Patents by Inventor Jin-Ho Jeon
Jin-Ho Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240125002Abstract: Disclosed is a method for controlling the supply of solid silicon to a preliminary crucible of an ingot growth apparatus for maintaining a constant amount of molten silicon in the preliminary crucible by measuring the height of the molten silicon in the preliminary crucible.Type: ApplicationFiled: June 17, 2022Publication date: April 18, 2024Applicant: HANWHA SOLUTIONS CORPORATIONInventors: Jin Sung PARK, Keun Ho KIM, Young Min LEE, Han Woong JEON
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Patent number: 11932618Abstract: Disclosed are novel compounds of Chemical Formula 1, optical isomers of the compounds, and pharmaceutically acceptable salts of the compounds or the optical isomers. The compounds, isomers, and salts exhibit excellent activity as GLP-1 receptor agonists. In particular, they, as GLP-1 receptor agonists, exhibit excellent glucose tolerance, thus having a great potential to be used as therapeutic agents for metabolic diseases. Moreover, they exhibit excellent pharmacological safety for cardiovascular systems.Type: GrantFiled: March 13, 2023Date of Patent: March 19, 2024Assignee: ILDONG PHARMACEUTICAL CO., LTD.Inventors: Hong Chul Yoon, Kyung Mi An, Myong Jae Lee, Jin Hee Lee, Jeong-geun Kim, A-rang Im, Woo Jin Jeon, Jin Ah Jeong, Jaeho Heo, Changhee Hong, Kyeojin Kim, Jung-Eun Park, Te-ik Sohn, Changmok Oh, Da Hae Hong, Sung Wook Kwon, Jung Ho Kim, Jae Eui Shin, Yeongran Yoo, Min Whan Chang, Eun Hye Jang, In-gyu Je, Ji Hye Choi, Gunhee Kim, Yearin Jun
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Publication number: 20240073416Abstract: The present invention relates to an apparatus and method for encoding and decoding an image by skip encoding. The image-encoding method by skip encoding, which performs intra-prediction, comprises: performing a filtering operation on the signal which is reconstructed prior to an encoding object signal in an encoding object image; using the filtered reconstructed signal to generate a prediction signal for the encoding object signal; setting the generated prediction signal as a reconstruction signal for the encoding object signal; and not encoding the residual signal which can be generated on the basis of the difference between the encoding object signal and the prediction signal, thereby performing skip encoding on the encoding object signal.Type: ApplicationFiled: November 6, 2023Publication date: February 29, 2024Applicants: Electronics and Telecommunications Research Institute, Kwangwoon University Industry-Academic Collaboration Foundation, Universily-lndustry Cooperation Group of Kyung Hee UniversityInventors: Sung Chang LIM, Ha Hyun LEE, Se Yoon JEONG, Hui Yong KIM, Suk Hee CHO, Jong Ho KIM, Jin Ho LEE, Jin Soo CHOI, Jin Woong KIM, Chie Teuk AHN, Dong Gyu SIM, Seoung Jun OH, Gwang Hoon PARK, Sea Nae PARK, Chan Woong JEON
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Publication number: 20230081962Abstract: Various embodiments generally relate to a method for forming a graphene barrier layer for a semiconductor device, and more particularly, to a method of forming a barrier thin film including a graphene layer capable of reducing the contact resistance of a metal interconnect. A method for forming a graphene barrier layer according to an embodiment includes: loading a substrate, which has a titanium-containing layer formed thereon, in a chamber of a substrate processing system, the chamber having a processing space formed therein; inducing nucleation on the titanium-containing layer by supplying a first reactant gas including a unsaturated hydrocarbon into the chamber; and forming a graphene layer on the titanium-containing layer by supplying a second reactant gas including a saturated hydrocarbon into the chamber.Type: ApplicationFiled: August 30, 2022Publication date: March 16, 2023Applicant: WONIK IPS CO., LTD.Inventors: Hong Ki PARK, Jin Ho JEON, Won Jun YOON, Tae Sung KIM, Woo Hoon SUN, Dong Woo KIM, Keon Jung LEE, Jee Hye PARK
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Publication number: 20220188868Abstract: The present disclosure proposes a device for executing an advertisement service and a method for operating the same, for providing a targeted advertisement according to an advertisement execution condition determined for a terminal on the basis of scanning data obtained by scanning wireless local area networks (WLANs) (for example, Wi-Fi) in an addressable TV advertisement environment. The present disclosure also proposes a device for executing an advertisement service for providing a targeted advertisement for a combination of member terminals and visitor terminals located within a home in an addressable TV advertisement environment.Type: ApplicationFiled: December 10, 2021Publication date: June 16, 2022Inventor: Jin Ho JEON
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Patent number: 11183184Abstract: A method of configuring a laundry course based on speech recognition using artificial intelligence and a device for implementing the same. A washing machine of configuring the laundry course based on the speech recognition includes a speech input unit that receives a speech included with a StainWord or a ClothWord to produce speech data, a communication unit that transmits identification information of speech data and a washing machine to a server and receive course configuring information corresponding to the StainWord or the ClothWord from the server, and a speech guidance unit that outputs a speech guide message that guides a laundry course corresponding to course configuring information, and a control unit that controls a speech input unit, a communication unit, and a speech guidance unit.Type: GrantFiled: December 21, 2018Date of Patent: November 23, 2021Assignee: LG Electronics Inc.Inventors: Heungkyu Lee, Junhee An, Jin Ho Jeon, Jae Yong Won
