Patents by Inventor Jeroen Stoutjesdijk
Jeroen Stoutjesdijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9551069Abstract: A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.Type: GrantFiled: October 19, 2011Date of Patent: January 24, 2017Assignee: ASM AMERICA, INC.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Patent number: 8927435Abstract: A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.Type: GrantFiled: May 8, 2013Date of Patent: January 6, 2015Assignee: ASM America, Inc.Inventors: Ravinder K. Aggarwal, Jeroen Stoutjesdijk, Eric R. Hill, Loring G. Davis, John T. DiSanto
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Publication number: 20130239879Abstract: A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.Type: ApplicationFiled: May 8, 2013Publication date: September 19, 2013Applicant: ASM AMERICA, INC.Inventors: Ravinder K. Aggarwal, Jeroen Stoutjesdijk, Eric R. Hill, Loring G. Davis, John T. DiSanto
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Patent number: 8440048Abstract: A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.Type: GrantFiled: January 27, 2010Date of Patent: May 14, 2013Assignee: ASM America, Inc.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk, Eric Hill, Loring G. Davis, John T. DiSanto
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Publication number: 20120031340Abstract: A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.Type: ApplicationFiled: October 19, 2011Publication date: February 9, 2012Applicant: ASM AMERICA, INC.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Patent number: 8067061Abstract: A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.Type: GrantFiled: October 25, 2007Date of Patent: November 29, 2011Assignee: ASM America, Inc.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Publication number: 20100190343Abstract: A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.Type: ApplicationFiled: January 27, 2010Publication date: July 29, 2010Applicant: ASM AMERICA, INC.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk, Eric Hill, Loring G. Davis, John T. DiSanto
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Patent number: 7725012Abstract: A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.Type: GrantFiled: January 19, 2007Date of Patent: May 25, 2010Assignee: ASM America, Inc.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Patent number: 7585142Abstract: An apparatus for processing substrates may include a substrate handling chamber having a substrate load port on a side wall, and a movable platform movably engaged with the handling chamber between a first position and a second position. The first position is such that a substrate carrier on the movable platform is inaccessible by a substrate handling robot inside the chamber. The second position is near to the load port such that a substrate carrier on the movable platform is accessible by a substrate handling robot inside the handling chamber. The movable platform is configured to rotate about a generally vertical axis between the first and second positions.Type: GrantFiled: March 16, 2007Date of Patent: September 8, 2009Assignee: ASM America, Inc.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Publication number: 20090110826Abstract: A reaction apparatus for a semiconductor fabrication apparatus, wherein the reaction apparatus includes at least two adjustable outlet ports for withdrawing reactant gases from the reaction chamber. Adjustment of the flow rate through each of the outlet ports selectively modifies the flow pattern of the reactant gases within the reaction chamber to maintain a desired flow pattern therewithin, such as a substantially uniform flow over the surface of a substrate being processed, and/or minimization of turbulence within the reactor.Type: ApplicationFiled: October 25, 2007Publication date: April 30, 2009Applicant: ASM AMERICA, INC.Inventors: RAVINDER AGGARWAL, JEROEN STOUTJESDIJK
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Publication number: 20090101633Abstract: An arrangement of short linear heat lamps is provided which allows for localized control of temperature nonuniformities in a substrate during semiconductor processing. A reactor includes a substrate holder positioned between a top bank and a bottom bank of linear heat lamps. Alternatively, only one such bank may be provided. At least one of the banks includes lamps of a plurality of different lengths, at least some of the lengths being shorter than a diameter of the substrate holder. In some configurations, the lamps in a bank are disposed substantially parallel to each other in a repeating pattern. In some other configurations, the lamps in a bank are disposed in a radial direction with respect to a vertical axis of the substrate holder. Power output of the short lamps can be adjusted individually or in groups to provide localized control of temperature of the substrate.Type: ApplicationFiled: October 19, 2007Publication date: April 23, 2009Applicant: ASM AMERICA, INC.Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk, Paul Jacobson
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Publication number: 20080226428Abstract: An apparatus for processing substrates may include a substrate handling chamber having a substrate load port on a side wall, and a movable platform movably engaged with the handling chamber between a first position and a second position. The first position is such that a substrate carrier on the movable platform is inaccessible by a substrate handling robot inside the chamber. The second position is near to the load port such that a substrate carrier on the movable platform is accessible by a substrate handling robot inside the handling chamber. The movable platform is configured to rotate about a generally vertical axis between the first and second positions.Type: ApplicationFiled: March 16, 2007Publication date: September 18, 2008Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Publication number: 20080175571Abstract: A semiconductor processing apparatus including a processing chamber and a plurality of radiant heat sources. The radiant heat sources heat a workpiece within the chamber. At least one of the radiant heat sources is movable during processing in an oscillatory motion along a path less than about 10 mm from a geometric center of the oscillatory motion.Type: ApplicationFiled: January 19, 2007Publication date: July 24, 2008Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk
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Publication number: 20070207625Abstract: An improved exhaust conductance system for a semiconductor process apparatus includes at least two parallel exhaust paths and a valve apparatus for controlling flow to the exhaust paths. The valve apparatus prevents the flow of process gases through one or more of the exhaust paths but simultaneously allows the flow of process gases through at least one other exhaust path. The inactive exhaust paths can be purged or cleaned without resulting in processing downtime to the system.Type: ApplicationFiled: March 6, 2006Publication date: September 6, 2007Inventors: Ravinder Aggarwal, Jeroen Stoutjesdijk