Patents by Inventor Jea-woo Park
Jea-woo Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11886788Abstract: A computing system may include a circuit design access engine configured to access a circuit design. The computing system may also include a duplicate section processing engine configured to partition the circuit design into multiple circuit sections and determine, from among the multiple circuit sections, an identical section set based on duplicate criteria. Circuit sections of the identical section set may satisfy the duplicate criteria with respect to one another. The duplicate section processing engine may further be configured to perform an OPC processing operation on a selected circuit section of the identical section set and apply an OPC result of the performed OPC processing operation for other circuit sections of the identical section set instead of or without performing the OPC processing operation on the other circuit sections of the identical section set.Type: GrantFiled: March 25, 2021Date of Patent: January 30, 2024Assignee: Siemens Industry Software Inc.Inventors: Jea Woo Park, Soohong Kim
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Publication number: 20220309220Abstract: A computing system may include a circuit design access engine configured to access a circuit design. The computing system may also include a duplicate section processing engine configured to partition the circuit design into multiple circuit sections and determine, from among the multiple circuit sections, an identical section set based on duplicate criteria. Circuit sections of the identical section set may satisfy the duplicate criteria with respect to one another. The duplicate section processing engine may further be configured to perform an OPC processing operation on a selected circuit section of the identical section set and apply an OPC result of the performed OPC processing operation for other circuit sections of the identical section set instead of or without performing the OPC processing operation on the other circuit sections of the identical section set.Type: ApplicationFiled: March 25, 2021Publication date: September 29, 2022Inventors: Jea Woo Park, Soohong Kim
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Patent number: 11113445Abstract: Aspects of the disclosed technology relate to techniques of hotspot detection. Pinching-type hotspot candidates and bridging-type hotspot candidates are first identified in the layout design based on predetermined criteria. Simulation is then performed to derive aerial image intensity values for a plurality of sites on each of the pinching-type and bridging-type hotspot candidates. Pinching-type hotspots are determined from the pinching-type hotspot candidates based on one or more machine learning models for pinching-type hotspots, and bridging-type hotspots are determined from the bridging-type hotspot candidates based on one or more machine learning models for bridging-type hotspots. The input vector for the machine learning models is the aerial image intensity values for the plurality of sites.Type: GrantFiled: September 19, 2018Date of Patent: September 7, 2021Assignee: Siemens Industry Software Inc.Inventors: Jea Woo Park, Juan Andres Torres Robles
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Patent number: 11003828Abstract: Systems and methods for layout analysis using unit cell properties. A method includes receiving a layout design and analyzing the layout design to identify unit cells in the layout design. The method includes designating points of interest each corresponding to a respective one of the unit cells and classifying the unit cells into a plurality of classifications using the points of interest and the corresponding properties. The method includes identifying unique patterns of the unit cells, and producing a reduced layout including the unique patterns of unit cells. The method includes performing layout processing on the reduced layout and propagating the process results from each of the unique patterns of unit cells in the reduced layout to other unit cells of the layout design having the same classification.Type: GrantFiled: August 3, 2020Date of Patent: May 11, 2021Assignee: Siemens Industry Software Inc.Inventors: Sherif Hany Riad Mohammed Mousa, Jea Woo Park, Michael White
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Patent number: 10311199Abstract: Aspects of the disclosed technology relate to techniques of pattern matching. Matching rectangles in a layout design that match rectangle members of a search pattern are identified based on edge operations. The rectangle members comprise an origin rectangle member and one or more reference rectangle members. Grid element identification values are attached to the matching rectangles. The matching rectangles that match the one or more reference rectangle members in neighborhoods of the matching rectangles that match the origin rectangle member are then analyzed. The neighborhoods are determined based on the grid element identification values. Based on the analysis, matching patterns in the layout design that match the search pattern are determined.Type: GrantFiled: July 1, 2016Date of Patent: June 4, 2019Assignee: Mentor Graphics CorporationInventors: Jea Woo Park, Robert A. Todd
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Publication number: 20190087526Abstract: Aspects of the disclosed technology relate to techniques of hotspot detection. Pinching-type hotspot candidates and bridging-type hotspot candidates are first identified in the layout design based on predetermined criteria. Simulation is then performed to derive aerial image intensity values for a plurality of sites on each of the pinching-type and bridging-type hotspot candidates. Pinching-type hotspots are determined from the pinching-type hotspot candidates based on one or more machine learning models for pinching-type hotspots, and bridging-type hotspots are determined from the bridging-type hotspot candidates based on one or more machine learning models for bridging-type hotspots. The input vector for the machine learning models is the aerial image intensity values for the plurality of sites.Type: ApplicationFiled: September 19, 2018Publication date: March 21, 2019Inventors: Jea Woo Park, Juan Andres Torres Robles
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Publication number: 20180004888Abstract: Aspects of the disclosed technology relate to techniques of pattern matching. Matching rectangles in a layout design that match rectangle members of a search pattern are identified based on edge operations. The rectangle members comprise an origin rectangle member and one or more reference rectangle members. Grid element identification values are attached to the matching rectangles. The matching rectangles that match the one or more reference rectangle members in neighborhoods of the matching rectangles that match the origin rectangle member are then analyzed. The neighborhoods are determined based on the grid element identification values. Based on the analysis, matching patterns in the layout design that match the search pattern are determined.Type: ApplicationFiled: July 1, 2016Publication date: January 4, 2018Inventors: Jea Woo Park, Robert A. Todd
