Patents by Inventor Jeffrey Schefske

Jeffrey Schefske has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removal of immersion lithography medium in immersion lithography processes
    Patent number: 7741012
    Abstract: A process for fabricating a semiconductor device, including applying an immersion lithography medium to a surface of a semiconductor wafer; exposing a material on the surface of the semiconductor wafer to electromagnetic radiation having a selected wavelength; and applying supercritical carbon dioxide to the semiconductor wafer to remove the immersion lithography medium from the surface of the semiconductor wafer. In one embodiment, the process includes recovery of the immersion lithography medium.
    Type: Grant
    Filed: March 1, 2004
    Date of Patent: June 22, 2010
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Adam R. Pawloski, Amr Y. Abdo, Gilles R. Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson, Jeffrey A. Schefske, Cyrus E. Tabery, Frank Tsai
  • Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
    Patent number: 7014966
    Abstract: A method of operating an immersion lithography system, including steps of immersing at least a portion of a wafer to be exposed in an immersion medium, wherein the immersion medium comprises at least one bubble; directing an ultrasonic wave through at least a portion of the immersion medium to disrupt and/or dissipate the at least one bubble; and exposing the wafer with an exposure pattern by passing electromagnetic radiation through the immersion medium subsequent to the directing. Also disclosed is a monitoring and control system for an immersion lithography system.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: March 21, 2006
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Adam R. Pawloski, Amr Y. Abdo, Gilles R. Amblard, Bruno M. LaFontaine, Ivan Lalovic, Harry J. Levinson, Jeffrey A. Schefske, Cyrus E. Tabery, Frank Tsai
  • Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
    Publication number: 20050048223
    Abstract: A method of operating an immersion lithography system, including steps of immersing at least a portion of a wafer to be exposed in an immersion medium, wherein the immersion medium comprises at least one bubble; directing an ultrasonic wave through at least a portion of the immersion medium to disrupt and/or dissipate the at least one bubble; and exposing the wafer with an exposure pattern by passing electromagnetic radiation through the immersion medium subsequent to the directing. Also disclosed is a monitoring and control system for an immersion lithography system.
    Type: Application
    Filed: September 2, 2003
    Publication date: March 3, 2005
    Inventors: Adam Pawloski, Amr Abdo, Gilles Amblard, Bruno LaFontaine, Ivan Lalovic, Harry Levinson, Jeffrey Schefske, Cyrus Tabery, Frank Tsai
  • Differential wavelength inspection system
    Patent number: 6608321
    Abstract: An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system utilizes at least two wavelengths of light. The light is directed to the reticle at the at least two wavelengths of light and detected by a detector. The image associated with the first wavelength is subtracted from or otherwise processed with respect to the image associated with the second wavelength to improve contrast ratio.
    Type: Grant
    Filed: February 1, 2001
    Date of Patent: August 19, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Bruno M. La Fontaine, Harry J. Levinson, Jeffrey A. Schefske