Patents by Inventor Jeong Yeol Moon

Jeong Yeol Moon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9213129
    Abstract: Disclosed is a brightness enhancing film, including a multilayered thin film wherein a plurality of first thin film layers which are optically anisotropic and a plurality of second thin film layers which are optically isotropic are alternately stacked, the multilayered thin film including a first wavelength reflection region which reflects a wavelength of 160˜451 nm, a second wavelength reflection region which reflects a wavelength of 451˜836 nm, and a third wavelength reflection region which reflects a wavelength of 836˜1040 nm, and a thickness of each of the first and second thin film layers in the first and second wavelength reflection regions is linearly increased from the short wavelength reflection side toward the long wavelength reflection side, and a thickness of each of the first and second thin film layers in the third wavelength reflection region is nonlinearly increased from the short wavelength reflection side toward the long wavelength reflection side.
    Type: Grant
    Filed: June 27, 2013
    Date of Patent: December 15, 2015
    Assignee: KOLON INDUSTRIES, INC.
    Inventors: A Reum Han, Jeong Yeol Moon
  • Publication number: 20150323717
    Abstract: Disclosed is a brightness enhancing film, including a multilayered thin film wherein a plurality of first thin film layers which are optically anisotropic and a plurality of second thin film layers which are optically isotropic are alternately stacked, the multilayered thin film including a first wavelength reflection region which reflects a wavelength of 160˜451 nm, a second wavelength reflection region which reflects a wavelength of 451˜836 nm, and a third wavelength reflection region which reflects a wavelength of 836˜1040 nm, and a thickness of each of the first and second thin film layers in the first and second wavelength reflection regions is linearly increased from the short wavelength reflection side toward the long wavelength reflection side, and a thickness of each of the first and second thin film layers in the third wavelength reflection region is nonlinearly increased from the short wavelength reflection side toward the long wavelength reflection side.
    Type: Application
    Filed: June 27, 2013
    Publication date: November 12, 2015
    Applicant: KOLON INDUSTRIES, INC
    Inventors: A REUM HAN, Jeong Yeol MOON
  • Patent number: 8899770
    Abstract: Disclosed is a luminance enhancement film which is suitable for use in a display and includes a multilayered thin film and a uniaxially drawn film formed on one surface of the multilayered thin film.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: December 2, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: A Reum Han, Dae Shik Kim, Deug Soo Ryu, Jeong Yeol Moon
  • Patent number: 8832929
    Abstract: A method of manufacturing a flexible printed circuit board including determining an elastic modulus of a conductive portion and an elastic modulus of first and second dielectric portions, determining a thickness of the conductive portion and the first and second dielectric portions so that a neutral plane is located within a predetermined range of the thickness of the conductive portion, the neutral plane being substantially free from tension or compression in response to bending of the flexible printed circuit board, and insulating the conductive portion according to the determined thickness and the determined elastic modulus.
    Type: Grant
    Filed: May 16, 2012
    Date of Patent: September 16, 2014
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Kyung Ho Lee, Se Min Oh, Chang Hwan Choi, Choon Keun Lee, Jeong Yeol Moon, Jong Rip Kim
  • Publication number: 20120314287
    Abstract: The present invention relates to a luminance-enhanced film used for displays. The present invention provides a luminance enhancement film including a multilayer thin film, which can ensure the reliability to external environmental changes, such as temperature change and the like, and a backlight unit including the luminance enhancement film.
    Type: Application
    Filed: December 29, 2011
    Publication date: December 13, 2012
    Applicant: KOLON INDUSTRIES, INC.
    Inventors: Jeong Yeol Moon, A Reum Han, Kyung Nam Kim, Deug Soo Ryu, Dae Shik Kim
  • Publication number: 20120314401
    Abstract: Disclosed is a luminance enhancement film which is suitable for use in a display and includes a multilayered thin film and a uniaxially drawn film formed on one surface of the multilayered thin film.
    Type: Application
    Filed: December 29, 2011
    Publication date: December 13, 2012
    Applicant: KOLON INDUSTRIES, INC.
    Inventors: A Reum Han, Dae Shik Kim, Deug Soo Ryu, Jeong Yeol Moon
  • Publication number: 20120291272
    Abstract: An FPCB and a method of manufacturing the same, in which an electrical signal-conductive portion of the FPCB is subjected to little stress so as not to be broken by fatigue in spite of repeated bending of the FPCB, thereby increasing the lifetime of the FPCB.
    Type: Application
    Filed: May 16, 2012
    Publication date: November 22, 2012
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Kyung Ho LEE, Se Min Oh, Chang Hwan Choi, Choon Keun Lee, Jeong Yeol Moon, Jong Rip Kim
  • Publication number: 20120227888
    Abstract: An FPCB and a method of manufacturing the same, in which an electrical signal-conductive portion of the FPCB is subjected to little stress so as not to be broken by fatigue in spite of repeated bending of the FPCB, thereby increasing the lifetime of the FPCB.
    Type: Application
    Filed: May 16, 2012
    Publication date: September 13, 2012
    Applicant: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Kyung Ho LEE, Se Min Oh, Chang Hwan Choi, Choon Keun Lee, Jeong Yeol Moon, Jong Rip Kim
  • Patent number: 8198542
    Abstract: An FPCB and a method of manufacturing the same, in which an electrical signal-conductive portion of the FPCB is subjected to little stress so as not to be broken by fatigue in spite of repeated bending of the FPCB, thereby increasing the lifetime of the FPCB.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: June 12, 2012
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Kyung Ho Lee, Se Min Oh, Chang Hwan Choi, Choon Keun Lee, Jeong Yeol Moon, Jong Rip Kim
  • Publication number: 20090151988
    Abstract: An FPCB and a method of manufacturing the same, in which an electrical signal-conductive portion of the FPCB is subjected to little stress so as not to be broken by fatigue in spite of repeated bending of the FPCB, thereby increasing the lifetime of the FPCB.
    Type: Application
    Filed: June 20, 2008
    Publication date: June 18, 2009
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Kyung Ho Lee, Se Min Oh, Chang Hwan Choi, Choon Keun Lee, Jeong Yeol Moon, Jong Rip Kim