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Publication number: 20170277309Abstract: An electronic device may include a multi-layer panel, a first upper electrode and a first lower electrode disposed in different respective layers of the multi-layer panel, a second upper electrode and a second lower electrode disposed in different layers respectively of the multi-layer panel. A first controller may detect a touch input by detecting a change in an electromagnetic field between the first upper electrode and the first lower electrode. A second controller may detect a hovering input by detecting a change in an electromagnetic field between the second upper electrode and the second lower electrode.Type: ApplicationFiled: June 12, 2017Publication date: September 28, 2017Inventor: Jea-Woo PARK
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Patent number: 9715317Abstract: An electronic device may include a multi-layer panel, a first upper electrode and a first lower electrode disposed in different respective layers of the multi-layer panel, a second upper electrode and a second lower electrode disposed in different layers respectively of the multi-layer panel. A first controller may detect a touch input by detecting a change in an electromagnetic field between the first upper electrode and the first lower electrode. A second controller may detect a hovering input by detecting a change in an electromagnetic field between the second upper electrode and the second lower electrode.Type: GrantFiled: June 15, 2015Date of Patent: July 25, 2017Assignee: Samsung Electronics Co., Ltd.Inventor: Jea-Woo Park
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Publication number: 20150370384Abstract: An electronic device may include a multi-layer panel, a first upper electrode and a first lower electrode disposed in different respective layers of the multi-layer panel, a second upper electrode and a second lower electrode disposed in different layers respectively of the multi-layer panel. A first controller may detect a touch input by detecting a change in an electromagnetic field between the first upper electrode and the first lower electrode. A second controller may detect a hovering input by detecting a change in an electromagnetic field between the second upper electrode and the second lower electrode.Type: ApplicationFiled: June 15, 2015Publication date: December 24, 2015Inventor: Jea-Woo PARK
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Publication number: 20140240252Abstract: An electronic apparatus includes a user interface (UI) which displays a first screen on the touch screen, a sensor which senses a grip of a user on the touch screen, and a controller which, if the grip of the user on the touch screen is sensed, controls to display a second screen having a non-screen area.Type: ApplicationFiled: January 29, 2014Publication date: August 28, 2014Applicant: SAMSUNG Electronics Co., Ltd.Inventor: Jea-woo PARK
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Patent number: 8775978Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: GrantFiled: June 14, 2011Date of Patent: July 8, 2014Assignee: Mentor Graphics CorporationInventor: Jea-Woo Park
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Patent number: 8209642Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: GrantFiled: June 14, 2011Date of Patent: June 26, 2012Assignee: Mentor Graphics CorporationInventor: Jea-Woo Park
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Publication number: 20110252385Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: ApplicationFiled: June 14, 2011Publication date: October 13, 2011Applicant: Mentor Graphics CorporationInventor: Jea-Woo Park
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Publication number: 20110246953Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: ApplicationFiled: June 14, 2011Publication date: October 6, 2011Applicant: Mentor Graphics CorporationInventor: Jea-Woo Park
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Patent number: 7966585Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: GrantFiled: December 13, 2006Date of Patent: June 21, 2011Assignee: Mentor Graphics CorporationInventor: Jea-Woo Park
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Patent number: 7802226Abstract: A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or adjacent features that are within a predetermined distance of each other and are assigned to the same group or data layer are identified. Cutting boxes are added to a feature to divide a feature into two or more smaller features. A coloring algorithm is re-applied to the layout including the cutting boxes to assign the features into different groups or data layers. Data in each group or data layer is used to define a mask to print the target feature pattern.Type: GrantFiled: January 8, 2007Date of Patent: September 21, 2010Inventors: Jea-Woo Park, Emile Y. Sahouria
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Publication number: 20080166639Abstract: A method for preparing data to create two or more masks required to print a desired feature pattern with a multiple mask technique. In one embodiment of the invention, a target feature pattern is separated into two or more groups or data layers with a coloring algorithm. Coloring conflicts or adjacent features that are within a predetermined distance of each other and are assigned to the same group or data layer are identified. Cutting boxes are added to a feature to divide a feature into two or more smaller features. A coloring algorithm is re-applied to the layout including the cutting boxes to assign the features into different groups or data layers. Data in each group or data layer is used to define a mask to print the target feature pattern.Type: ApplicationFiled: January 8, 2007Publication date: July 10, 2008Inventors: Jea-Woo Park, Emile Y. Sahouria
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Publication number: 20080148217Abstract: A system for preparing mask data to create a desired layout pattern on a wafer with a multiple exposure photolithographic printing system. In one embodiment, boundaries of features are expanded to create shields for those features, or portions thereof, that are not oriented in a direction that are printed with greater fidelity by an illumination pattern used in the multiple exposure printing system.Type: ApplicationFiled: December 13, 2006Publication date: June 19, 2008Inventor: Jea-Woo Park
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Patent number: 7342783Abstract: A portable computer system having a computer body and a display unit coupled to the computer body includes a docking station to be connectable to and disconnectable from the computer body, a heat discharging member provided on the computer body to cool a heat generating component mounted on the computer body, at least one first heat transmission member provided on the computer body and connected to the heat discharging member to be in contact with the docking station, and at least one second heat transmission member provided on the docking station to be in contact with the first heat transmission member and to discharge heat from the computer body. Thus, the portable computer system is capable of discharging the heat generated from the computer body through the docking station.Type: GrantFiled: December 6, 2005Date of Patent: March 11, 2008Assignee: Samsung Electronics Co., Ltd.Inventor: Jea-woo Park