Patents by Inventor Jeffrey John LOMBARDO

Jeffrey John LOMBARDO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for and method of in-situ particle removal in a lithography apparatus
    Patent number: 11550231
    Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: January 10, 2023
    Assignee: ASML Holding N.V.
    Inventors: Jeffrey John Lombardo, Ronald Peter Albright, Daniel Leslie Hall, Victor Antonio Perez-Falcon, Andrew Judge
  • APPARATUS FOR AND METHOD OF IN-SITU PARTICLE REMOVAL IN A LITHOGRAPHY APPARATUS
    Publication number: 20220075277
    Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.
    Type: Application
    Filed: December 12, 2019
    Publication date: March 10, 2022
    Applicant: ASML Holding N.V.
    Inventors: Jeffrey John LOMBARDO, Ronald Peter ALBRIGHT, Daniel Leslie HALL, Victor Antonio PEREZ-FALCON, Andrew JUDGE
  • Alignment mark for two-dimensional alignment in an alignment system
    Patent number: 11156928
    Abstract: An alignment mark for determining a two-dimensional alignment position of a substrate is discussed. The alignment mark includes an array of patterns. The array of patterns includes a first set of patterns and a second set of patterns arranged. The first set of patterns is arranged in a first sequence along a first direction. The second set of patterns is arranged in a second sequence along the first direction. The second sequence is different from the first sequence. Each pattern of the array of patterns is different from other patterns of the array of patterns that are adjacent to the each pattern.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: October 26, 2021
    Assignee: ASML Holding N.V.
    Inventors: Gerrit Johannes Nijmeijer, Junqiang Zhou, Piotr Jan Meyer, Jeffrey John Lombardo, Igor Matheus Petronella Aarts
  • Alignment Mark For Two-Dimensional Alignment In An Alignment System
    Publication number: 20200124995
    Abstract: An alignment mark for determining a two-dimensional alignment position of a substrate is discussed. The alignment mark includes an array of patterns. The array of patterns includes a first set of patterns and a second set of patterns arranged. The first set of patterns is arranged in a first sequence along a first direction. The second set of patterns is arranged in a second sequence along the first direction. The second sequence is different from the first sequence. Each pattern of the array of patterns is different from other patterns of the array of patterns that are adjacent to the each pattern.
    Type: Application
    Filed: May 2, 2018
    Publication date: April 23, 2020
    Applicant: ASML Holding N.V.
    Inventors: Gerrit Johannes NIJMEIJER, Junqiang ZHOU, Piotr Jan MEYER, Jeffrey John LOMBARDO, Igor Matheus Petronella AARTS