Patents by Inventor Jeffrey Fanton

Jeffrey Fanton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11874237
    Abstract: A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.
    Type: Grant
    Filed: December 8, 2020
    Date of Patent: January 16, 2024
    Assignee: NOVA MEASURING INSTRUMENTS INC.
    Inventors: Heath Pois, David Reed, Bruno Shueler, Rodney Smedt, Jeffrey Fanton
  • Publication number: 20210164924
    Abstract: A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.
    Type: Application
    Filed: December 8, 2020
    Publication date: June 3, 2021
    Applicant: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Heath POIS, David REED, Bruno SHUELER, Rodney SMEDT, Jeffrey FANTON
  • Publication number: 20070076976
    Abstract: Methods for eliminating artifacts in two-dimensional optical metrology utilizing the interline CCD detectors are based on a dark-subtraction principle. The self-dark subtraction method takes advantage of strong correlation between the noise patterns in illuminated and dark regions within the same image. Image artifacts are removed and the S/N ratio is improved significantly by subtraction of selected dark region of the image from the illuminated one within the same frame. The dark-frame subtraction technique reduces a “smear” effect by applying a digital processing based on subtraction of the dark frame images from the normal light frame images. A combination of these methods significantly improves performance of two-dimensional optical metrology systems such as spectrometers, ellipsometers, beam profile reflectometers/ellipsometers, scatterometers and spectroscopic scatterometers.
    Type: Application
    Filed: August 4, 2006
    Publication date: April 5, 2007
    Inventors: Craig Uhrich, Lanhua Wei, Jeffrey Fanton, Ken Krieg
  • Publication number: 20060262314
    Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
    Type: Application
    Filed: July 25, 2006
    Publication date: November 23, 2006
    Inventors: Lena Nicolaides, Jeffrey Fanton, Alex Salnik, Jon Opsal
  • Publication number: 20060180761
    Abstract: The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.
    Type: Application
    Filed: April 7, 2006
    Publication date: August 17, 2006
    Inventors: David Wang, Lawrence Rotter, Jeffrey Fanton, Jeffrey McAninch
  • Publication number: 20060092425
    Abstract: A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.
    Type: Application
    Filed: December 14, 2005
    Publication date: May 4, 2006
    Inventors: Lena Nicolaides, Jeffrey Fanton, Alex Salnik, Jon Opsal