Patents by Inventor Jei-Wei Chang

Jei-Wei Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180198125
    Abstract: A polymer coated cathode material not subject to catastrophic failure through local overheating comprises cathode active material particles and a polymer layer. The polymer layer wraps each cathode active material particle. The polymer coated cathode material has a core-shell structure. The core-shell structure comprises a core and a shell, the core is formed by the cathode active material particle, the shell is formed by the polymer layer. A battery made by the polymer coated cathode material is safer, in that when there is a short circuit, the short circuit only happens locally and a chain reaction is avoided. Only a part of the battery may reach high temperature, preventing an explosion of the battery. A cathode using the polymer coated cathode material, and a battery using the cathode are also provided.
    Type: Application
    Filed: December 25, 2017
    Publication date: July 12, 2018
    Inventors: JEI-WEI CHANG, TZU-WEI HUANG
  • Patent number: 9564669
    Abstract: A battery having the electrodes of multiple battery cell types are interleaved to prevent thermal runaway by cooling a shorted region between electrodes. The electrodes of each of the battery cell types with a first polarity share a pair of the common electrodes having a second polarity. The electrodes of the multiple battery cell types and the multiple common electrodes are interleaved such that if the electrodes of the multiple battery cell types and the adjacent common electrodes of one or more battery cell types short together, the current within the shorted battery cells is sufficiently small to prevent thermal runaway and the electrodes of the adjacent cells of the other battery cell types of the first polarity and the common electrodes of the second polarity not having short circuits provide heat sinking for the heat generated by the short circuit to prevent thermal runaway.
    Type: Grant
    Filed: January 1, 2016
    Date of Patent: February 7, 2017
    Assignee: Amperex Technology Limited
    Inventors: Li-Yan Zhu, Jei-Wei Chang
  • Publication number: 20160118698
    Abstract: A battery having the electrodes of multiple battery cell types are interleaved to prevent thermal runaway by cooling a shorted region between electrodes. The electrodes of each of the battery cell types with a first polarity share a pair of the common electrodes having a second polarity. The electrodes of the multiple battery cell types and the multiple common electrodes are interleaved such that if the electrodes of the multiple battery cell types and the adjacent common electrodes of one or more battery cell types short together, the current within the shorted battery cells is sufficiently small to prevent thermal runaway and the electrodes of the adjacent cells of the other battery cell types of the first polarity and the common electrodes of the second polarity not having short circuits provide heat sinking for the heat generated by the short circuit to prevent thermal runaway.
    Type: Application
    Filed: January 1, 2016
    Publication date: April 28, 2016
    Inventors: Li-Yan Zhu, Jei-Wei Chang
  • Patent number: 9231271
    Abstract: A battery having the electrodes of multiple cell types interleaved to prevent thermal runaway by cooling a shorted region between electrodes. The battery includes multiple cell types where each cell type has multiple electrodes a first polarity. The electrodes of each of the cell types share a pair of the common electrodes having a second polarity. The electrodes of the multiple cell types and the multiple common electrodes are interleaved such that if the electrodes of the multiple cell types and the adjacent common electrodes of one or more cell types short together, the current within the shorted cells is sufficiently small to prevent thermal runaway and the electrodes of the adjacent cells of the other cell types of the first polarity and the common electrodes of the second polarity not having short circuits provide heat sinking for the heat generated by the short circuit to prevent thermal runaway.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: January 5, 2016
    Assignee: Amperex Technology Limited
    Inventors: Li-Yan Zhu, Jei-Wei Chang
  • Patent number: 9118192
    Abstract: A battery pack has series-parallel connected battery cells. An inrush current limiting circuit has current limiting devices and a current limiting tracking means limits inrush current from shorted battery cells. Each current limiting tracking means is coupled to the current limiting devices such that they limit an inrush current from parallel neighbor battery cells when one battery cell on the column shorts. The current limiting devices are variable buffer resistors with a positive temperature coefficient. The current limiting tracking means are heat sinks that thermally couples the buffer resistors together such that the buffer resistors increase in resistance with a temperature increase caused by current flowing through the buffer resistor associated with the shorted battery cell. Current regulating elements are in series with columns of battery cells for preventing inrush current to the columns of the battery cells.
