Patents by Inventor Jeffrey F. Roeder

Jeffrey F. Roeder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10741850
    Abstract: A novel method to produce ALD films disposed on powders is disclosed. Examples include the formation of a cobalt doped zirconia (CDZ), hafnia, and cobalt doped hafnia (CDH) films on lanthanum strontium cobalt iron oxide (LSCF) powder for solid oxide fuel cell cathodes. The coated powders are sintered into porous cathodes that have utility for preventing the migration of cations in the powder to the surface of the sintered cathode and/or other performance enhancing attributes.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: August 11, 2020
    Assignee: Sonata Scientific LLC
    Inventors: Kevin Huang, Jeffrey F. Roeder, Anthony F. Zeberoff
  • Publication number: 20200101440
    Abstract: Monolithic composite photocatalysts for fluid purification, chemical transformations, and surface sterilization are disclosed. The monolithic composite photocatalysts comprise a photoactive nanocrystal component and a non-photoactive porous support. Photocatalytic fluid purification systems that contact an impurity-containing fluid with the subject monolithic composite photocatalysts are also disclosed.
    Type: Application
    Filed: November 12, 2019
    Publication date: April 2, 2020
    Inventors: Melissa A. Petruska, Trevor E. James, James D. Carruthers, Peter C. Van Buskirk, Jeffrey F. Roeder
  • Publication number: 20200069848
    Abstract: Invasive surgical devices such as joint implants and surgical tools are provided with a coating of visible or near visible light stimulated TiO2 based photocatalysts. The coatings may comprise one or more layers of different TiO2 crystal phases and may incorporate metal nodules. The devices reduce the incidence of infection via antimicrobial and bactericidal surface properties. Related devices and methods for illumination, air purification, and packaging are disclosed that comprise a complete system for use of the devices in surgical procedures.
    Type: Application
    Filed: February 16, 2019
    Publication date: March 5, 2020
    Inventors: Peter C. Van Buskirk, Maryam Golalikhani, Jeffrey F. Roeder
  • Publication number: 20200061242
    Abstract: A novel medical device thin film coating is disclosed. The coating may be produced by sputtering, CVD, MOCVD, or ALD. The conformal coating has dual antimicrobial and osseointegrative properties and comprises TiO2 and Ta2O5 or intermediate phases. The TiO2 provides antimicrobial properties via photocatalytic behavior in the visible or near visible light region and the Ta2O5 provides improved osseointegration. The TiO2 and Ta2O5 may be doped with other cations. The coating combination may also be patterned into opened regions of one coating material on a continuous layer of the other coating material by using a partially decomposable organic patterning material between the layers.
    Type: Application
    Filed: August 27, 2019
    Publication date: February 27, 2020
    Inventors: Jeffrey F. Roeder, Peter C. Van Buskirk
  • Patent number: 10541429
    Abstract: A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.
    Type: Grant
    Filed: October 22, 2017
    Date of Patent: January 21, 2020
    Assignee: Sonata Scientific LLC
    Inventors: Jeffrey F. Roeder, Peter C. Van Buskirk
  • Patent number: 10516169
    Abstract: An apparatus and method is described to coat small and large quantities of solid particles using atomic layer deposition, with increased material utilization and decreased cycle times. The resulting higher coating efficiency ALD process is achieved by a controlled pressure differential acting across a rotating porous vessel that contains a plurality of solid particles. The apparatus is comprised of two coaxial cylindrical porous vessels with a means for one to rotate, and a two stage rotary feedthrough with a specialized hollowed out shaft, which enables both rotation of the vessel and reactant, purge, and product gas transport across a particle bed that undergoes mixing.
    Type: Grant
    Filed: November 12, 2016
    Date of Patent: December 24, 2019
    Assignee: Sonata Scientific LLC
    Inventors: Anthony F. Zeberoff, Jeffrey F. Roeder, Peter C. Van Buskirk
  • Patent number: 10381655
    Abstract: A novel method to modify the surface of lanthanum and strontium containing cathode powders before or after sintering by depositing layers of gadolinium doped ceria (GDC) and/or samarium doped ceria or similar materials via atomic layer deposition on the powders. The surface modified powders are sintered into porous cathodes that have utility enhancing the electrochemical performance of the cathodes, particularly for use in solid oxide fuel cells. Similar enhancements are observed for surface treatment of sintered cathodes.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: August 13, 2019
    Assignee: Sonata Scientific LLC
    Inventors: Jeffrey F. Roeder, Anthony F. Zeberoff, Peter C. Van Buskirk
  • Publication number: 20190168204
    Abstract: The Invention describes integration of photocatalytic materials into composite surfaces in order to achieve antimicrobial properties. Aspects of the invention include types of photocatalytic materials and methods to achieve long lifetimes, high durability and mechanical robustness, for application to medical and sanitary uses, among others.
