Patents by Inventor Ji-hyeon Choi

Ji-hyeon Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10237876
    Abstract: Embodiments of the present disclosure provide terminal connection control method and apparatus in a base station of a mobile communication system which supports a Carrier Aggregation (CA) function.
    Type: Grant
    Filed: December 19, 2014
    Date of Patent: March 19, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-Ryul Jeon, Ki-Back Kim, Han-Seok Kim, Hyun-Ho Im, Ji-Hyeon Choi
  • Patent number: 9831543
    Abstract: An adaptable antenna apparatus for a base station is provided. The adaptable antenna apparatus includes a first antenna having a first antenna array, a second antenna rotatably coupled to the first antenna and having a second antenna array, and a main controller provided in one of the first antenna and the second antenna, wherein the main controller is configured to apply a control signal to the first antenna and the second antenna.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: November 28, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyeon Choi, Han-Seok Kim, Kyu-II Yeon, Byung-Tae Yoon, Jun-Sung Lee, Nam-Ryul Jeon
  • Publication number: 20170137164
    Abstract: A disposable paper container comprises a bottom part and a side part erectly extending from the bottom part, and together with the bottom part, forming a space for accommodating or storing an object. The side part includes a first sub-side part, a second sub-side part, a third sub-side part facing the first sub-side part, a fourth sub-side part facing the second sub-side part, a first connecting sub-side part connecting the first sub-side part with the second sub-side part, a second connecting sub-side part connecting the second sub-side part with the third sub-side part, a third connecting sub-side part connecting the third sub-side part with the fourth sub-side part, and a fourth connecting sub-side part connecting the fourth sub-side part with the first sub-side part, wherein the bottom part and the side part are formed of a piece of paper.
    Type: Application
    Filed: November 14, 2016
    Publication date: May 18, 2017
    Inventor: Ji Hyeon CHOI
  • Patent number: 9565617
    Abstract: A method and apparatus for configuring a routing path in a wireless communication system are provided. The method includes measuring a first distance between the terminal and a target terminal, transmitting information of the measured first distance to at least one neighboring terminal, receiving a second distance measured for the target terminal with respect to the terminal from the at least one neighboring terminal, and determining a neighboring terminal of which the second distance is the longest as a next terminal of the routing path.
    Type: Grant
    Filed: November 5, 2013
    Date of Patent: February 7, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyeon Choi, Kyu-II Yeon, Han-Seok Kim, Jun-Sung Lee
  • Publication number: 20160323889
    Abstract: Embodiments of the present disclosure provide terminal connection control method and apparatus in a base station of a mobile communication system which supports a Carrier Aggregation (CA) function.
    Type: Application
    Filed: December 19, 2014
    Publication date: November 3, 2016
    Inventors: Nam-Ryul JEON, Ki-Back KIM, Han-Seok KIM, Hyun-Ho IM, Ji-Hyeon CHOI
  • Patent number: 9148340
    Abstract: An apparatus and a method for configuring a network in a terminal of a wireless communication system are provided. The network configuring method includes sending a reference message in a communication radius of the terminal; when receiving at least one ACKnowledge (ACK) message for the reference message, checking a node degree of each adjacent terminal which sends the ACK message, the node degree indicating the number of neighboring terminals of each adjacent terminal; forming an inner region and an outer region of the terminal based on an adjacent terminal of the greatest node degree among the adjacent terminals; determining a transmit power in the inner region and a transmit power in the outer region; and determining a final transmit power for configuring a network using the transmit power of the inner region and the transmit power of the outer region.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 29, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyeon Choi, Sun-Wook Kim, Seong-Yong Park, Jun-Sung Lee
  • Publication number: 20150222013
    Abstract: An adaptable antenna apparatus for a base station is provided. The adaptable antenna apparatus includes a first antenna having a first antenna array, a second antenna rotatably coupled to the first antenna and having a second antenna array, and a main controller provided in one of the first antenna and the second antenna, wherein the main controller is configured to apply a control signal to the first antenna and the second antenna.