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Patent number: 10694340Abstract: Disclosed are an apparatus for producing a radio map and a method of operating the same for selecting valid sensing data related to a specific offline store and constructing (producing) a fingerprint radio map of the corresponding offline store.Type: GrantFiled: August 29, 2019Date of Patent: June 23, 2020Assignee: SK Planet Co., Ltd.Inventor: Jin Ho Jeon
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Publication number: 20200077234Abstract: Disclosed are an apparatus for producing a radio map and a method of operating the same for selecting valid sensing data related to a specific offline store and constructing (producing) a fingerprint radio map of the corresponding offline store.Type: ApplicationFiled: August 29, 2019Publication date: March 5, 2020Inventor: Jin Ho JEON
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Publication number: 20190198021Abstract: A method of configuring a laundry course based on speech recognition using artificial intelligence and a device for implementing the same. A washing machine of configuring the laundry course based on the speech recognition includes a speech input unit that receives a speech included with a StainWord or a ClothWord to produce speech data, a communication unit that transmits identification information of speech data and a washing machine to a server and receive course configuring information corresponding to the StainWord or the ClothWord from the server, and a speech guidance unit that outputs a speech guide message that guides a laundry course corresponding to course configuring information, and a control unit that controls a speech input unit, a communication unit, and a speech guidance unit.Type: ApplicationFiled: December 21, 2018Publication date: June 27, 2019Inventors: Heungkyu LEE, Junhee AN, Jin Ho JEON, Jae Yong WON
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Patent number: 9924307Abstract: This specification discloses a terminal which performs position measurement and an operating method of the terminal. That is, a specific positioning area, to which the terminal belongs, is determined out of two or more positioning areas, to which different positioning methods are assigned, and the position measurement is performed by the terminal according to the positioning method which is assigned to the specific positioning area, such that the power consumption amount of the terminal for performing the position measurement is minimized and the accuracy of the position measurement is improved.Type: GrantFiled: March 18, 2016Date of Patent: March 20, 2018Assignee: SK Planet Co., Ltd.Inventor: Jin Ho Jeon
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Publication number: 20160277883Abstract: This specification discloses a terminal which performs position measurement and an operating method of the terminal. That is, a specific positioning area, to which the terminal belongs, is determined out of two or more positioning areas, to which different positioning methods are assigned, and the position measurement is performed by the terminal according to the positioning method which is assigned to the specific positioning area, such that the power consumption amount of the terminal for performing the position measurement is minimized and the accuracy of the position measurement is improved.Type: ApplicationFiled: March 18, 2016Publication date: September 22, 2016Inventor: Jin Ho JEON
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Publication number: 20160260347Abstract: Disclosed is a method for providing a psychological inspection service. The method for providing a psychological inspection service according to an embodiment of the present disclosure is performed by a server, and includes the steps of receiving a psychological inspection request from a terminal of a student, notifying the psychological inspection request to a terminal of a guardian of the student, and carrying out psychological inspection of the student through psychological inspection questions and answers with the terminal of the student and transmitting psychological inspection results to the terminal of the student, and when receiving a monitoring request of the psychological inspection from the terminal of the guardian, transmitting the psychological inspection questions and answers and the psychological inspection results to the terminal of the guardian.Type: ApplicationFiled: March 2, 2016Publication date: September 8, 2016Applicant: Aura Co., Ltd.Inventors: Seo Ho HA, Je Hyuk SUNG, Jin Ho JEON
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Patent number: 8898178Abstract: A solution monitoring system is provided for gathering, filtering, and analyzing information associated with solutions for managing monitoring, upgrades, and migrations. Telemetry may be recorded for various types of solution events and various properties of solutions as part of an add-in intelligence. Furthermore, add-in management tools are provided for administrators and end users.Type: GrantFiled: August 7, 2012Date of Patent: November 25, 2014Assignee: Microsoft CorporationInventors: Junko Kyomasu, Yu Kuratake, Jin Ho Jeon, Makoto Yamagishi, Daniel Moffitt, Fumiyuki Maeyama, Ryogo Kanatani, Hirokazu Sawada, Nobuko Miwa, Junko Tanaka, Yasufumo Shiraishi, Sachio Kono
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Publication number: 20140264089Abstract: An apparatus and method for generating extreme ultra violet EUV radiation includes a light source providing light to a laser medium to generate a first laser, a droplet generator to provide a droplet to reflect the first laser to one end of the laser medium, a laser generator positioned at the opposite end of the laser medium from that of the droplet and a second laser to expand the droplet or not and to thereby control the conversion efficiency and dose of the EUV generation apparatus.Type: ApplicationFiled: December 5, 2013Publication date: September 18, 2014Applicant: Samsung Electronics Co., Ltd.Inventors: In-Sung Kim, Ho-Yeon Kim, Ho-Chul Kim, Seung-Koo Lee, Jin-Ho Jeon