    Type: Application
    Filed: December 6, 2018
    Publication date: June 6, 2019
    Inventors: Peter C. Van Buskirk, Maryam Golalikhani, Melissa A. Petruska, Jeffrey F. Roeder
  • Publication number: 20190091627
    Abstract: The Invention describes LED illuminated photocatalytic fluid purification systems, especially for use for ethylene mitigation and control in agricultural, horticultural and floricultural growth, storage and transport modules. Aspects of the invention include systems integration with grow lights, ethylene and plant stress sensors, and communication with external control and data sources.
    Type: Application
    Filed: September 28, 2018
    Publication date: March 28, 2019
    Inventors: Peter C. Van Buskirk, Jeffrey F. Roeder, Melissa A. Petruska
  • Patent number: 10141582
    Abstract: A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.
    Type: Grant
    Filed: December 20, 2015
    Date of Patent: November 27, 2018
    Assignee: Sonata Scientific LLC
    Inventors: Jeffrey F. Roeder, Peter C. Van Buskirk
  • Patent number: 10043658
    Abstract: A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon dioxide of a substantially void-free character and substantially uniform density throughout its bulk mass. A method of manufacturing a semiconductor product also is described, involving use of specific silicon precursor compositions for forming substantially void-free and substantially uniform density silicon dioxide material in the trench. The precursor fill composition may include silicon and germanium, to produce a microelectronic device structure including a GeO2/SiO2 trench fill material. A suppressor component may be employed in the precursor fill composition, to eliminate or minimize seam formation in the cured trench fill material.
    Type: Grant
    Filed: January 4, 2018
    Date of Patent: August 7, 2018
    Assignee: Entegris, Inc.
    Inventors: William Hunks, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li
  • Publication number: 20180130654
    Abstract: A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon dioxide of a substantially void-free character and substantially uniform density throughout its bulk mass. A method of manufacturing a semiconductor product also is described, involving use of specific silicon precursor compositions for forming substantially void-free and substantially uniform density silicon dioxide material in the trench. The precursor fill composition may include silicon and germanium, to produce a microelectronic device structure including a GeO2/SiO2 trench fill material. A suppressor component may be employed in the precursor fill composition, to eliminate or minimize seam formation in the cured trench fill material.
    Type: Application
    Filed: January 4, 2018
    Publication date: May 10, 2018
    Inventors: William Hunks, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li
  • Publication number: 20180062183
    Abstract: A novel method to produce thin films spatially disposed on desired areas of workpieces is disclosed. Examples of include the formation of a yttria stabilized zirconia (YSZ) film formed on a desired portion of a stainless steel interconnect for solid oxide fuel cells by Atomic Layer Deposition (ALD). A number of methods to produce the spatially disposed YSZ film structures are described including polymeric and silicone rubber masks. The thin film structures have utility for preventing the reaction of glasses with metals, in particular alkali-earth containing glasses with ferritic stainless steels, allowing high temperature bonding of these materials.
    Type: Application
    Filed: October 22, 2017
    Publication date: March 1, 2018
    Inventors: Jeffrey F. Roeder, Peter C. Van Buskirk
  • Publication number: 20170170485
    Abstract: A novel method to produce ALD films disposed on powders is disclosed. Examples include the formation of a cobalt doped zirconia (CDZ), hafnia, and cobalt doped hafnia (CDH) films on lanthanum strontium cobalt iron oxide (LSCF) powder for solid oxide fuel cell cathodes. The coated powders are sintered into porous cathodes that have utility for preventing the migration of cations in the powder to the surface of the sintered cathode and/or other performance enhancing attributes.
    Type: Application
    Filed: December 9, 2016
    Publication date: June 15, 2017
    Inventors: Kevin Huang, Jeffrey F. Roeder, Anthony F. Zeberoff
  • Publication number: 20170137940
    Abstract: An apparatus and method is described to coat small and large quantities of solid particles using atomic layer deposition, with increased material utilization and decreased cycle times. The resulting higher coating efficiency ALD process is achieved by a controlled pressure differential acting across a rotating porous vessel that contains a plurality of solid particles. The apparatus is comprised of two coaxial cylindrical porous vessels with a means for one to rotate, and a two stage rotary feedthrough with a specialized hollowed out shaft, which enables both rotation of the vessel and reactant, purge, and product gas transport across a particle bed that undergoes mixing.
