Patents by Inventor Jeroen Johannes Sophia Mertens
Jeroen Johannes Sophia Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8638419Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.Type: GrantFiled: January 7, 2011Date of Patent: January 28, 2014Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Mertens, Johannes Catharinus Hubertus Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
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Publication number: 20120086928Abstract: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.Type: ApplicationFiled: December 20, 2011Publication date: April 12, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia MERTENS, Johannes Catharinus Hubertus MULKENS, Bob STREEFKERK
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Patent number: 8102507Abstract: A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.Type: GrantFiled: January 27, 2010Date of Patent: January 24, 2012Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Jeroen Johannes Sophia Mertens, Johannes Catharinus Hubertus Mulkens, Christiaan Alexander Hoogendam
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Patent number: 7670730Abstract: A method for correcting an exposure parameter of an immersion lithographic apparatus is provided. In the method, an exposure parameter is measured using a measuring beam projected through a liquid between the projection system and a substrate table of the immersion lithographic apparatus and offset is determined based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter. Also, there is provided an apparatus and method to measure a height of an optical element connected to liquid between the projection system and the substrate table in the immersion lithographic apparatus.Type: GrantFiled: December 12, 2005Date of Patent: March 2, 2010Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Jeroen Johannes Sophia Mertens, Johannes Catharinus Hubertus Mulkens, Christiaan Alexander Hoogendam
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Publication number: 20090033905Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: ApplicationFiled: October 1, 2008Publication date: February 5, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Mertens, Koen Jacobus Johannes Zaal, Minne Cuperus
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Publication number: 20060038968Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 19, 2004Publication date: February 23, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Kemper, Henrikus Marie Cox, Sjoerd Nicolaas Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Kate, Jeroen Johannes Sophia Mertens, Frits Der Meulen, Franciscus Herman Maria Teunissen, Jan-Gerard Van Der Toorn, Martinus Cornelis Verhagen, Stefan Belfroid, Johannes Smeulers
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Publication number: 20050263068Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.Type: ApplicationFiled: October 18, 2004Publication date: December 1, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Hoogendam, Bob Streefkerk, Johannes Catharinus Mulkens, Erik Theodorus Bijlaart, Aleksey Kolesnychenko, Erik Loopstra, Jeroen Johannes Sophia Mertens, Bernardus Slaghekke, Patricius Aloysius Tinnemans, Helmar Van Santen
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Publication number: 20050259233Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: ApplicationFiled: May 21, 2004Publication date: November 24, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Henrikus Herman Cox, Christiaan Hoogendam, Jeroen Johannes Sophia Mertens, Koen Jacobus Johannes Zaal, Minne Cuperus
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Publication number: 20050243292Abstract: A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.Type: ApplicationFiled: May 3, 2004Publication date: November 3, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Jacobus Baselmans, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Jeroen Johannes Sophia Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20050219483Abstract: An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.Type: ApplicationFiled: March 30, 2005Publication date: October 6, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Baselmans, Sjoerd Nicolaas Donders, Christiaan Hoogendam, Hans Jansen, Jeroen Johannes Sophia Mertens, Johannes Catharinus Mulkens, Bob Streefkerk
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Publication number: 20050048220Abstract: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.Type: ApplicationFiled: July 28, 2004Publication date: March 3, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Mertens, Christiaan Hoogendam, Hans Jansen, Patricius Aloysius Tinnemans, Leon Van Den Schoor, Sjoerd Donders, Bob Streefkerk