    Type: Grant
    Filed: August 29, 2011
    Date of Patent: August 25, 2015
    Assignee: Amperex Technology Limited
    Inventors: Li-Yan Zhu, Jei Wei Chang, Ping Hua Deng
  • Publication number: 20130224533
    Abstract: A battery having the electrodes of multiple cell types interleaved to prevent thermal runaway by cooling a shorted region between electrodes. The battery includes multiple cell types where each cell type has multiple electrodes a first polarity. The electrodes of each of the cell types share a pair of the common electrodes having a second polarity. The electrodes of the multiple cell types and the multiple common electrodes are interleaved such that if the electrodes of the multiple cell types and the adjacent common electrodes of one or more cell types short together, the current within the shorted cells is sufficiently small to prevent thermal runaway and the electrodes of the adjacent cells of the other cell types of the first polarity and the common electrodes of the second polarity not having short circuits provide heat sinking for the heat generated by the short circuit to prevent thermal runaway.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 29, 2013
    Applicant: AMPEREX TECHNOLOGY LIMITED
    Inventors: Li-Yan Zhu, Jei-Wei Chang
  • Publication number: 20130049696
    Abstract: A battery pack has series-parallel connected battery cells. An inrush current limiting circuit has current limiting devices and a current limiting tracking means limits inrush current from shorted battery cells. Each current limiting tracking means is coupled to the current limiting devices such that they limit an inrush current from parallel neighbor battery cells when one battery cell on the column shorts. The current limiting devices are variable buffer resistors with a positive temperature coefficient. The current limiting tracking means are heat sinks that thermally couples the buffer resistors together such that the buffer resistors increase in resistance with a temperature increase caused by current flowing through the buffer resistor associated with the shorted battery cell. Current regulating elements are in series with columns of battery cells for preventing inrush current to the columns of the battery cells.
    Type: Application
    Filed: August 29, 2011
    Publication date: February 28, 2013
    Inventors: Li-Yan Zhu, Jei Wei Chang, Ping Hua Deng
  • Patent number: 8236484
    Abstract: As the critical dimensions of liftoff patterns grow smaller, it becomes increasingly more difficult to make liftoff resists that have the required resolution. This problem has been overcome by use of a combination of ion beam processing and ozone slimming to form lift-off patterns with undercuts from a single layer of photoresist. The ion beam process serves to harden the top portion of the resist while the ozone is used to oxidize and erode the lower portion resist sidewall to form the undercut.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: August 7, 2012
    Assignee: Headway Technologies, Inc.
    Inventors: Jei-Wei Chang, Chao-Peng Chen, Chunping Luo, Shou-Chen Kao
  • Patent number: 7781152
    Abstract: A method for forming a bi-layer lift-off mask, including a hardened photoresistive stencil layer on a PMGI layer, for use in fabricating GMR read-head sensors with trackwidths of less than 0.1 microns and TMJ MRAM devices of similar critical dimensions. The stencil portion of the mask includes a narrow portion with sharply defined edge and corners which are formed, without rounding or extreme undercut, by a photolithographic process which includes the formation, in a first development process, of auxiliary pattern pieces over the corners of the stencil and a subsequent oxidation in ozone for removing those auxiliary pattern pieces and obtaining sharply defined edge and corners and a controlled dissolution of the PMGI layer.
    Type: Grant
    Filed: July 28, 2004
    Date of Patent: August 24, 2010
    Assignee: Headway Technologies, Inc.
    Inventors: Chao-Peng Chen, Rina Kaji, Jei-Wei Chang
  • Patent number: 7675718
    Abstract: The problem of increased edge sensitivity associated with the reduction of the spacing between bias magnets in a CPP head has been solved by limiting the width of the bias cancellation layer and by adding an extra layer of insulation to ensure that current through the device flows only through its central area, thereby minimizing its edge reading sensitivity.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: March 9, 2010
    Assignee: Headway Technologies, Inc.
    Inventors: Jei-Wei Chang, Koichi Terunuma, Youfeng Zheng, Kochan Ju
  • Patent number: 7633712
    Abstract: A write pole for vertical magnetic recording is described. It includes a trapezoidal prism of high magnetic moment material, having inwardly sloping sidewalls. Its parallel surfaces are between about 0.1 and 0.3 microns apart and the sidewalls slope in the range of 15.5 to 60 degrees relative to vertical.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: December 15, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Chao-Peng Chen, Jei-Wei Chang, Xiaohong Yang
  • Patent number: 7506430
    Abstract: The problem of increased edge sensitivity associated with the reduction of the spacing between bias magnets in a CPP head has been solved by limiting the width of the bias cancellation layer and by adding an extra layer of insulation to ensure that current through the device flows only through its central area, thereby minimizing its edge reading sensitivity.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: March 24, 2009
    Assignee: Headway Technologies, Inc.
    Inventors: Jei-Wei Chang, Koichi Terunuma, Youfeng Zheng, Kochan Ju
  • Patent number: 7453720
    Abstract: A “toggling” type of magnetic random access memory (MRAM) has memory stacks arranged in the X-Y plane on the MRAM substrate with each memory stack having a plurality of toggle memory cells stacked along the Z axis. Each stack is located at an intersection region between the two orthogonal write lines. The cells are stacked in pairs, with the cells in each pair having their easy axes of magnetization aligned substantially parallel to one another and nonparallel with the X and Y axes. The cells in each pair have their free layers magnetically biased in opposite directions. Because the free layer of each cell in a pair is biased in a direction opposite to the bias direction of the free layer of the other cell, one cell in a pair can be toggle written without toggle writing the other cell in the pair. The bias fields on the free layers reduces the required switching field for each cell, which results in less write current and a lower-power toggling MRAM.
