abstract: An aerosol generation device having a differentiated heating function and an aerosol-generating article applied thereto are provided. The aerosol generation device according to some embodiments of the present disclosure may include a housing configured to form an accommodation space for accommodating an aerosol-generating article and a heater part configured to heat the aerosol-generating article accommodated in the accommodation space to generate an aerosol. Here, by including a first heating part configured to heat a first part of the aerosol-generating article from a first distance and a second heating part configured to heat a second part of the aerosol-generating article from a second distance longer than the first distance, the heater part can heat each part of the aerosol-generating article in a differentiated manner.

Abstract: A laser-based aerosol generation device and a heating method thereof are provided. The aerosol generation device according to some embodiments of the present disclosure may include an aerosol-generating article, a laser radiation part configured to radiate a laser and heat the aerosol-generating article to generate an aerosol, and a controller configured to control the laser radiation part. The controller may adjust a radiation area of the laser to precisely control heating of the aerosol-generating article, and accordingly, development of a burnt taste during smoking can be limited, and smoking satisfaction can be improved.

Abstract: An aerosol generation system includes a tobacco medium accommodation portion and a moisturizer accommodation portion located at an upstream end or a downstream end of the tobacco medium accommodation portion. In addition, an aerosol generation system includes an aerosol generation device including an elongated cavity for accommodating the cigarette, a first heater for heating the tobacco medium accommodation portion, and a second heater for heating the moisturizer accommodation portion.

Abstract: An aerosol generation device having a vibration part and a control method thereof are provided. The aerosol generation device according to some embodiments of the present disclosure may include a housing including an accommodation space for accommodating an aerosol-generating article, a heating element configured to be inserted into the aerosol-generating article accommodated in the accommodation space and heat the accommodated aerosol-generating article to generate an aerosol, and a vibration part. The vibration part may vibrate the heating element to prevent formation of stuck-on residue on the heating element and allow removal of stuck-on residue formed on the heating element.

Abstract: A conditioning device includes: an ejector for ejecting steam to a rotating polishing pad; and an ejector support supporting the ejector. The ejector includes a plurality of nozzles for ejecting the steam to the polishing pad and a nozzle heater for heating the plurality of nozzles. The nozzle heater is configured to heat nozzles disposed to correspond to a peripheral region of the polishing pad, among the plurality of nozzles, to a higher temperature than nozzles disposed to correspond to a central region of the polishing pad among the plurality of nozzles.

Abstract: Provided herein is an ultrasonic-based aerosol generation device. The aerosol generation device according to some embodiments of the present disclosure includes a liquid reservoir configured to store an aerosol-forming substrate in a liquid state, a wick configured to absorb the stored aerosol-forming substrate, an ultrasonic vibrator configured to vaporize the absorbed aerosol-forming substrate through ultrasonic waves to generate an aerosol, and a controller configured to control the ultrasonic vibrator. Here, at least a portion of the wick and at least a portion of the ultrasonic vibrator may be implemented to have a flat shape and may be disposed to come in close contact with each other. In this way, a vaporization area may be maximized, and vapor production may be significantly enhanced.

Abstract: Disclosed is a method for producing a polishing pad, the method comprising the steps of: providing a polishing layer; forming a first through-hole penetrating the polishing layer; providing a support layer facing the polishing layer; interposing an adhesive layer between the polishing layer, which has the first through-hole, and support layer, and adhering the polishing layer and support layer to each other by means of the adhesive layer; forming, with the first through-hole as a reference point, a third through-hole penetrating the adhesive layer on a set area thereof, and a second through-hole penetrating the support layer on a set area thereof; and inserting a window inside the first through-hole.

Abstract: Embodiments relate to a porous polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for preparing the same. According to the embodiments, the size and distribution of the plurality of pores contained in the porous polishing pad can be adjusted in light of the volume thereof. Thus, the plurality of pores have an apparent volume-weighted average pore diameter in a specific range, thereby providing a porous polishing pad that is excellent in such physical properties as polishing rate and the like.

Abstract: Embodiments relate to a porous polyurethane polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors and a process for preparing the same. According to the embodiments, the size and distribution of the plurality of pores contained in the porous polyurethane polishing pad can be adjusted. Thus, it is possible to provide a porous polyurethane polishing pad that has enhanced physical properties such as a proper level of withstand voltage, excellent polishing performance (i.e., polishing rate), and the like.

Abstract: An aerosol generation device having a differentiated heating function and an aerosol-generating article applied thereto are provided. The aerosol generation device according to some embodiments of the present disclosure may include a housing configured to form an accommodation space for accommodating an aerosol-generating article and a heater part configured to heat the aerosol-generating article accommodated in the accommodation space to generate an aerosol. Here, the heater part may include a first heating part configured to heat a first part of the aerosol-generating article and a second heating part configured to heat a second part of the aerosol-generating article. At least one opening may be formed in the second heating part to heat the first part and the second part of the aerosol-generating article in a differentiated manner.

Abstract: The embodiments relate to a polishing pad for use in a chemical mechanical planarization (CMP) process of semiconductors, to a process for preparing the same, and to a process for preparing a semiconductor device using the same. The polishing pad according to the embodiment adjusts the surface roughness characteristics of the polishing pad after polishing, whereby the polishing rate can be enhanced, and the surface residues, surface scratches, and chatter marks of the wafer can be remarkably reduced.

Abstract: An image reading apparatus includes an image sensor, a document feeder, and a processor. The document feeder includes a first driving device, a second driving device, a third driving device, a first sensor, and a second sensor. The first driving device includes a pick-up member to move documents from a tray to a document conveying path using a driving force through a first clutch. The second driving device is to move the tray with the documents to a side of the pick-up member using a driving force through a second clutch. The third driving device to move the documents along the document conveying path onto the image sensor using the driving force of the motor. The first and second sensors detect the documents on the document conveying path. The processor controls an operation of the first clutch based on the signals of the first and second sensors.