Patents by Inventor Jaw-hwang Sim

Jaw-hwang Sim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110034030
    Abstract: A method of forming minute patterns in a semiconductor device, and more particularly, a method of forming minute patterns in a semiconductor device having an even number of insert patterns between basic patterns by double patterning including insert patterns between a first basic pattern and a second basic pattern which are transversely separated from each other on a semiconductor substrate, wherein a first insert pattern and a second insert pattern are alternately repeated to form the insert patterns, the method includes the operation of performing a partial etching toward the second insert pattern adjacent to the second basic pattern, or the operation of forming a shielding layer pattern, thereby forming the even number of insert patterns.
    Type: Application
    Filed: October 15, 2010
    Publication date: February 10, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-yong Park, Jae-kwan Park, Yong-sik Yim, Jaw-hwang Sim