Patents by Inventor Jeroen Johannes Mertens
Jeroen Johannes Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070268471Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: February 26, 2007Publication date: November 22, 2007Applicant: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Donders, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Mulkens, Roelof Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Helmar Santen
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Publication number: 20070159613Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.Type: ApplicationFiled: February 23, 2007Publication date: July 12, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20070132970Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: June 8, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Bijlaart, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Roelof Ritsema, Frank Van Schaik, Thimotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20070114452Abstract: Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: November 23, 2005Publication date: May 24, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Sebastiaan Cornelissen, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Hernes Jacobs, Martinus Leenders, Jeroen Johannes Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Janssen, Michel Riepen, Bob Streefkerk
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Publication number: 20070114451Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: November 22, 2006Publication date: May 24, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Sebastiaan Maria Cornelissen, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Hernes Jacobs, Martinus Hendrikus Leenders, Jeroen Johannes Mertens, Bob Streefkerk, Jan-Gerard Van Der Toorn, Peter Smits, Franciscus Johannes Janssen, Michel Riepen
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Publication number: 20070013886Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular. to an exposure plane of the substrate.Type: ApplicationFiled: September 21, 2006Publication date: January 18, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Mulkens, Bob Streefkerk
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Publication number: 20060290908Abstract: A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.Type: ApplicationFiled: June 28, 2005Publication date: December 28, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Roelof De Graaf, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Martinus Hendrikus Leenders, Jeroen Johannes Mertens, Bob Streefkerk, Jan-Gerard Van Der Toorn, Michel Riepen
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Publication number: 20060250590Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: ApplicationFiled: May 3, 2005Publication date: November 9, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Donders, Roelof De Graaf, Christiaan Hoogendam, Martinus Leenders, Jeroen Johannes Mertens, Michel Riepen
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Publication number: 20060250601Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.Type: ApplicationFiled: May 3, 2005Publication date: November 9, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Hans Jansen, Martinus Hendrikus Leenders, Paulus Martinus Liebregts, Jeroen Johannes Mertens, Jan-Gerard Van Der Toorn, Michel Riepen
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Publication number: 20060147821Abstract: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.Type: ApplicationFiled: December 30, 2004Publication date: July 6, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Baselmans, Sjoerd Donders, Jeroen Johannes Mertens, Johannes Mulkens, Christiaan Hoogendam
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Publication number: 20060132731Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.Type: ApplicationFiled: December 20, 2004Publication date: June 22, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Mulkens, Marco Stavenga, Bob Streefkerk, Jan Cornelis Hoeven, Cedric Grouwstra
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Publication number: 20060119816Abstract: The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.Type: ApplicationFiled: December 7, 2004Publication date: June 8, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Jacobus Baselmans, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20060119807Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.Type: ApplicationFiled: December 2, 2004Publication date: June 8, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20060102849Abstract: An apparatus including a support table for supporting a substrate is disclosed. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.Type: ApplicationFiled: October 22, 2004Publication date: May 18, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Mertens, Aschwin Lodewijk Hendricus Van Meer, Joost Ottens, Edwin Gompel
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Publication number: 20060087637Abstract: A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.Type: ApplicationFiled: October 26, 2004Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Joost Ottens, Jeroen Johannes Mertens, Frederik De Jong, Koen Goorman, Boris Menchtchikov, Edwin Van Gompel
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Publication number: 20060082746Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: ApplicationFiled: October 18, 2004Publication date: April 20, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Mertens, Sjoerd Nicolaas Donders, Roelof De Graaf, Christiaan Hoogendam, Antonius Van Der Net, Franciscus Johannes Teunissen, Patricius Aloysius Tinnemans, Martinus Cornelis Verhagen, Jacobus Johannus Leonardus Verspay, Edwin Van Gompel
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Publication number: 20060033892Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.Type: ApplicationFiled: August 13, 2004Publication date: February 16, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Cadee, Joost Ottens, Jeroen Johannes Mertens, Frederick De Jong, Koen Goorman, Boris Menchtchikov, Marco Stavenga, Martin Smeets, Aschwin Lodewijk Van Meer, Bart Schoondermark, Patricius Tinnemans, Stoyan Nihtianov
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Publication number: 20060017893Abstract: In an immersion-type lithographic apparatus, in which a surface of a substrate is immersed in liquid during an exposure operation, the substrate is held against a substrate table. On completion of the exposure operation, the substrate is lifted clear of the substrate table. In order to overcome a tendency caused by a film of residual liquid to cause the substrate to stick to the substrate table, pins used to lift the substrate are arranged and operated so that, at least initially, force is applied to the substrate at a location offset from its central axis.Type: ApplicationFiled: July 22, 2004Publication date: January 26, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Mertens, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Bob Streefkerk
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Publication number: 20060007419Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.Type: ApplicationFiled: July 7, 2004Publication date: January 12, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Baselmans, Sjoerd Donders, Christiaan Hoogendam, Jeroen Johannes Mertens, Johannes Catharinus Mulkens
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Publication number: 20050286032Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.Type: ApplicationFiled: June 23, 2004Publication date: December 29, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Johannes Catharinus Mulkens, Jeroen Johannes Mertens, Antonius Van Der Net, Ronald Van Der Ham, Nicolas Lallemant, Marcel Beckers