    Type: Application
    Filed: February 3, 2015
    Publication date: August 6, 2015
    Inventors: Ji-Hyeon CHOI, Han-Seok KIM, Kyu-Il YEON, Byung-Tae YOON, Jun-Sung LEE, Nam-Ryul JEON
  • Patent number: 8986087
    Abstract: A structure is provided for protecting a Radio Frequency Remote Head (RRH). The structure includes a solar head and a solar body. An upper side of the solar head is sloped to prevent an inflow of rainwater and has at least one solar panel, and a lower side thereof has at least one round cable hole surrounded by a rubber material. The solar body is situated on a lower end of the solar head and includes a plurality of solar panels, a side of each of which is sloped to prevent an inflow of rainwater and is openable upward. An upper end of the solar body has an air outlet formed to exhaust air, and a lower end thereof has an air inlet formed to receive air. The air outlet and the air inlet each have a plurality of supports arranged at specific intervals and connected by a protection net.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: March 24, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyeon Choi, Seong-Yong Park, Han-Seok Kim, Jun-Sung Lee
  • Publication number: 20140133311
    Abstract: A method and apparatus for configuring a routing path in a wireless communication system are provided. The method includes measuring a first distance between the terminal and a target terminal, transmitting information of the measured first distance to at least one neighboring terminal, receiving a second distance measured for the target terminal with respect to the terminal from the at least one neighboring terminal, and determining a neighboring terminal of which the second distance is the longest as a next terminal of the routing path.
    Type: Application
    Filed: November 5, 2013
    Publication date: May 15, 2014
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ji-Hyeon CHOI, Kyu-Il YEON, Han-Seok KIM, Jun-Sung LEE
  • Publication number: 20130250814
    Abstract: An apparatus and a method for configuring a network in a terminal of a wireless communication system are provided. The network configuring method includes sending a reference message in a communication radius of the terminal; when receiving at least one ACKnowledge (ACK) message for the reference message, checking a node degree of each adjacent terminal which sends the ACK message, the node degree indicating the number of neighboring terminals of each adjacent terminal; forming an inner region and an outer region of the terminal based on an adjacent terminal of the greatest node degree among the adjacent terminals; determining a transmit power in the inner region and a transmit power in the outer region; and determining a final transmit power for configuring a network using the transmit power of the inner region and the transmit power of the outer region.
    Type: Application
    Filed: November 30, 2011
    Publication date: September 26, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-Hyeon Choi, Sun-Wook Kim, Seong-Yong Park, Jun-Sung Lee
  • Publication number: 20120196522
    Abstract: A structure is provided for protecting a Radio Frequency Remote Head (RRH). The structure includes a solar head and a solar body. An upper side of the solar head is sloped to prevent an inflow of rainwater and has at least one solar panel, and a lower side thereof has at least one round cable hole surrounded by a rubber material. The solar body is situated on a lower end of the solar head and includes a plurality of solar panels, a side of each of which is sloped to prevent an inflow of rainwater and is openable upward. An upper end of the solar body has an air outlet formed to exhaust air, and a lower end thereof has an air inlet formed to receive air. The air outlet and the air inlet each have a plurality of supports arranged at specific intervals and connected by a protection net.
    Type: Application
    Filed: October 6, 2010
    Publication date: August 2, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-Hyeon Choi, Seong-Yong Park, Han-Seok Kim, Jun-Sung Lee
  • Patent number: 7185312
    Abstract: A method for correcting line width variation occurring during a development process in fabricating a photomask and a recording medium in which the exposure method is recorded is provided, wherein pattern line width variation occurring in a development process with respect to a desirable pattern is estimated, and a corrective exposure is performed using a dose or bias of an electron beam corresponding to the estimated pattern line width variation. Accordingly, pattern line width variation occurring during a development process can be reduced.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: February 27, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-tai Ki, Seung-hune Yang, Ji-hyeon Choi
  • Publication number: 20040229138
    Abstract: A method for correcting line width variation occurring during a development process in fabricating a photomask and a recording medium in which the exposure method is recorded is provided, wherein pattern line width variation occurring in a development process with respect to a desirable pattern is estimated, and a corrective exposure is performed using a dose or bias of an electron beam corresponding to the estimated pattern line width variation. Accordingly, pattern line width variation occurring during a development process can be reduced.
