Patents by Inventor Jimmy Matheus Wilhelmus Van De Winkel
Jimmy Matheus Wilhelmus Van De Winkel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11269259Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: GrantFiled: November 19, 2020Date of Patent: March 8, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Publication number: 20210263418Abstract: A tool for modifying substrate support elements of a substrate holder, the substrate support elements having support surfaces for supporting a substrate, the tool includes a main body having a main body surface, and multiple protrusions from the main body surface, the multiple protrusions having distal ends configured to contact the support surfaces to modify the substrate support elements. Furthermore, a lithographic apparatus and a method comprising such a tool are provided.Type: ApplicationFiled: June 27, 2019Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bert Dirk SCHOLTEN, Peter Andreas Maria BILLEKENS, Tiannan GUAN, Tjarco LINDEIJER, Harold Anton MEHAGNOUL, Jimmy Matheus Wilhelmus VAN DE WINKEL, Cas Johannes Petrus Maria VAN NUENEN, Hendrikus Theodorus Jacobus Franciscus VAN VERSEVELD, Marcus Martinus Petrus Adrianus VERMEULEN
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Patent number: 11016401Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: GrantFiled: May 1, 2018Date of Patent: May 25, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
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Publication number: 20210072649Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: ApplicationFiled: November 19, 2020Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis M Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Publication number: 20210053177Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.Type: ApplicationFiled: January 24, 2019Publication date: February 25, 2021Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
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Patent number: 10871715Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: GrantFiled: November 21, 2019Date of Patent: December 22, 2020Assignee: ASML Netherlands B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Patent number: 10725390Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: January 16, 2019Date of Patent: July 28, 2020Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Publication number: 20200183289Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: ApplicationFiled: November 21, 2019Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Thomas POIESZ, Bert Dirk SCHOLTEN, Dirk Willem HARBERTS, Lucas Henricus Johannes STEVENS, Laura Maria FERNANDEZ DIAZ, Johannes Adrianus Cornelis Maria PIJNENBURG, Abraham Alexander SOETHOUDT, Wilhelmus Jacobus Johannes WELTERS, Jimmy Matheus Wilhelmus VAN DE WINKEL
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Publication number: 20200073262Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: ApplicationFiled: May 1, 2018Publication date: March 5, 2020Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
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Publication number: 20190146352Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: ApplicationFiled: January 16, 2019Publication date: May 16, 2019Applicant: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10222707Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: GrantFiled: February 25, 2016Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Theodorus Wilhelmus Polet, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Patent number: 10216100Abstract: An inspection substrate for inspecting a component, such as a liquid confinement system, of an apparatus for processing production substrates is discussed. The inspection substrate includes a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus, an illumination device, such as light emitting diodes, embedded in the body, a sensor, such as an imaging device or a pressure sensor, that is embedded in the body and configured to generate inspection information, such as image data, relating to a parameter of the component of the apparatus proximate to the inspection substrate, and a storage device embedded in the body and configured to store the inspection information.Type: GrantFiled: June 16, 2016Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Seerwan Saeed, Petrus Martinus Gerardus Johannes Arts, Harold Sebastiaan Buddenberg, Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Floor Lodewijk Keukens, Ferdy Migchelbrink, Jeroen Arnoldus Leonardus Johannes Raaymakers, Arnoldus Johannes Martinus Jozeph Ras, Gheorghe Tanasa, Jimmy Matheus Wilhelmus Van De Winkel, Daan Daniel Johannes Antonius Van Sommeren, Marijn Wouters, Miao Yu
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Patent number: 10175585Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: GrantFiled: August 29, 2014Date of Patent: January 8, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
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Publication number: 20180181004Abstract: An inspection substrate for inspecting a component, e.g. a liquid confinement system, of an apparatus for processing production substrates, e.g. a lithographic apparatus, the inspection substrate comprising: a body having dimensions similar to a production substrate so that the inspection substrate is compatible with the apparatus; an illumination device, e.g. light emitting diodes, embedded in the body; a sensor, e.g. an imaging device or a pressure sensor, for generating inspection information relating to a parameter of a component of the apparatus proximate to the inspection substrate, the sensor embedded in the body; and a storage device embedded in the body, the storage device configured to store the inspection information, e.g. image data.Type: ApplicationFiled: June 16, 2016Publication date: June 28, 2018Applicant: ASML Netherlands B.V.Inventors: Seerwan SAEED, Petrus Martinus Gerardus Johannes ARTS, Harold Sebastiaan BUDDENBERG, Erik Henricus Egidius Catharina EUMMELEN, Giovanni Luca GATTOBIGIO, Floor Lodewijk KEUKENS, Ferdy MIGCHELBRINK, Jeroen Arnoldus Leonardus Johanne RAAYMAKERS, Arnoldus Johannes Martinus Jozeph RAS, Gheorghe TANASA, Jimmy Matheus Wilhelmus VAN DE WINKEL, Daan Daniel Johannes Antonius VAN SOMMEREN, Marijn WOUTERS, Miao YU
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Publication number: 20160179015Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: ApplicationFiled: February 25, 2016Publication date: June 23, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus POLET, Henrikus Herman Marie COX, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Jimmy Matheus Wilhelmus VAN DE WINKEL, Gregory Martin Mason CORCORAN, Frank Johannes Jacobus VAN BOXTEL
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Patent number: 9291914Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.Type: GrantFiled: August 29, 2014Date of Patent: March 22, 2016Assignee: ASML NETHERLANDS B.V.Inventors: David Bessems, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van Der Zanden, Cornelius Maria Rops, Paul Willems, Jimmy Matheus Wilhelmus Van De Winkel, Erik Henricus Egidius Catharina Eummelen
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Patent number: 9274436Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.Type: GrantFiled: December 4, 2012Date of Patent: March 1, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus Polet, Henrikus Herman Marie Cox, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Jimmy Matheus Wilhelmus Van De Winkel, Gregory Martin Mason Corcoran, Frank Johannes Jacobus Van Boxtel
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Patent number: 9213246Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.Type: GrantFiled: February 12, 2014Date of Patent: December 15, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
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Publication number: 20150055102Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: ApplicationFiled: August 29, 2014Publication date: February 26, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Robert Douglas WATSO, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
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Publication number: 20150055103Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.Type: ApplicationFiled: August 29, 2014Publication date: February 26, 2015Applicant: ASML NETHERLANDS B.V.Inventors: David BESSEMS, Rogier Hendrikus Magdalena Cortie, Marcus Johannes Van der Zanden, Cornelius Maria Rops, Paul Willems, Jimmy Matheus Wilhelmus Van de Winkel, Erik Henricus Egidius Catharina Eummelen