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Publication number: 20130159326Abstract: A solution monitoring system is provided for gathering, filtering, and analyzing information associated with solutions for managing monitoring, upgrades, and migrations. Telemetry may be recorded for various types of solution events and various properties of solutions as part of an add-in intelligence. Furthermore, add-in management tools are provided for administrators and end users.Type: ApplicationFiled: August 7, 2012Publication date: June 20, 2013Applicant: MICROSOFT CORPORATIONInventors: Junko Kyomasu, Yu Kuratake, Jin Ho Jeon, Makoto Yamagishi, Daniel Moffitt, Fumiyuki Maeyama, Ryogo Kanatani, Hirokazu Sawada, Nobuko Miwa, Junko Tanaka, Yasufumo Shiraishi, Sachio Kono
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Patent number: 7964473Abstract: A reliable gap-filling process is performed in the manufacturing of a semiconductor device. An apparatus for performing the gap-filling process includes a chamber in which a wafer chuck is disposed, a plasma generator for generating plasma used to etch the wafer, an end-point detection unit for detecting the point at which the etching of the wafer is to be terminated, and a controller connected to the end-point detection unit. The end-point detection unit monitors the structure being etched at a region outside the opening that is to be filled, and generates in real time data representative of the layer that is being etched. As soon as an underlying layer is exposed and begins to be etched, an end-point detection signal is generated and the etching process is terminated. In the case in which the layer being etched is an oxide layer, a uniform etching is achieved despite any irregularity that exists in the thickness to which the oxide layer is formed.Type: GrantFiled: September 18, 2008Date of Patent: June 21, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Yong-kyu Kim, Jin-ho Jeon, Kyoung-soo Kwon
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Patent number: 7910491Abstract: A method of filling a trench is described and includes depositing a dielectric liner with a high ratio of silicon oxide to dielectric liner etch rate in fluorine-containing etch chemistries. Silicon oxide is deposited within the trench and etched to reopen or widen a gap near the top of the trench. The dielectric liner protects the underlying substrate during the etch process so the gap can be made wider. Silicon oxide is deposited within the trench again to substantially fill the trench.Type: GrantFiled: May 7, 2009Date of Patent: March 22, 2011Assignee: Applied Materials, Inc.Inventors: Young Soo Kwon, Bi Jang, Anchuan Wang, Young S. Lee, Mihaela Balseanu, Li-Qun Xia, Jin Ho Jeon
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Patent number: 7867921Abstract: A processing chamber is seasoned by providing a flow of season precursors to the processing chamber. A high-density plasma is formed from the season precursors by applying at least 7500 W of source power distributed with greater than 70% of the source power at a top of the processing chamber. A season layer having a thickness of at least 5000 ? is deposited at one point using the high-density plasma. Each of multiple substrates is transferred sequentially into the processing chamber to perform a process that includes etching. The processing chamber is cleaned between sequential transfers of the substrates.Type: GrantFiled: September 4, 2008Date of Patent: January 11, 2011Assignee: Applied Materials, Inc.Inventors: Anchuan Wang, Young S. Lee, Manoj Vellaikal, Jason Thomas Bloking, Jin Ho Jeon, Hemant P. Mungekar
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Patent number: 7745350Abstract: Methods are disclosed of depositing a silicon oxide film on a substrate disposed in a substrate processing chamber. The substrate has a gap formed between adjacent raised surfaces. A first portion of the silicon oxide film is deposited over the substrate and within the gap using a high-density plasma process. Thereafter, a portion of the deposited first portion of the silicon oxide film is etched back. This includes flowing a halogen precursor through a first conduit from a halogen-precursor source to the substrate processing chamber, forming a high-density plasma from the halogen precursor, and terminating flowing the halogen precursor after the portion has been etched back. Thereafter, a halogen scavenger is flowed to the substrate processing chamber to react with residual halogen in the substrate processing chamber. Thereafter, a second portion of the silicon oxide film is deposited over the first portion of the silicon oxide film and within the gap using a high-density plasma process.Type: GrantFiled: September 4, 2008Date of Patent: June 29, 2010Assignee: Applied Materials, Inc.Inventors: Anchuan Wang, Young S. Lee, Manoj Vellaikal, Jason Thomas Bloking, Jin Ho Jeon, Hemant P. Mungekar
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Publication number: 20100099236Abstract: A method of filling a trench is described and includes depositing a dielectric liner with a high ratio of silicon oxide to dielectric liner etch rate in fluorine-containing etch chemistries. Silicon oxide is deposited within the trench and etched to reopen or widen a gap near the top of the trench. The dielectric liner protects the underlying substrate during the etch process so the gap can be made wider. Silicon oxide is deposited within the trench again to substantially fill the trench.Type: ApplicationFiled: May 7, 2009Publication date: April 22, 2010Applicant: Applied Materials, Inc.Inventors: Young Soo Kwon, Bi Jang, Anchuan Wang, Young S. Lee, Mihaela Balseanu, Li-Qun Xia, Jin Ho Jeon