    Type: Application
    Filed: June 23, 2004
    Publication date: November 18, 2004
    Inventors: Won-tai Ki, Seung-hune Yang, Ji-hyeon Choi
  • Patent number: 6786212
    Abstract: The present invention includes a method for preventing a reverse rotation of an engine. In connection with starting an engine, when an operation of a starter motor stops while a predetermined monitoring condition for a reverse rotation is satisfied, it is determined whether a reverse rotation of the engine is occurring, and then at least one of fuel injection and ignition of the engine is stopped for a certain period if it is determined that the engine undergoes reverse rotation.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: September 7, 2004
    Assignee: Hyundai Motor Company
    Inventor: Ji Hyeon Choi
  • Patent number: 6775815
    Abstract: A method for correcting line width variation occurring during a development process in fabricating a photomask and a recording medium in which the exposure method is recorded is provided, wherein pattern line width variation occurring in a development process with respect to a desirable pattern is estimated, and a corrective exposure is performed using a dose or bias of an electron beam corresponding to the estimated pattern line width variation. Accordingly, pattern line width variation occurring during a development process can be reduced.
    Type: Grant
    Filed: August 22, 2002
    Date of Patent: August 10, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-tai Ki, Seung-hune Yang, Ji-hyeon Choi
  • Publication number: 20030061595
    Abstract: A method for correcting line width variation occurring during a development process in fabricating a photomask and a recording medium in which the exposure method is recorded is provided, wherein pattern line width variation occurring in a development process with respect to a desirable pattern is estimated, and a corrective exposure is performed using a dose or bias of an electron beam corresponding to the estimated pattern line width variation. Accordingly, pattern line width variation occurring during a development process can be reduced.
    Type: Application
    Filed: August 22, 2002
    Publication date: March 27, 2003
    Inventors: Won-tai Ki, Seung-hune Yang, Ji-hyeon Choi
  • Patent number: 6291119
    Abstract: The present invention relates to electron beam lithography, and is directed to a method of compensating for pattern dimension variation caused by a re-scattered electron beam when an electron beam resist is exposed to the electron beam. The method of compensating for pattern dimension variation caused by a re-scattered electron beam comprises the steps of: dividing original exposure pattens into square sections; obtaining a dose of supplemental exposure to the re-scattered electron beam; and compensation-exposing the electron beam resist so that the supplemental exposure dose may be the same for all sections. According to the present invention, the pattern dimension variation can be compensated for a re-scattering effect of the electron beam, thereby uniformly forming a fine pattern width of a more highly-integrated circuit.
    Type: Grant
    Filed: January 11, 2001
    Date of Patent: September 18, 2001
    Assignee: Samsung Electronics, Co., Ltd.
    Inventors: Ji-hyeon Choi, Won-tai Ki
  • Publication number: 20010016295
    Abstract: The present invention relates to electron beam lithography, and is directed to a method of compensating for pattern dimension variation caused by a re-scattered electron beam when an electron beam resist is exposed to the electron beam. The method of compensating for pattern dimension variation caused by a re-scattered electron beam comprises the steps of: dividing original exposure pattens into square sections; obtaining a dose of supplemental exposure to the re-scattered electron beam; and compensation-exposing the electron beam resist so that the supplemental exposure dose may be the same for all sections. According to the present invention, the pattern dimension variation can be compensated for a re-scattering effect of the electron beam, thereby uniformly forming a fine pattern width of a more highly-integrated circuit.
    Type: Application
    Filed: January 11, 2001
    Publication date: August 23, 2001
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Ji-hyeon Choi, Won-tai Ki