    Type: Application
    Filed: November 12, 2016
    Publication date: May 18, 2017
    Inventors: Anthony F. Zeberoff, Jeffrey F. Roeder, Peter C. Van Buskirk
  • Publication number: 20170018782
    Abstract: A novel method to modify the surface of lanthanum and strontium containing cathode powders before or after sintering by depositing layers of gadolinium doped ceria (GDC) and/or samarium doped ceria or similar materials via atomic layer deposition on the powders. The surface modified powders are sintered into porous cathodes that have utility enhancing the electrochemical performance of the cathodes, particularly for use in solid oxide fuel cells. Similar enhancements are observed for surface treatment of sintered cathodes.
    Type: Application
    Filed: July 13, 2016
    Publication date: January 19, 2017
    Inventors: Jeffrey F. Roeder, Anthony F. Zeberoff, Peter C. Van Buskirk
  • Patent number: 9534285
    Abstract: Barium, strontium, tantalum and lanthanum precursor compositions useful for atomic layer deposition (ALD) and chemical vapor deposition (CVD) of titanate thin films. The precursors have the formula M(Cp)2, wherein M is strontium, barium, tantalum or lanthanum, and Cp is cyclopentadienyl, of the formula wherein each of R1-R5 is the same as or different from one another, with each being independently selected from among hydrogen, C1-C12 alkyl, C1-C12 amino, C6-C10 aryl, C1-C12 alkoxy, C3-C6 alkylsilyl, C2-C12 alkenyl, R1R2R3NNR3, wherein R1, R2 and R3 may be the same as or different from one another and each is independently selected from hydrogen and C1-C6 alkyl, and pendant ligands including functional group(s) providing further coordination to the metal center M. The precursors of the above formula are useful to achieve uniform coating of high dielectric constant materials in the manufacture of flash memory and other microelectronic devices.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: January 3, 2017
    Assignee: ENTEGRIS, INC.
    Inventors: Chongying Xu, Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum
  • Patent number: 9537095
    Abstract: Precursors for use in depositing tellurium-containing films on substrates such as wafers or other microelectronic device substrates, as well as associated processes of making and using such precursors, and source packages of such precursors. The precursors are useful for deposition of Ge2Sb2Te5 chalcogenide thin films in the manufacture of nonvolatile Phase Change Memory (PCM), by deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD).
    Type: Grant
    Filed: July 16, 2014
    Date of Patent: January 3, 2017
    Assignee: Entegris, Inc.
    Inventors: Matthias Stender, Chongying Xu, Tianniu Chen, William Hunks, Philip S. H. Chen, Jeffrey F. Roeder, Thomas H. Baum
  • Patent number: 9480766
    Abstract: Novel photocatalytic devices are disclosed, that utilize ultrathin titania based photocatalytic materials formed on optical elements with high transmissivity, high reflectivity or scattering characteristics, or on high surface area or high porosity open cell materials. The disclosure includes methods to fabricate such devices, including MOCVD and ALD. The disclosure also includes photocatalytic systems that are either standalone or combined with general illumination (lighting) utility, and which may incorporate passive fluid exchange, user configurable photocatalytic optical elements, photocatalytic illumination achieved either by the general illumination light source, dedicated blue or UV light sources, or combinations thereof, and operating methodologies for combined photocatalytic and lighting systems.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: November 1, 2016
    Inventors: Peter C. Van Buskirk, Jeffrey F. Roeder
  • Publication number: 20160225615
    Abstract: A full fill trench structure is described, including a microelectronic device substrate having a high aspect ratio trench therein and filled with silicon dioxide of a substantially void-free character and substantially uniform density throughout its bulk mass. A method of manufacturing a semiconductor product also is described, involving use of specific silicon precursor compositions for forming substantially void-free and substantially uniform density silicon dioxide material in the trench. The precursor fill composition may include silicon and germanium, to produce a microelectronic device structure including a GeO2/SiO2 trench fill material. A suppressor component may be employed in the precursor fill composition, to eliminate or minimize seam formation in the cured trench fill material.
    Type: Application
    Filed: April 8, 2016
    Publication date: August 4, 2016
    Applicant: Entegris, Inc.
    Inventors: William Hunks, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Steven M. Bilodeau, Weimin Li