Abstract: A keyswitch includes a cap, first and second support members slidably connected to the cap and opposite to each other, and first and second blocks formed on the cap. The cap is movable between a non-pressed position and a pressed position. The first support member abuts against the first block when the cap is located at the non-pressed position. The first block moves away from the first support member at a first gap when the cap moves downward from the non-pressed position. The first support member abuts against the cap when the cap is located at the non-pressed position, and abuts against the second block when the cap continues moving downward to the pressed position.

Abstract: A keyswitch includes a cap, first and second support members slidably connected to the cap and opposite to each other, and first and second blocks formed on the cap. The cap is movable between a non-pressed position and a pressed position. The first support member abuts against the first block when the cap is located at the non-pressed position. The first block moves away from the first support member at a first gap when the cap moves downward from the non-pressed position. The first support member abuts against the cap when the cap is located at the non-pressed position, and abuts against the second block when the cap continues moving downward to the pressed position.

Abstract: A method for fabricating a keyboard covering film is provided. The method includes steps of: coating a transparent plastic material on an upper surface of a fabric layer before the transparent plastic material is cured; treating the fabric layer and the transparent plastic material by a hot press process to cure the transparent plastic material to form a transparent layer and to make the transparent layer and the fabric layer jointly form a number of keycap receiving sections; forming a mask layer on a lower surface of the fabric layer; removing a portion of the mask layer and a portion of the fabric layer located within each of the keycap receiving sections to form a number of hollow patterns.

Abstract: A method for fabricating a keyboard covering film is provided. The method includes steps of: coating a transparent plastic material on an upper surface of a fabric layer before the transparent plastic material is cured; treating the fabric layer and the transparent plastic material by a hot press process to cure the transparent plastic material to form a transparent layer and to make the transparent layer and the fabric layer jointly form a number of keycap receiving sections; forming a mask layer on a lower surface of the fabric layer; removing a portion of the mask layer and a portion of the fabric layer located within each of the keycap receiving sections to form a number of hollow patterns.

Abstract: A keyboard covering film including a fabric layer, a transparent layer and a mask layer is disclosed. The transparent layer is disposed on an upper surface of the fabric layer. The mask layer is disposed on a lower surface of the fabric layer. The transparent layer and the fabric layer are treated by a hot pressing process to form a number of keycap receiving sections. The keycap receiving sections, the fabric layer and the mask layer are located on the same side of the transparent layer. The fabric layer and the mask layer have hollow patterns within the keycap receiving sections, wherein the hollow patterns are formed by removing a portion of the fabric layer and the mask layer.

Abstract: A keyboard covering film including a fabric layer, a transparent layer and a mask layer is disclosed. The transparent layer is disposed on an upper surface of the fabric layer. The mask layer is disposed on a lower surface of the fabric layer. The transparent layer and the fabric layer are treated by a hot pressing process to form a number of keycap receiving sections. The keycap receiving sections, the fabric layer and the mask layer are located on the same side of the transparent layer. The fabric layer and the mask layer have hollow patterns within the keycap receiving sections, wherein the hollow patterns are formed by removing a portion of the fabric layer and the mask layer.