    Type: Grant
    Filed: May 26, 2005
    Date of Patent: November 18, 2008
    Assignee: Maglabs, Inc.
    Inventors: Kochan Ju, Jei-Wei Chang
  • Publication number: 20080213691
    Abstract: A write pole for vertical magnetic recording is described. It includes a trapezoidal prism of high magnetic moment material, having inwardly sloping sidewalls. Its parallel surfaces are between about 0.1 and 0.3 microns apart and the sidewalls slope in the range of 15.5 to 60 degrees relative to vertical.
    Type: Application
    Filed: April 10, 2008
    Publication date: September 4, 2008
    Inventors: Chao-Peng Chen, Jei-Wei Chang, Xiaohong Yang
  • Patent number: 7378226
    Abstract: A method for forming a big-layer lift-off mask for use in fabricating GMR read-head sensors with trackwidths of less than 0.1 microns. The mask layers are formed symmetrically on each other, each layer of the mask having a novel dog-bone shape and the lower mask layer being substantially undercut relative to the upper mask layer. The central portion of the lower mask layer forms a narrow ridge that maintains the upper mask layer at a fixed height above a substrate, thereby avoiding problems associated with big-layer lift-off masks of the prior art. The method of forming the lower ridge requires a carefully controlled undercutting of the lower mask layer, which is accomplished by using an ozone-assisted oxidation process.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: May 27, 2008
    Assignees: Headway Technologies, Inc., TDK Corporation
    Inventors: Chao-Peng Chen, Rina Kaji, Jei-Wei Chang
  • Patent number: 7368227
    Abstract: It is very difficult to produce a negative wall angle from either negative or positive-tone chemically amplified resists, especially by e-beam lithography. This problem has now been overcome by first forming a photoresist pedestal in the conventional way, followed by flood exposing with electrons. Then, a second development treatment is given. This results in removal of additional material from the sidewalls, said removal being greatest at the substrate and least at the pedestal's top surface, resulting in negatively sloping sidewalls. Application of this method to a process for forming a pole tip for a vertical magnetic writer is also discussed.
    Type: Grant
    Filed: October 27, 2006
    Date of Patent: May 6, 2008
    Assignee: Headway Technologies, Inc.
    Inventors: Chao-Peng Chen, Jei-Wei Chang, Xiaohong Yang
  • Publication number: 20080043378
    Abstract: We describe a family of magnetic read heads that each includes a GMR or MTJ stack. A part, no more than about 0.1 microns thick, has been removed from this stack a to form a pedestal having sidewalls comprising a vertical section that includes all of the free layer.
    Type: Application
    Filed: October 18, 2007
    Publication date: February 21, 2008
    Inventors: Stuart Kao, Chunping Luo, Chaopeng Chen, Takahiko Machita, Daisuke Miyauchi, Jei-Wei Chang
  • Patent number: 7320170
    Abstract: Using a beam of xenon ions together with a suitable mask, a GMR stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal, having sidewalls comprising a vertical section that includes all of the free layer, has been formed. This is followed by formation of the longitudinal bias and conductive lead layers in the usual way. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.
    Type: Grant
    Filed: April 20, 2004
    Date of Patent: January 22, 2008
    Assignees: Headway Technologies, Inc., TDK Corporation
    Inventors: Stuart Kao, Chunping Luo, Chaopeng Chen, Takahiko Machita, Daisuke Miyauchi, Jei-Wei Chang
  • Patent number: 7285836
    Abstract: A magnetic random access memory (MRAM) has memory stacks arranged in the X-Y plane on the MRAM substrate, with each memory stack having two memory cells stacked along the Z axis and each memory cell having an associated biasing layer. Each biasing layer reduces the switching field of its associated cell by applying a biasing field along the hard-axis of magnetization of the free layer of its associated cell. The free layers in the two cells in each stack have their in-plane easy axes of magnetization aligned parallel to one another. Each biasing layer has its in-plane magnetization direction oriented perpendicular to the easy axis of magnetization (and thus parallel to the hard axis) of the free layer in its associated cell. The hard-axis biasing fields generated by the two biasing layers are in opposite directions.
    Type: Grant
    Filed: March 9, 2005
    Date of Patent: October 23, 2007
    Assignee: Maglabs, Inc.
    Inventors: Kochan Ju, Jei-Wei Chang
  • Patent number: 7192662
    Abstract: A plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co100-a-bFeaMb, where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method that produces the alloy includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.
    Type: Grant
    Filed: August 2, 2004
    Date of Patent: March 20, 2007
    Assignee: Headway Technologies, Inc.
    Inventors: Chaopeng Chen, Kevin Lin, Jei Wei Chang